tab delimited contribution id version timestamp contributor data_model_version reference lab_names 20481 1 2025-07-24T21:30:32.987Z @jbowles 3.0 10.1029/2025GC012613 Paleomagnetic Laboratory (University of Wisconsin-Milwaukee, USA):Institute for Rock Magnetism (University of Minnesota, USA) >>>>>>>>>> tab delimited locations location location_type method_codes citations geologic_classes lithologies lat_s lat_n lon_w lon_e continent_ocean country state_province age age_unit 121-758A Core LP-DM-NRM:LP-AF:LP-ARM:LP-IRM-3D:LP-IRM:LP-X This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 Extrusive Basaltic Lava 5.38415 5.38415 90.36121666666666 90.36121666666666 Indian Ocean 155700000 Years BP 130-807C Core LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 Extrusive Basaltic Lava 3.6065 3.6065 156.62466666666666 156.62466666666666 Pacific Ocean 122400000 Years BP 24-231 Core LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1016/B978-0-12-824360-2.00029-2 Extrusive Basaltic Lava 11.890166666666667 11.890166666666667 48.24516666666667 48.24516666666667 Indian Ocean 13000000 Years BP 37-332B Core LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Basaltic Lava 36.87866666666667 36.87866666666667 326.359 326.359 Atlantic Ocean 3600000 Years BP 45-395A Core LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Basaltic Lava 22.755833333333335 22.755833333333335 313.91833333333335 313.91833333333335 Atlantic Ocean 8000000 Years BP 49-410A Core LP-DM-NRM:LP-AF:LP-ARM:LP-IRM-3D:LP-IRM:LP-X This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Basaltic Lava 45.508833333333335 45.508833333333335 330.524 330.524 Atlantic Ocean 10300000 Years BP 63-472 Core LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1016/j.pepi.2005.03.022 Extrusive Basaltic Lava 23.00583333333333 23.00583333333333 246.00483333333335 246.00483333333335 Pacific Ocean 16000000 Years BP 82-558 Core LP-DM-NRM:LP-AF:LP-ARM:LP-IRM-3D:LP-IRM This study:10.1016/j.pepi.2005.03.022 Extrusive Basaltic Lava 37.77 37.77 322.6565 322.6565 Atlantic Ocean 34000000 Years BP 82-559 Core LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Basaltic Lava 35.12416666666667 35.12416666666667 319.0833333333333 319.0833333333333 Atlantic Ocean 32000000 Years BP 82-564 Core LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Basaltic Lava 33.739333333333335 33.739333333333335 316.23283333333336 316.23283333333336 Atlantic Ocean 32000000 Years BP ALV4205-6 Submarine Site LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study:10.1002/2014JB011828 Extrusive Basaltic Lava 9.7862 9.7862 255.7165 255.7165 Pacific Ocean 11 Years BP BGMSc Outcrop LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1016/j.jvolgeores.2008.04.023 Extrusive Obsidian 41.591 41.591 238.465 238.465 North America United States of America California 950 Years BP CR14 Outcrop LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1029/2020GC009605:10.1130/G20574.1 Extrusive Basaltic Lava 10.55 10.55 274.293 274.293 North America Costa Rica 135000000 Years BP CR20 Outcrop LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1029/2020GC009605:10.1130/G20574.1 Extrusive Basaltic Lava 9.848 9.848 274.617 274.617 North America Costa Rica 120000000 Years BP CR3 Outcrop LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1029/2020GC009605 Extrusive Basaltic Lava 10.571 10.571 274.313 274.313 North America Costa Rica 130000000 Years BP CR6 Outcrop LP-DM-NRM:LP-AF:LP-ARM:LP-X:LP-IRM This study:10.1029/2020GC009605:10.1130/G20574.1 Extrusive Basaltic Lava 10.588 10.588 274.321 274.321 North America Costa Rica 112000000 Years BP D270-R02 Submarine Site LP-HYS:LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study:10.1038/ngeo1496 Extrusive Basaltic Lava 45.949604 45.949604 230.014375 230.014375 Pacific Ocean 6 Years BP D270-R11 Submarine Site :LP-IRM-3D:LP-HYS:LP-DM-NRM:LP-AF:LP-X:LP-IRM This study:10.1038/ngeo1496 Extrusive Basaltic Lava 45.938596 45.938596 230.009856 230.009856 Pacific Ocean 6 Years BP D270-R16 Submarine Site LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM: This study:10.1038/ngeo1496 Extrusive Basaltic Lava 45.929151 45.929151 230.012823 230.012823 Pacific Ocean 6 Years BP D740-SB31 Submarine Site LP-DM-NRM:LP-AF:LP-ARM This study:10.1002/2017GC007348 Extrusive Obsidian 23.55805257142857 23.55805257142857 251.58181500000003 251.58181500000003 Pacific Ocean 7000 Years BP D741-SB34 Submarine Site LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1002/2017GC007348 Extrusive Andesitic Lava 23.545413583333332 23.545413583333332 251.57328445833332 251.57328445833332 Pacific Ocean 7000 Years BP D741-SB40 Submarine Site LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1002/2017GC007348 Extrusive Andesitic Lava 23.545413583333332 23.545413583333332 251.57328445833332 251.57328445833332 Pacific Ocean 7000 Years BP DMC Outcrop LP-DM-NRM:LP-AF:LP-X:LP-HYS:LP-ARM:LP-IRM:LP-IRM-3D: This study:10.1130/0091-7613(1985)13<14:HEATIV>2.0.CO;2:10.1016/j.yqres.2006.05.001 Extrusive Obsidian 37.7153198 37.7153198 234.9780756 234.9780756 North America United States of America California 700 Years BP HI2004 Outcrop LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study Extrusive Basaltic Lava 19.3038 19.3038 204.91056666666665 204.91056666666665 Pacific Ocean United States of America Hawaii 11 Years BP ISLO-11 Outcrop LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1002/2014JB011828 Extrusive Basaltic Lava 64.10016 64.10016 338.75275 338.75275 Pacific Ocean Iceland 16000 Years BP ISLO-12 Outcrop LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1002/2014JB011828 Extrusive Basaltic Lava 64.11546 64.11546 338.85934 338.85934 Pacific Ocean Iceland 65500 Years BP PANR06MV-D3 Submarine Site LP-DM-NRM:LP-AF:LP-ARM This study:10.1038/35048513 Extrusive Basaltic Lava -19.744691666666668 -19.744691666666668 246.528725 246.528725 Pacific Ocean 204000 Years BP PANR06MV-D4 Submarine Site LP-DM-NRM:LP-AF:LP-ARM This study:10.1038/35048513 Extrusive Basaltic Lava -19.745091666666667 -19.745091666666667 246.55020833333333 246.55020833333333 Pacific Ocean 237000 Years BP T879-R1 Submarine Site LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study:10.1002/ggge.20210 Extrusive Basaltic Lava 45.158011 45.158011 229.865483 229.865483 Pacific Ocean 31 Years BP T879-R7 Submarine Site LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Basaltic Lava 45.146578 45.146578 229.854075 229.854075 Pacific Ocean 690 Years BP T882-R2 Submarine Site LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Basaltic Lava 46.52602 46.52602 230.433607 230.433607 Pacific Ocean 6641 Years BP T882-R4 Submarine Site LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Basaltic Lava 46.524984 46.524984 230.432141 230.432141 Pacific Ocean 3955 Years BP T882-R5 Submarine Site LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study:10.1016/j.jvolgeores.2008.08.007:10.1029/94GL01895 Extrusive Basaltic Lava 46.524818 46.524818 230.428177 230.428177 Pacific Ocean 31 Years BP T882-R6 Submarine Site LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Basaltic Lava 46.524047 46.524047 230.42509 230.42509 Pacific Ocean 738 Years BP T882-R9 Submarine Site LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study:10.1016/j.jvolgeores.2008.08.007:10.1029/94GL01895 Extrusive Basaltic Lava 46.523413 46.523413 230.420087 230.420087 Pacific Ocean 24 Years BP TG017 Outcrop LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 Extrusive Basaltic Lava 34.997 34.997 33.2327 33.2327 Cyprus 92000000 Years BP TG024 Outcrop LP-DM-NRM:LP-AF:LP-ARM:LP-IRM This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 Extrusive Basaltic Lava 35.01173 35.01173 33.1538 33.1538 Cyprus 92000000 Years BP TG026 Outcrop LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 Extrusive Basaltic Lava 35.0261 35.0261 33.16338 33.16338 Cyprus 92000000 Years BP TG029 Outcrop LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 Extrusive Basaltic Lava 35.0378 35.0378 33.1786 33.1786 Cyprus 92000000 Years BP TG038 Outcrop LP-DM-NRM:LP-AF:LP-ARM:LP-X:LP-IRM This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 Extrusive Basaltic Lava 35.02988 35.02988 33.17198 33.17198 Cyprus 92000000 Years BP D270-R20 Submarine Site LP-HYS This study:10.1038/ngeo1496 Extrusive Basaltic Lava 45.923788 45.923788 230.016679 230.016679 6 Years BP D657-R04 Submarine Site LP-HYS This study:10.1002/ggge.20210 Extrusive Basaltic Lava 45.869381 45.869381 229.998398 229.998398 6 Years BP >>>>>>>>>> tab delimited sites site location method_codes citations geologic_classes geologic_types lithologies lat lon age age_unit 121-758A-71-2-128-131 121-758A LP-DM-NRM:LP-AF:LP-ARM:LP-IRM-3D:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 Extrusive Volcanic Glass Basaltic Lava 5.38415 90.36121666666666 155700000 Years BP 121-758A-71-2-92-95 121-758A LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 Extrusive Volcanic Glass Basaltic Lava 5.38415 90.36121666666666 155700000 Years BP 121-758A-71-3-44-45 121-758A LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 Extrusive Volcanic Glass Basaltic Lava 5.38415 90.36121666666666 155700000 Years BP 121-758A-71-4-23-27 121-758A LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 Extrusive Volcanic Glass Basaltic Lava 5.38415 90.36121666666666 155700000 Years BP 121-758A-71-4-53-55 121-758A LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 Extrusive Volcanic Glass Basaltic Lava 5.38415 90.36121666666666 155700000 Years BP 130-807C-74-2-25.5-28 130-807C LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 Extrusive Volcanic Glass Basaltic Lava 3.6065 156.62466666666666 122400000 Years BP 130-807C-74-4-87-90 130-807C LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 Extrusive Volcanic Glass Basaltic Lava 3.6065 156.62466666666666 122400000 Years BP 130-807C-75-2-3-5 130-807C LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 Extrusive Volcanic Glass Basaltic Lava 3.6065 156.62466666666666 122400000 Years BP 130-807C-75R-2-31-33 130-807C LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 Extrusive Volcanic Glass Basaltic Lava 3.6065 156.62466666666666 122400000 Years BP 130-807C-75R2-65-67 130-807C LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 Extrusive Volcanic Glass Basaltic Lava 3.6065 156.62466666666666 122400000 Years BP 24-231-64-2-136-140 24-231 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1016/B978-0-12-824360-2.00029-2 Extrusive Volcanic Glass Basaltic Lava 11.890166666666667 48.24516666666667 13000000 Years BP 37-332B-43-2-79-83 37-332B LP-DM-NRM:LP-AF:LP-X:LP-ARM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Volcanic Glass Basaltic Lava 36.87866666666667 326.359 3600000 Years BP 37-332B-45-1-51-53 37-332B LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Volcanic Glass Basaltic Lava 36.87866666666667 326.359 3600000 Years BP 37-332B-48-1-74-75 37-332B LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Volcanic Glass Basaltic Lava 36.87866666666667 326.359 3600000 Years BP 45-395A-64-3-30-32 45-395A LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Volcanic Glass Basaltic Lava 22.755833333333335 313.91833333333335 8000000 Years BP 45-395A-65-1-102-104 45-395A LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Volcanic Glass Basaltic Lava 22.755833333333335 313.91833333333335 8000000 Years BP 45-395A-65-2-67-70 45-395A LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Volcanic Glass Basaltic Lava 22.755833333333335 313.91833333333335 8000000 Years BP 45-395A-67-2-126-130 45-395A LP-DM-NRM:LP-AF:LP-ARM:LP-X:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Volcanic Glass Basaltic Lava 22.755833333333335 313.91833333333335 8000000 Years BP 49-410A-2-1-P19-88-90 49-410A LP-DM-NRM:LP-AF:LP-ARM:LP-IRM-3D:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Volcanic Glass Basaltic Lava 45.508833333333335 330.524 10300000 Years BP 49-410A-2-2-124-126-P18 49-410A LP-DM-NRM:LP-AF:LP-ARM:LP-X:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Volcanic Glass Basaltic Lava 45.508833333333335 330.524 10300000 Years BP 63-472-14-1-P6-59-61 63-472 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1016/j.pepi.2005.03.022 Extrusive Volcanic Glass Basaltic Lava 23.00583333333333 246.00483333333335 16000000 Years BP 82-558-39-3-p5d-111-113 82-558 LP-DM-NRM:LP-AF:LP-ARM:LP-IRM-3D:LP-IRM This study:10.1016/j.pepi.2005.03.022 Extrusive Volcanic Glass Basaltic Lava 37.77 322.6565 34000000 Years BP 82-559-1-1-p7-89-91 82-559 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Volcanic Glass Basaltic Lava 35.12416666666667 319.0833333333333 32000000 Years BP 82-559-3-1-p2-10-12 82-559 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Volcanic Glass Basaltic Lava 35.12416666666667 319.0833333333333 32000000 Years BP 82-559-7-1-PaA-1-3 82-559 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study:10.1016/j.pepi.2005.03.022 Extrusive Volcanic Glass Basaltic Lava 35.12416666666667 319.0833333333333 32000000 Years BP 82-559-7-1-PaA-1-4 82-559 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study:10.1016/j.pepi.2005.03.022 Extrusive Volcanic Glass Basaltic Lava 35.12416666666667 319.0833333333333 32000000 Years BP 82-564-2-2-p5b-91-93 82-564 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Volcanic Glass Basaltic Lava 33.739333333333335 316.23283333333336 32000000 Years BP 82-564-3-3-p3e-62-64 82-564 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Volcanic Glass Basaltic Lava 33.739333333333335 316.23283333333336 32000000 Years BP 82-564-7-2-p6a-90-92 82-564 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 Extrusive Volcanic Glass Basaltic Lava 33.739333333333335 316.23283333333336 32000000 Years BP ALV4205-6 ALV4205-6 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study:10.1002/2014JB011828 Extrusive Volcanic Glass Basaltic Lava 9.7862 255.7165 11 Years BP BGMSc BGMSc LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1016/j.jvolgeores.2008.04.023 Extrusive Volcanic Glass Obsidian 41.591 238.465 950 Years BP CR14 CR14 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1029/2020GC009605:10.1130/G20574.1 Extrusive Volcanic Glass Basaltic Lava 10.55 274.293 135000000 Years BP CR20 CR20 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1029/2020GC009605:10.1130/G20574.1 Extrusive Volcanic Glass Basaltic Lava 9.848 274.617 120000000 Years BP CR3 CR3 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1029/2020GC009605 Extrusive Volcanic Glass Basaltic Lava 10.571 274.313 130000000 Years BP CR6 CR6 LP-DM-NRM:LP-AF:LP-ARM:LP-X:LP-IRM This study:10.1029/2020GC009605:10.1130/G20574.1 Extrusive Volcanic Glass Basaltic Lava 10.588 274.321 112000000 Years BP D270-R02 D270-R02 LP-HYS:LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study:10.1038/ngeo1496 Extrusive Volcanic Glass Basaltic Lava 45.949604 230.014375 6 Years BP D270-R11 D270-R11 :LP-IRM-3D:LP-HYS:LP-DM-NRM:LP-AF:LP-X:LP-IRM This study:10.1038/ngeo1496 Extrusive Volcanic Glass Basaltic Lava 45.938596 230.009856 6 Years BP D270-R16 D270-R16 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM: This study:10.1038/ngeo1496 Extrusive Volcanic Glass Basaltic Lava 45.929151 230.012823 6 Years BP D740-SB31 D740-SB31 LP-DM-NRM:LP-AF:LP-ARM This study:10.1002/2017GC007348 Extrusive Volcanic Glass Obsidian 23.55805257142857 251.58181500000003 7000 Years BP D741-SB34 D741-SB34 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1002/2017GC007348 Extrusive Volcanic Glass Andesitic Lava 23.545413583333332 251.57328445833332 7000 Years BP D741-SB40 D741-SB40 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1002/2017GC007348 Extrusive Volcanic Glass Andesitic Lava 23.545413583333332 251.57328445833332 7000 Years BP DMC DMC LP-DM-NRM:LP-AF:LP-X:LP-HYS:LP-ARM:LP-IRM:LP-IRM-3D: This study:10.1130/0091-7613(1985)13<14:HEATIV>2.0.CO;2:10.1016/j.yqres.2006.05.001 Extrusive Volcanic Glass Obsidian 37.7153198 234.9780756 700 Years BP HI2004 HI2004 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study Extrusive Volcanic Glass Basaltic Lava 19.3038 204.91056666666665 11 Years BP ISLO-11 ISLO-11 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1002/2014JB011828 Extrusive Volcanic Glass Basaltic Lava 64.10016 338.75275 16000 Years BP ISLO-12 ISLO-12 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1002/2014JB011828 Extrusive Volcanic Glass Basaltic Lava 64.11546 338.85934 65500 Years BP PANR06MV-D3 PANR06MV-D3 LP-DM-NRM:LP-AF:LP-ARM This study:10.1038/35048513 Extrusive Volcanic Glass Basaltic Lava -19.744691666666668 246.528725 204000 Years BP PANR06MV-D4 PANR06MV-D4 LP-DM-NRM:LP-AF:LP-ARM This study:10.1038/35048513 Extrusive Volcanic Glass Basaltic Lava -19.745091666666667 246.55020833333333 237000 Years BP T879-R1 T879-R1 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study:10.1002/ggge.20210 Extrusive Volcanic Glass Basaltic Lava 45.158011 229.865483 31 Years BP T879-R7 T879-R7 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 45.146578 229.854075 690 Years BP T882-R2 T882-R2 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 46.52602 230.433607 6641 Years BP T882-R4 T882-R4 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 46.524984 230.432141 3955 Years BP T882-R5 T882-R5 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study:10.1016/j.jvolgeores.2008.08.007:10.1029/94GL01895 Extrusive Volcanic Glass Basaltic Lava 46.524818 230.428177 31 Years BP T882-R6 T882-R6 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 46.524047 230.42509 738 Years BP T882-R9 T882-R9 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study:10.1016/j.jvolgeores.2008.08.007:10.1029/94GL01895 Extrusive Volcanic Glass Basaltic Lava 46.523413 230.420087 24 Years BP TG017 TG017 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 Extrusive Volcanic Glass Basaltic Lava 34.997 33.2327 92000000 Years BP TG024 TG024 LP-DM-NRM:LP-AF:LP-ARM:LP-IRM This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 Extrusive Volcanic Glass Basaltic Lava 35.01173 33.1538 92000000 Years BP TG026 TG026 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 Extrusive Volcanic Glass Basaltic Lava 35.0261 33.16338 92000000 Years BP TG029 TG029 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 Extrusive Volcanic Glass Basaltic Lava 35.0378 33.1786 92000000 Years BP TG038 TG038 LP-DM-NRM:LP-AF:LP-ARM:LP-X:LP-IRM This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 Extrusive Volcanic Glass Basaltic Lava 35.02988 33.17198 92000000 Years BP D270-R20 D270-R20 LP-HYS This study:10.1038/ngeo1496 Extrusive Volcanic Glass Basaltic Lava 45.923788 230.016679 6 Years BP D657-R04 D657-R04 LP-HYS This study:10.1002/ggge.20210 Extrusive Volcanic Glass Basaltic Lava 45.869381 229.998398 6 Years BP >>>>>>>>>> tab delimited samples sample site method_codes citations lat lat_sigma lon lon_sigma 121-758A-71-2-128-131 121-758A-71-2-128-131 LP-DM-NRM:LP-AF:LP-ARM:LP-IRM-3D:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 5.38415 90.36121666666666 121-758A-71-2-92-95 121-758A-71-2-92-95 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 5.38415 90.36121666666666 121-758A-71-3-44-45 121-758A-71-3-44-45 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 5.38415 90.36121666666666 121-758A-71-4-23-27 121-758A-71-4-23-27 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 5.38415 90.36121666666666 121-758A-71-4-53-55 121-758A-71-4-53-55 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 5.38415 90.36121666666666 130-807C-74-2-25.5-28 130-807C-74-2-25.5-28 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 3.6065 156.62466666666666 130-807C-74-4-87-90 130-807C-74-4-87-90 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 3.6065 156.62466666666666 130-807C-75-2-3-5 130-807C-75-2-3-5 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 3.6065 156.62466666666666 130-807C-75R-2-31-33 130-807C-75R-2-31-33 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 3.6065 156.62466666666666 130-807C-75R2-65-67 130-807C-75R2-65-67 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022 3.6065 156.62466666666666 24-231-64-2-136-140 24-231-64-2-136-140 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1016/B978-0-12-824360-2.00029-2 11.890166666666667 48.24516666666667 37-332B-43-2-79-83 37-332B-43-2-79-83 LP-DM-NRM:LP-AF:LP-X:LP-ARM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 36.87866666666667 326.359 37-332B-45-1-51-53 37-332B-45-1-51-53 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 36.87866666666667 326.359 37-332B-48-1-74-75 37-332B-48-1-74-75 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 36.87866666666667 326.359 45-395A-64-3-30-32 45-395A-64-3-30-32 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 22.755833333333335 313.91833333333335 45-395A-65-1-102-104 45-395A-65-1-102-104 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 22.755833333333335 313.91833333333335 45-395A-65-2-67-70 45-395A-65-2-67-70 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 22.755833333333335 313.91833333333335 45-395A-67-2-126-130 45-395A-67-2-126-130 LP-DM-NRM:LP-AF:LP-ARM:LP-X:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 22.755833333333335 313.91833333333335 49-410A-2-1-P19-88-90 49-410A-2-1-P19-88-90 LP-DM-NRM:LP-AF:LP-ARM:LP-IRM-3D:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 45.508833333333335 330.524 49-410A-2-2-124-126-P18 49-410A-2-2-124-126-P18 LP-DM-NRM:LP-AF:LP-ARM:LP-X:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 45.508833333333335 330.524 63-472-14-1-P6-59-61 63-472-14-1-P6-59-61 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1016/j.pepi.2005.03.022 23.00583333333333 246.00483333333335 82-558-39-3-p5d-111-113 82-558-39-3-p5d-111-113 LP-DM-NRM:LP-AF:LP-ARM:LP-IRM-3D:LP-IRM This study:10.1016/j.pepi.2005.03.022 37.77 322.6565 82-559-1-1-p7-89-91 82-559-1-1-p7-89-91 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 35.12416666666667 319.0833333333333 82-559-3-1-p2-10-12 82-559-3-1-p2-10-12 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 35.12416666666667 319.0833333333333 82-559-7-1-PaA-1-3 82-559-7-1-PaA-1-3 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study:10.1016/j.pepi.2005.03.022 35.12416666666667 319.0833333333333 82-559-7-1-PaA-1-4 82-559-7-1-PaA-1-4 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study:10.1016/j.pepi.2005.03.022 35.12416666666667 319.0833333333333 82-564-2-2-p5b-91-93 82-564-2-2-p5b-91-93 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 33.739333333333335 316.23283333333336 82-564-3-3-p3e-62-64 82-564-3-3-p3e-62-64 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 33.739333333333335 316.23283333333336 82-564-7-2-p6a-90-92 82-564-7-2-p6a-90-92 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1098/rsta.2000.0574:10.1016/j.pepi.2005.03.022:10.1038/29746 33.739333333333335 316.23283333333336 ALV4205-6 ALV4205-6 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study:10.1002/2014JB011828 9.7862 255.7165 BGMSc-01 BGMSc LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1016/j.jvolgeores.2008.04.023 41.591 0.0005 238.465 0.0005 BGMSc-02 BGMSc LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1016/j.jvolgeores.2008.04.023 41.591 0.0005 238.465 0.0005 BGMSc-03 BGMSc LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1016/j.jvolgeores.2008.04.023 41.591 0.0005 238.465 0.0005 BGMSc-07 BGMSc LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1016/j.jvolgeores.2008.04.023 41.591 0.0005 238.465 0.0005 BGMSc-08 BGMSc LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1016/j.jvolgeores.2008.04.023 41.591 0.0005 238.465 0.0005 CR14-PC2-1 CR14 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1029/2020GC009605:10.1130/G20574.1 10.55 274.293 CR14-PC2-b CR14 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1029/2020GC009605:10.1130/G20574.1 10.55 274.293 CR14-PC3-a CR14 LP-DM-NRM:LP-AF:LP-ARM This study:10.1029/2020GC009605:10.1130/G20574.1 10.55 274.293 CR14-PC3-b CR14 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1029/2020GC009605:10.1130/G20574.1 10.55 274.293 CR20-a CR20 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1029/2020GC009605:10.1130/G20574.1 9.848 274.617 CR20-b CR20 LP-DM-NRM:LP-AF:LP-X:LP-ARM This study:10.1029/2020GC009605:10.1130/G20574.1 9.848 274.617 CR3A-PC2-1 CR3 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1029/2020GC009605 10.571 274.313 CR3A-PC2-b CR3 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1029/2020GC009605 10.571 274.313 CR3A-PC5-b CR3 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1029/2020GC009605 10.571 274.313 CR3A-PC5-c CR3 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1029/2020GC009605 10.571 274.313 CR6-b CR6 LP-DM-NRM:LP-AF:LP-ARM This study:10.1029/2020GC009605:10.1130/G20574.1 10.588 274.321 CR6-c CR6 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1029/2020GC009605:10.1130/G20574.1 10.588 274.321 D270-R02 D270-R02 LP-HYS:LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study:10.1038/ngeo1496 45.949604 230.014375 D270-R11 D270-R11 :LP-IRM-3D:LP-HYS:LP-DM-NRM:LP-AF:LP-X:LP-IRM This study:10.1038/ngeo1496 45.938596 230.009856 D270-R20 D270-R20 LP-HYS This study:10.1038/ngeo1496 45.923788 230.016679 D270-R16 D270-R16 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM: This study:10.1038/ngeo1496 45.929151 230.012823 D3-a PANR06MV-D3 LP-DM-NRM:LP-AF:LP-ARM This study:10.1038/35048513 -19.744691666666668 0.0025416666666675525 246.528725 0.002591666666667436 D3-b PANR06MV-D3 LP-DM-NRM:LP-AF:LP-ARM This study:10.1038/35048513 -19.744691666666668 0.0025416666666675525 246.528725 0.002591666666667436 D4-3 PANR06MV-D4 LP-DM-NRM:LP-AF:LP-ARM This study:10.1038/35048513 -19.745091666666667 0.0018083333333329676 246.55020833333333 0.0017916666666693004 D657-R04 D657-R04 LP-HYS This study:10.1002/ggge.20210 45.869381 229.998398 D740-SB31 D740-SB31 LP-DM-NRM:LP-AF:LP-ARM This study:10.1002/2017GC007348 23.55805257142857 251.58181500000003 D741-SB34 D741-SB34 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1002/2017GC007348 23.545413583333332 251.57328445833332 D741-SB40 D741-SB40 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1002/2017GC007348 23.545413583333332 251.57328445833332 DMC-P1 DMC LP-DM-NRM:LP-AF:LP-X:LP-HYS:LP-ARM:LP-IRM:LP-IRM-3D: This study:10.1130/0091-7613(1985)13<14:HEATIV>2.0.CO;2:10.1016/j.yqres.2006.05.001 37.7153198 234.9780756 DMC-P2 DMC LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study:10.1130/0091-7613(1985)13<14:HEATIV>2.0.CO;2:10.1016/j.yqres.2006.05.001 37.7153198 234.9780756 H14 HI2004 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study 19.3038 204.91056666666665 H6 HI2004 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM-3D:LP-IRM This study 19.3038 204.91056666666665 ISLO-11C ISLO-11 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1002/2014JB011828 64.10016 338.75275 ISLO-11C ISLO-11 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1002/2014JB011828 64.10016 338.75275 ISLO-11H ISLO-11 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1002/2014JB011828 64.10016 338.75275 ISLO-11H ISLO-11 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1002/2014JB011828 64.10016 338.75275 ISLO-12B ISLO-12 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1002/2014JB011828 64.11546 338.85934 ISLO-12B ISLO-12 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1002/2014JB011828 64.11546 338.85934 T879-R1 T879-R1 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study:10.1002/ggge.20210 45.158011 229.865483 T879-R7 T879-R7 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study 45.146578 229.854075 T882-R2 T882-R2 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study 46.52602 230.433607 T882-R4 T882-R4 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study 46.524984 230.432141 T882-R5 T882-R5 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study:10.1016/j.jvolgeores.2008.08.007:10.1029/94GL01895 46.524818 230.428177 T882-R6 T882-R6 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study 46.524047 230.42509 T882-R9 T882-R9 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study:10.1016/j.jvolgeores.2008.08.007:10.1029/94GL01895 46.523413 230.420087 TG017 TG017 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 34.997 33.2327 TG024 TG024 LP-DM-NRM:LP-AF:LP-ARM:LP-IRM This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 35.01173 33.1538 TG026 TG026 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 35.0261 33.16338 TG029 TG029 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM:LP-IRM-3D This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 35.0378 33.1786 TG038 TG038 LP-DM-NRM:LP-AF:LP-ARM:LP-X:LP-IRM This study:10.1029/2003GC000635:10.1130/0091-7613(1987)15<825:UIAOPF>2.0.CO;2 35.02988 33.17198 >>>>>>>>>> tab delimited specimens specimen sample method_codes citations geologic_classes geologic_types lithologies magn_mass hyst_mr_mass hyst_ms_mass hyst_bcr hyst_bc rem_sratio rem_sratio_forward rem_sratio_back rem_mdf rem_mdt susc_chi_mass A-066 121-758A-71-2-128-131 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000014228723404255318 0.0362736 A-067 121-758A-71-2-128-131 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000016391752577319588 0.0428032 E038 121-758A-71-2-128-131 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 9.180515759312321e-7 599.8651 A-053 121-758A-71-2-92-95 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000010056497175141243 0.9981949458483753 1 0.3 0.0175726 2.7705649717514123e-7 A-054 121-758A-71-2-92-95 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000005203488372093024 0.9656031904287138 1 0.3 0.0091252 2.6537209302325584e-7 A-058 121-758A-71-3-44-45 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000028524590163934428 0.944732297063903 1 0.3 0.0289792 2.7418852459016395e-7 A-059 121-758A-71-3-44-45 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000018128654970760232 0.8535136918508744 1 0.3 0.0135421 2.7943859649122803e-7 A-055 121-758A-71-4-23-27 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 8.880706921944035e-7 0.49351735675449604 1 0.3 0.195826 2.47070351758794e-7 A-056 121-758A-71-4-23-27 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000003344594594594595 0.7136729222520107 1 0.3 0.1547396 2.85527027027027e-7 E039 121-758A-71-4-23-27 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000001156346749226006 468.9009 A-057 121-758A-71-4-53-55 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.001175595238095238 1 1 0.3 0.038009 0.0000013402083333333335 A-062 130-807C-74-2-25.5-28 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000011109467455621302 0.7208424640857074 1 0.3 0.0922846 3.164201183431953e-7 A-063 130-807C-74-2-25.5-28 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000004828358208955224 0.9145800035517669 1 0.3 0.08593 3.0565671641791044e-7 E040 130-807C-74-2-25.5-28 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 1.3343629343629342e-7 520.6122 A-064 130-807C-74-4-87-90 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00001691891891891892 0.9296343537414966 1 0.3 0.07057189999999999 3.3527567567567564e-7 A-065 130-807C-74-4-87-90 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000010065217391304347 0.1302353 A-060 130-807C-75-2-3-5 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00000279375 0.9349862258953167 1 0.3 0.0720617 2.999875e-7 A-061 130-807C-75-2-3-5 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000009121495327102805 0.9646586345381527 1 0.3 0.0255639 3.8280597014925373e-7 A-051 130-807C-75R-2-31-33 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00001670886075949367 0.7235447089417884 1 0.3 0.1004172 3.878481012658228e-7 A-052 130-807C-75R-2-31-33 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000015515151515151516 1.0380256862251325 1 0.3 0.0384034 2.7696363636363635e-7 A-068 130-807C-75R2-65-67 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.001177142857142857 0.9632117722328856 1 0.3 0.0518532 8.412000000000001e-7 A-069 130-807C-75R2-65-67 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0006666666666666668 0.9591002044989774 1 0.3 0.0551515 6.835333333333333e-7 A-015 24-231-64-2-136-140 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 7.272727272727272e-7 0.9663354289190834 1 0.3 2.2571717171717173e-7 A-016 24-231-64-2-136-140 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000005098039215686275 0.7375716133801516 1 0.3 4.757058823529412e-7 A-019 37-332B-43-2-79-83 LP-DM-NRM:LP-AF:LP-X:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000002215384615384615 3.209384615384615e-7 A-020 37-332B-45-1-51-53 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000003965116279069767 0.9713717693836978 1 0.3 0.035767600000000004 2.42093023255814e-7 A-021 37-332B-45-1-51-53 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00001488888888888889 0.9712115153938425 1 0.3 0.0429897 3.9790740740740745e-7 E010 37-332B-45-1-51-53 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000029673913043478264 612.2217 E011 37-332B-45-1-51-53 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000023575609756097562 604.4725000000001 A-017 37-332B-48-1-74-75 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 5.598130841121495e-7 0.9470085470085471 1 0.3 2.503084112149532e-7 A-018 37-332B-48-1-74-75 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000007739130434782609 0.9799896049896052 1 0.3 0.0333416 3.575217391304348e-7 E012 37-332B-48-1-74-75 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000008524999999999999 556.5548 E013 37-332B-48-1-74-75 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 5.690909090909091e-7 618.5949 A-022 45-395A-64-3-30-32 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 4.526748971193416e-7 0.9703389830508473 1 0.3 2.4239917695473253e-7 A-023 45-395A-64-3-30-32 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000019176470588235294 0.9402830188679244 1 0.3 0.0164645 3.2639999999999996e-7 E014 45-395A-64-3-30-32 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000014593333333333336 586.9663 E015 45-395A-64-3-30-32 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000034595238095238094 581.5038 A-026 45-395A-65-1-102-104 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000005067114093959732 0.8630136986301369 1 0.3 0.032542 2.611812080536913e-7 A-027 45-395A-65-1-102-104 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.0000011296296296296296 E016 45-395A-65-1-102-104 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 5.321052631578948e-7 556.8331000000001 E017 45-395A-65-1-102-104 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000020527586206896554 531.255 A-024 45-395A-65-2-67-70 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000013970588235294116 0.976958525345622 1 0.3 0.014126699999999999 2.8513970588235286e-7 A-025 45-395A-65-2-67-70 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000016555555555555557 0.943351691581432 1 0.3 3.024222222222222e-7 E018 45-395A-65-2-67-70 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 8.590566037735849e-7 592.0195 E019 45-395A-65-2-67-70 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000002827272727272727 601.9049 A-028 45-395A-67-2-126-130 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.0005522727272727273 0.1344162 A-029 45-395A-67-2-126-130 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000017317784256559766 0.5325806451612903 1 0.3 3.982507288629737e-7 E020 45-395A-67-2-126-130 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 2.7074074074074073e-7 524.8309 E021 45-395A-67-2-126-130 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000015277551020408162 503.82 A-030 49-410A-2-1-P19-88-90 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.0000239375 A-031 49-410A-2-1-P19-88-90 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.00001896551724137931 0.007032600000000001 E022 49-410A-2-1-P19-88-90 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000014203225806451612 541.0007 E023 49-410A-2-1-P19-88-90 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000001733783783783784 560.5421 A-032 49-410A-2-2-124-126-P18 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000013449999999999998 0.0069736 A-033 49-410A-2-2-124-126-P18 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000061 0.9231805929919137 1 0.3 0.0173901 4.6086e-7 E024 49-410A-2-2-124-126-P18 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00000108075 611.4889000000001 E025 49-410A-2-2-124-126-P18 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0002973968253968254 494.37710000000004 A-034 63-472-14-1-P6-59-61 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00004313725490196078 0.6479999999999999 1 0.3 0.1198196 3.189106753812636e-7 A-072 82-558-39-3-p5d-111-113 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000004716981132075472 0.090235 E041 82-558-39-3-p5d-111-113 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 8.291095890410959e-8 550.7864999999999 E042 82-558-39-3-p5d-111-113 LP-DM-NRM:LP-AF:LP-IRM-3D This study Extrusive Volcanic Glass Basaltic Lava 0.000001103404255319149 273 A-075 82-559-1-1-p7-89-91 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000007657992565055762 0.37096981374438026 1 0.3 4.351672862453531e-7 E043 82-559-1-1-p7-89-91 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000025893536121673005 447.27049999999997 E044 82-559-1-1-p7-89-91 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 3.25226586102719e-7 447.9664 A-076 82-559-3-1-p2-10-12 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 3.304498269896194e-7 0.8691499522445082 1 0.3 0.0116194 2.3121428571428568e-7 A-077 82-559-3-1-p2-10-12 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 9.814814814814814e-7 1.0163594947194037 1 0.3 2.312638888888889e-7 E045 82-559-7-1-PaA-1-3 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 2.435064935064935e-7 430.62919999999997 E046 82-559-7-1-PaA-1-4 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 4.389344262295082e-7 524.2786 A-074 82-564-2-2-p5b-91-93 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000006955719557195571 0.22026476578411405 1 0.3 2.4252767527675274e-7 E047 82-564-2-2-p5b-91-93 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 9.944572748267899e-8 531.0235 E048 82-564-2-2-p5b-91-93 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.009335632183908047 544.0281 A-073 82-564-3-3-p3e-62-64 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000001372093023255814 0.9307974335472043 1 0.3 0.008517 7.540116279069769e-8 A-070 82-564-7-2-p6a-90-92 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000020656934306569347 0.9741697416974169 1 0.3 2.423892944038929e-7 A-071 82-564-7-2-p6a-90-92 LP-DM-NRM:LP-AF:LP-X:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000004166666666666667 0.0239617 2.607051282051282e-7 T52 ALV4205-6 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 7.689695550351288e-7 0.7277887788778878 1 0.3 0.171182 544.8017 2.794634660421546e-7 BGMSc-01-2 BGMSc-01 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Obsidian 0.0008214858364510956 0.053974400000000006 0.000002684 BGMSc-02-2 BGMSc-02 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Obsidian 0.0014093789607097591 0.0655521 0.0000017938 BGMSc-03-2 BGMSc-03 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Obsidian 0.0008631317315658658 0.0705977 0.0000022118 BGMSc-07-2 BGMSc-07 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Obsidian 0.0009401645474943904 0.0781022 0.0000016314 BGMSc-08-2 BGMSc-08 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Obsidian 0.0007613135762915499 0.069551 9.0587e-7 A-007 CR14-PC2-1 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000003172804532577904 0.9628732849071832 1 0.3 0.053230200000000005 3.429261363636364e-7 A-008 CR14-PC2-b LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000025247524752475247 0.9477020602218701 1 0.3 3.20182119205298e-7 E003 CR14-PC2-b LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000001808695652173913 601.4511 E004 CR14-PC2-b LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 3.63953488372093e-7 582.509 A-003 CR14-PC3-a LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000008385650224215247 0.0608664 A-004 CR14-PC3-b LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000009252136752136752 0.7891315929675012 1 0.3 0.0315591 3.606642335766423e-7 E001 CR14-PC3-b LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000003969387755102041 534.4463000000001 E002 CR14-PC3-b LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00002641666666666667 537.8552 A-005 CR20-a LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000007647058823529411 0.8848005502063274 1 0.3 0.1154595 2.8467465753424663e-7 A-006 CR20-b LP-DM-NRM:LP-AF:LP-X:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.0000017142857142857143 0.0060568 3.5818681318681316e-7 A-009 CR3A-PC2-1 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000021519607843137257 0.9409540753919716 1 0.3 0.022684899999999997 2.893217821782178e-7 E005 CR3A-PC2-1 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000004129629629629629 567.7549 E006 CR3A-PC2-1 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00009722772277227723 520.6922 A-010 CR3A-PC2-b LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 5.661764705882352e-7 0.9480383151817346 1 0.3 0.014782 2.692472324723247e-7 A-011 CR3A-PC5-b LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000034513888888888887 0.9574358974358975 1 0.3 0.0632061 3.084305555555556e-7 E007 CR3A-PC5-b LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000006271999999999999 586.7689 A-012 CR3A-PC5-c LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000040165876777251185 0.9560074704295495 1 0.3 0.0737812 2.9661137440758295e-7 A-001 CR6-b LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.00000243531202435312 A-002 CR6-c LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0017285714285714285 0.9628571428571427 1 0.3 0.08648109999999999 0.000004007714285714285 B-65 D270-R02 LP-HYS This study Extrusive Volcanic Glass Basaltic Lava 0.000879 0.0021024 0.154189 0.0817461 B-66 D270-R02 LP-HYS This study Extrusive Volcanic Glass Basaltic Lava 0.00196816 0.00424503 0.14915199999999998 0.0871815 D270-R2-1 D270-R02 LP-HYS This study Extrusive Volcanic Glass Basaltic Lava 0.00191188 0.00516872 0.136272 0.0545068 F-02 D270-R02 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00020469696969696967 538.3227999999999 B-14 D270-R11 :LP-IRM-3D This study Extrusive Volcanic Glass Basaltic Lava B-40 D270-R11 LP-HYS This study Extrusive Volcanic Glass Basaltic Lava 0.00911967 0.0198353 0.13694900000000002 0.08375289999999999 B-41 D270-R11 LP-DM-NRM:LP-AF:LP-X:LP-HYS:LP-IRM:LP-IRM-3D This study Extrusive Volcanic Glass Basaltic Lava 0.0002562410329985653 0.0080808 0.0182472 0.127628 0.08336700000000001 2.3035714285714288e-7 B-42 D270-R11 LP-DM-NRM:LP-AF:LP-X:LP-HYS:LP-IRM:LP-IRM-3D This study Extrusive Volcanic Glass Basaltic Lava 0.0002393175074183976 0.000637776 0.00192506 0.0896015 0.0436492 1.980952380952381e-7 B-44 D270-R11 LP-DM-NRM:LP-AF:LP-X:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0002813861386138614 2.0877659574468083e-7 B-46 D270-R11 LP-HYS This study Extrusive Volcanic Glass Basaltic Lava 0.00624477 0.0144887 0.13250499999999998 0.077747 B-48 D270-R11 LP-HYS This study Extrusive Volcanic Glass Basaltic Lava 0.0150767 0.0364037 0.122819 0.0716982 F-01 D270-R11 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 6.643712574850299e-7 573.8801000000001 A-013 D270-R16 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000152 0.9356356249331765 1 0.3 0.1088956 0.0000025134545454545457 A-014 D270-R16 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000014828797190518 0.7013266998341625 1 0.3 0.1644737 2.2491659350307286e-7 B-06 D270-R20 LP-HYS This study Extrusive Volcanic Glass Basaltic Lava 0.00365275 0.00899974 0.132897 0.0676982 B-07 D270-R20 LP-HYS This study Extrusive Volcanic Glass Basaltic Lava 0.00196736 0.00499004 0.118573 0.059061300000000004 B-08 D270-R20 LP-HYS This study Extrusive Volcanic Glass Basaltic Lava 0.00247715 0.00653576 0.106663 0.052871699999999994 T2 D3-a LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.0000602788844621514 0.0060214 T5 D3-a LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000005603982300884956 D3-b-2 D3-b LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.0000030473029045643153 T1 D4-3 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.00005885057471264367 0.1036424 T6 D4-3 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000011763698630136988 B-63 D657-R04 LP-HYS This study Extrusive Volcanic Glass Basaltic Lava B-64 D657-R04 LP-HYS This study Extrusive Volcanic Glass Basaltic Lava 0.00101794 0.00240394 0.14287799999999998 0.0544445 D657-R4-1 D657-R04 LP-HYS This study Extrusive Volcanic Glass Basaltic Lava 0.000997473 0.00262807 0.158978 0.0836346 A-086 D740-SB31 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Obsidian 0.00025 0.0096702 A-087 D740-SB31 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Obsidian 0.0003014440433212996 0.0078221 A-088 D741-SB34 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Andesitic Lava 0.018952234206471495 0.9679054054054053 1 0.3 0.0240798 0.0000035690292758089364 A-089 D741-SB34 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Andesitic Lava 0.000024653922214897827 0.9602526002971769 1 0.3 0.1320994 4.5462755438365204e-7 A-090 D741-SB40 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Andesitic Lava 0.0002468729427254773 0.9651982888195166 1 0.3 0.0973499 7.250164581961818e-7 A-091 D741-SB40 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Andesitic Lava 0.00037811900191938577 0.9239232945614587 1 0.3 0.1220088 8.10172744721689e-7 B-27 DMC-P1 LP-DM-NRM:LP-AF:LP-X:LP-HYS:LP-ARM:LP-IRM:LP-IRM-3D This study Extrusive Volcanic Glass Obsidian 0.0002562410329985653 0.00745621 0.119981 0.045531100000000005 0.00703303 0.8546463245492372 1 0.3 9.82783357245337e-7 B-28 DMC-P1 LP-DM-NRM:LP-AF:LP-X:LP-HYS:LP-ARM:LP-IRM:LP-IRM-3D This study Extrusive Volcanic Glass Obsidian 0.0002776785714285714 0.0104386 0.120684 0.041094900000000004 0.0115983 0.9334306569343066 1 0.3 7.121661721068248e-7 B-29 DMC-P1 LP-DM-NRM:LP-AF:LP-X:LP-HYS:LP-ARM:LP-IRM:LP-IRM-3D This study Extrusive Volcanic Glass Obsidian 0.000010136507936507937 0.00724758 0.115633 0.048971400000000005 0.00838101 0.9198163193217944 1 0.3 6.732673267326733e-7 B-29 DMC-P1 :LP-ARM:LP-IRM:LP-IRM-3D This study Extrusive Volcanic Glass Obsidian B-30 DMC-P1 LP-HYS This study Extrusive Volcanic Glass Obsidian 0.00623263 0.115371 0.0472902 0.00725891 B-31 DMC-P1 LP-HYS This study Extrusive Volcanic Glass Obsidian 0.00638781 0.111013 0.0441469 0.00682153 B-32 DMC-P1 LP-HYS This study Extrusive Volcanic Glass Obsidian 0.00709167 0.106123 0.048057699999999995 0.0079422 B-73 DMC-P1 LP-HYS This study Extrusive Volcanic Glass Obsidian 0.00781007 0.12165 0.0437537 0.00759952 B-74 DMC-P1 LP-HYS This study Extrusive Volcanic Glass Obsidian 0.00973855 0.113066 0.038470700000000004 0.0102818 B-75 DMC-P1 LP-HYS This study Extrusive Volcanic Glass Obsidian 0.00962532 0.107315 0.0379299 0.011293 B-83 DMC-P1 LP-HYS This study Extrusive Volcanic Glass Obsidian B-85 DMC-P1 LP-HYS This study Extrusive Volcanic Glass Obsidian 0.00795775 0.123235 0.046036 0.0076662499999999995 B-86 DMC-P1 LP-HYS This study Extrusive Volcanic Glass Obsidian B-87 DMC-P1 LP-HYS This study Extrusive Volcanic Glass Obsidian 0.00665107 0.124594 0.0464329 0.00729378 B-89 DMC-P1 LP-HYS This study Extrusive Volcanic Glass Obsidian 0.00671601 0.117377 0.0455259 0.00665913 E-30 DMC-P1 LP-HYS:LP-IRM-3D This study Extrusive Volcanic Glass Obsidian E-32 DMC-P1 LP-HYS:LP-IRM-3D This study Extrusive Volcanic Glass Obsidian E2-1 DMC-P1 LP-HYS This study Extrusive Volcanic Glass Obsidian 0.0217943 0.297823 0.049442 0.00860313 E2-45 DMC-P1 LP-HYS This study Extrusive Volcanic Glass Obsidian 0.0188454 0.256786 0.052938 0.00971547 E2-30 DMC-P2 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Obsidian 0.00026636363636363636 600.3569 E2-32 DMC-P2 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Obsidian 0.0008283828382838283 636.3883000000001 E2-39 DMC-P2 LP-DM-NRM:LP-AF:LP-IRM This study Extrusive Volcanic Glass Obsidian 0.0008827838827838827 E2-42 DMC-P2 LP-DM-NRM:LP-AF:LP-IRM This study Extrusive Volcanic Glass Obsidian 0.0008421052631578948 E2-43 DMC-P2 LP-DM-NRM:LP-AF:LP-IRM This study Extrusive Volcanic Glass Obsidian 0.000027039772727272726 A-078 H14 LP-DM-NRM:LP-AF:LP-X:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000005325131810193322 0.118662 2.4757469244288225e-7 A-079 H14 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00002161383285302594 0.8301741803278688 1 0.3 0.1251719 2.6328530259365996e-7 A-115 H6 LP-DM-NRM:LP-AF:LP-X:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000004353182751540041 0.1161368 2.0369609856262833e-7 E057 H6 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000006290748898678413 448.74 E058 H6 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000004728346456692914 443.6769 E059 H6 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00000474468085106383 461.9415 E060 H6 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00021618181818181816 449.0494 T7 ISLO-11C LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.0000325 ISLO_11H-6a ISLO-11H LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000015723342939481268 T3 ISLO-11H LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.0001284181818181818 0.1230303 ISLO_12B-1a ISLO-12B LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000017 T4 ISLO-12B LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.00002915625 0.0171078 A-035 ISLO-11C LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00008971553610503282 0.8153923541247484 1 0.3 0.1195077 4.101969365426696e-7 A-036 ISLO-11C LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00009480519480519481 0.8218976145805413 1 0.3 0.13808949999999998 4.414220779220779e-7 E026 ISLO-11C LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00019114130434782608 538.6049 E027 ISLO-11C LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00007794736842105264 465.1438 A-037 ISLO-11H LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000009486842105263158 0.8770314192849403 1 0.3 0.0264953 3.2007894736842104e-7 A-038 ISLO-11H LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.000014754385964912279 0.1380499 E029 ISLO-11H LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000020424581005586593 529.1764000000001 E028 ISLO-11H LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000063372549019607845 487.3797 A-039 ISLO-12B LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000010962962962962963 0.9520714865962632 1 0.3 0.0158028 2.473555555555555e-7 A-040 ISLO-12B LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000013837837837837839 0.8976520168573149 1 0.3 0.0572222 2.2855675675675677e-7 E030 ISLO-12B LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000004493714285714286 604.5727999999999 E031 ISLO-12B LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000334435261707989 619.7506000000001 T53 T879-R1 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000045113333333333334 0.8108607314370153 1 0.3 0.0917342 520.6908 0.0000011610253333333338 T50 T879-R7 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00006577922077922077 0.8551671148674607 1 0.3 0.0910313 540.5977 8.940896103896106e-7 T55 T882-R2 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.003498591549295775 0.9270581113801453 1 0.3 0.1896033 472.0831 0.0000033109070422535215 T56 T882-R4 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00010546762589928056 0.854487071150921 1 0.3 0.0506398 540.1593 0.000001407041726618705 T51 T882-R5 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000035993006993006996 0.91268758526603 1 0.3 0.0694784 540.4965 5.626699300699302e-7 T57 T882-R6 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000848125 0.6577221228384018 1 0.3 0.0599022 522.1839 0.0000012195375000000002 T54 T882-R9 LP-DM-NRM:LP-AF:LP-X:LP-IRM-3D:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00011575221238938052 0.8545189504373177 1 0.3 0.096369 553.8277 0.0000015053699115044247 A-041 TG017 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000031192660550458714 0.9975445058317985 1 0.3 0.0185303 0.0000019034862385321098 A-042 TG017 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00003928571428571428 1.0045624707533927 1 0.3 0.0000017797761194029848 E032 TG017 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00003947483588621444 418.3379 E033 TG017 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00009954128440366972 420.11220000000003 A-043 TG024 LP-DM-NRM:LP-AF:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000033031674208144797 0.9673172242874845 1 0.3 0.0640799 A-044 TG024 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.00008641025641025641 0.0282832 A-045 TG026 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00008661417322834646 0.9083509195055774 1 0.3 0.1077905 3.6625984251968506e-7 A-046 TG026 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00015138121546961325 0.8982873121286263 1 0.3 0.111326 2.9557458563535915e-7 A-047 TG029 LP-DM-NRM:LP-AF:LP-X:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.00025 4.934218750000001e-7 A-048 TG029 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0005594405594405595 0.9952498967368857 1 0.3 0.0284248 8.863636363636364e-7 E034 TG029 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.0000364140127388535 499.50649999999996 E035 TG029 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00013549504950495048 575.7416000000001 A-049 TG038 LP-DM-NRM:LP-AF:LP-ARM This study Extrusive Volcanic Glass Basaltic Lava 0.00012713004484304934 0.0875316 A-050 TG038 LP-DM-NRM:LP-AF:LP-X:LP-ARM:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00016833976833976834 0.982509881422925 1 0.3 0.0912124 0.0000014962934362934364 E036 TG038 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.00015109756097560976 663.5204 E037 TG038 LP-DM-NRM:LP-AF:LP-IRM-3D:LP-IRM This study Extrusive Volcanic Glass Basaltic Lava 0.000030806451612903225 654.0593 >>>>>>>>>> tab delimited measurements measurement experiment specimen quality method_codes citations standard instrument_codes treat_temp treat_ac_field treat_dc_field meas_temp magn_mass magn_moment dir_csd dir_dec dir_inc description ARM-A-001 ARM-A-001 A-001 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 5.568273117818451e-7 ARM-A-002 ARM-A-002 A-002 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0005891423257534444 ARM-A-003 ARM-A-003 A-003 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000005547682062522517 ARM-A-004 ARM-A-004 A-004 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000004590754235971724 ARM-A-005 ARM-A-005 A-005 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00000243953025226115 ARM-A-006 ARM-A-006 A-006 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000034935371825260266 ARM-A-007 ARM-A-007 A-007 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000008055812030315332 ARM-A-008 ARM-A-008 A-008 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000050559200401124995 ARM-A-009 ARM-A-009 A-009 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000005552659720884673 ARM-A-010 ARM-A-010 A-010 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000032702217051979854 ARM-A-011 ARM-A-011 A-011 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00000783437400415201 ARM-A-012 ARM-A-012 A-012 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000005612216514780855 ARM-A-013 ARM-A-013 A-013 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0003518667575184304 ARM-A-014 ARM-A-014 A-014 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 3.037607073791451e-7 ARM-A-015 ARM-A-015 A-015 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000004415123175034822 ARM-A-016 ARM-A-016 A-016 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00001356157373525814 ARM-A-017 ARM-A-017 A-017 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000010487192174199396 ARM-A-018 ARM-A-018 A-018 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000008807185215904168 ARM-A-019 ARM-A-019 A-019 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000029930862359953187 ARM-A-020 ARM-A-020 A-020 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000012831907512452894 ARM-A-021 ARM-A-021 A-021 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00001150659906003462 ARM-A-022 ARM-A-022 A-022 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000019976587595080825 ARM-A-023 ARM-A-023 A-023 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000011444007531402838 ARM-A-024 ARM-A-024 A-024 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000012973553510943387 ARM-A-025 ARM-A-025 A-025 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000015484212208734057 ARM-A-026 ARM-A-026 A-026 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000002160114283060233 ARM-A-027 ARM-A-027 A-027 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000005197092866103998 ARM-A-028 ARM-A-028 A-028 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00023086223351187265 ARM-A-029 ARM-A-029 A-029 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00001879518576817874 ARM-A-030 ARM-A-030 A-030 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00002246010723207514 ARM-A-031 ARM-A-031 A-031 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000012345202494139528 ARM-A-032 ARM-A-032 A-032 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000014241780611682923 ARM-A-033 ARM-A-033 A-033 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000004761798122031754 ARM-A-034 ARM-A-034 A-034 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000018945240780862905 ARM-A-035 ARM-A-035 A-035 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000021473315705849866 ARM-A-036 ARM-A-036 A-036 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00002523398063951043 ARM-A-037 ARM-A-037 A-037 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000018214220010025294 ARM-A-038 ARM-A-038 A-038 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000003899711816936725 ARM-A-039 ARM-A-039 A-039 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000017512939154897444 ARM-A-040 ARM-A-040 A-040 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 6.36791948121364e-7 ARM-A-041 ARM-A-041 A-041 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000054311895668634565 ARM-A-042 ARM-A-042 A-042 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00004238967039135777 ARM-A-043 ARM-A-043 A-043 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00000943630592683963 ARM-A-044 ARM-A-044 A-044 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000785583084673981 ARM-A-045 ARM-A-045 A-045 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000015616964069962595 ARM-A-046 ARM-A-046 A-046 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000166355349174053 ARM-A-047 ARM-A-047 A-047 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00003506132823543991 ARM-A-048 ARM-A-048 A-048 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00009360179915769194 ARM-A-049 ARM-A-049 A-049 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00001356211832978311 ARM-A-050 ARM-A-050 A-050 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000020607680611428786 ARM-A-051 ARM-A-051 A-051 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000037253424668906317 ARM-A-052 ARM-A-052 A-052 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000022732189460888614 ARM-A-053 ARM-A-053 A-053 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000011066531309758562 ARM-A-054 ARM-A-054 A-054 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 9.611128816391186e-7 ARM-A-055 ARM-A-055 A-055 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 7.116015878270146e-7 ARM-A-056 ARM-A-056 A-056 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000011694032292829184 ARM-A-057 ARM-A-057 A-057 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0010798278280050198 ARM-A-058 ARM-A-058 A-058 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000002453583850988098 ARM-A-059 ARM-A-059 A-059 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000031849735422880144 ARM-A-060 ARM-A-060 A-060 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000011972427453962682 ARM-A-061 ARM-A-061 A-061 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 7.590530394048529e-7 ARM-A-062 ARM-A-062 A-062 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00001271138424286248 ARM-A-063 ARM-A-063 A-063 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000038063175428894013 ARM-A-064 ARM-A-064 A-064 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000005626051830557684 ARM-A-065 ARM-A-065 A-065 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000064514450511810124 ARM-A-066 ARM-A-066 A-066 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000007811732795654827 ARM-A-067 ARM-A-067 A-067 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000011307590378538132 ARM-A-068 ARM-A-068 A-068 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0005137809045151097 ARM-A-069 ARM-A-069 A-069 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0004529807162094653 ARM-A-070 ARM-A-070 A-070 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 4.2507362326305195e-7 ARM-A-071 ARM-A-071 A-071 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000032477411759813747 ARM-A-072 ARM-A-072 A-072 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00000780850858394869 ARM-A-073 ARM-A-073 A-073 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 8.072234530176636e-7 ARM-A-074 ARM-A-074 A-074 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000035422201098105565 ARM-A-075 ARM-A-075 A-075 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000013300278757583327 ARM-A-076 ARM-A-076 A-076 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 3.932569582769901e-7 ARM-A-077 ARM-A-077 A-077 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000003898043971687873 ARM-A-078 ARM-A-078 A-078 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000001668490915118373 ARM-A-079 ARM-A-079 A-079 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00000363091207381765 ARM-A-086 ARM-A-086 A-086 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00024931524243262964 ARM-A-087 ARM-A-087 A-087 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0002879954555674089 ARM-A-088 ARM-A-088 A-088 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0025174008529846585 ARM-A-089 ARM-A-089 A-089 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00000931557824986022 ARM-A-090 ARM-A-090 A-090 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00003875159595330209 ARM-A-091 ARM-A-091 A-091 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00005014805385822173 ARM-A-115 ARM-A-115 A-115 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000002210327087469289 ARM-B-27 ARM-B-27 B-27 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00014992826398852225 ARM-B-28 ARM-B-28 B-28 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00011399109792284865 ARM-B-29 ARM-B-29 B-29 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00016885148514851484 ARM-BGMSc-01-2 ARM-BGMSc-01-2 BGMSc-01-2 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00035338034009309446 ARM-BGMSc-02-2 ARM-BGMSc-02-2 BGMSc-02-2 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00035515947615618964 ARM-BGMSc-03-2 ARM-BGMSc-03-2 BGMSc-03-2 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0006533346799356079 ARM-BGMSc-07-2 ARM-BGMSc-07-2 BGMSc-07-2 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0005431119277518249 ARM-BGMSc-08-2 ARM-BGMSc-08-2 BGMSc-08-2 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000027057383950190396 ARM-D3-b-2 ARM-D3-b-2 D3-b-2 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000012321223023210789 ARM-ISLO_11H-6a ARM-ISLO_11H-6a ISLO_11H-6a g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00002765992124713144 ARM-ISLO_12B-1a ARM-ISLO_12B-1a ISLO_12B-1a g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 5.240599899403924e-7 ARM-T1 ARM-T1 T1 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00004205255603877616 ARM-T2 ARM-T2 T2 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000024157869660966513 ARM-T3 ARM-T3 T3 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000025154798087217888 ARM-T4 ARM-T4 T4 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000035919341606066722 ARM-T5 ARM-T5 T5 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 5.772746125450374e-7 ARM-T50 ARM-T50 T50 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000002102306946085523 ARM-T51 ARM-T51 T51 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 6.783278535448741e-7 ARM-T52 ARM-T52 T52 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 1.575837851824194e-7 ARM-T53 ARM-T53 T53 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 7.144926629609333e-7 ARM-T54 ARM-T54 T54 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000013211776110713224 ARM-T55 ARM-T55 T55 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.00012903164561045308 ARM-T56 ARM-T56 T56 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000002638863916408053 ARM-T57 ARM-T57 T57 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000010597681791684108 ARM-T6 ARM-T6 T6 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.000005570277446260244 ARM-T7 ARM-T7 T7 g LP-ARM This study UWM-2G755:UWM-D2000 293 0.1 0.00005 293 0.0000054137605876062384 IRM-A-002 IRM-A-002 A-002 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.06999999999999999 IRM-A-004 IRM-A-004 A-004 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0003425182481751825 IRM-A-005 IRM-A-005 A-005 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0004979452054794521 IRM-A-007 IRM-A-007 A-007 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0007039772727272728 IRM-A-008 IRM-A-008 A-008 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00041788079470198676 IRM-A-009 IRM-A-009 A-009 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00044519801980198015 IRM-A-010 IRM-A-010 A-010 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00028121771217712175 IRM-A-011 IRM-A-011 A-011 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0006770833333333334 IRM-A-012 IRM-A-012 A-012 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0005709715639810427 IRM-A-013 IRM-A-013 A-013 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.042513636363636365 IRM-A-014 IRM-A-014 A-014 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00010588235294117647 IRM-A-015 IRM-A-015 A-015 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.000249040404040404 IRM-A-016 IRM-A-016 A-016 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0010609803921568628 IRM-A-017 IRM-A-017 A-017 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00016401869158878503 IRM-A-018 IRM-A-018 A-018 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0008365217391304347 IRM-A-020 IRM-A-020 A-020 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0002924418604651163 IRM-A-021 IRM-A-021 A-021 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0009262962962962963 IRM-A-022 IRM-A-022 A-022 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00016510288065843624 IRM-A-023 IRM-A-023 A-023 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00012470588235294117 IRM-A-024 IRM-A-024 A-024 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00011169117647058824 IRM-A-025 IRM-A-025 A-025 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00014122222222222224 IRM-A-026 IRM-A-026 A-026 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00020087248322147653 IRM-A-029 IRM-A-029 A-029 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.009037900874635567 IRM-A-033 IRM-A-033 A-033 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.000742 IRM-A-034 IRM-A-034 A-034 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.003540305010893246 IRM-A-035 IRM-A-035 A-035 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.004350109409190372 IRM-A-036 IRM-A-036 A-036 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.004845454545454546 IRM-A-037 IRM-A-037 A-037 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00048578947368421054 IRM-A-039 IRM-A-039 A-039 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00018237037037037036 IRM-A-040 IRM-A-040 A-040 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00008978378378378378 IRM-A-041 IRM-A-041 A-041 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.005977981651376147 IRM-A-042 IRM-A-042 A-042 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00637910447761194 IRM-A-043 IRM-A-043 A-043 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0029212669683257916 IRM-A-045 IRM-A-045 A-045 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.002611811023622047 IRM-A-046 IRM-A-046 A-046 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.003161325966850829 IRM-A-048 IRM-A-048 A-048 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.03386013986013986 IRM-A-050 IRM-A-050 A-050 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.003907335907335907 IRM-A-051 IRM-A-051 A-051 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0006327848101265823 IRM-A-052 IRM-A-052 A-052 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00024066666666666664 IRM-A-053 IRM-A-053 A-053 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00012519774011299437 IRM-A-054 IRM-A-054 A-054 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0001166279069767442 IRM-A-055 IRM-A-055 A-055 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00012015075376884421 IRM-A-056 IRM-A-056 A-056 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0006300675675675676 IRM-A-057 IRM-A-057 A-057 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.030803571428571427 IRM-A-058 IRM-A-058 A-058 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0001423770491803279 IRM-A-059 IRM-A-059 A-059 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00017725146198830407 IRM-A-060 IRM-A-060 A-060 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0001134375 IRM-A-061 IRM-A-061 A-061 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0003716417910447761 IRM-A-062 IRM-A-062 A-062 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0012150887573964496 IRM-A-063 IRM-A-063 A-063 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0004202238805970149 IRM-A-064 IRM-A-064 A-064 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0005085405405405405 IRM-A-068 IRM-A-068 A-068 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.035725714285714284 IRM-A-069 IRM-A-069 A-069 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.024450000000000003 IRM-A-070 IRM-A-070 A-070 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00003956204379562044 IRM-A-073 IRM-A-073 A-073 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00006343023255813954 IRM-A-074 IRM-A-074 A-074 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0007247232472324723 IRM-A-075 IRM-A-075 A-075 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.002894052044609665 IRM-A-076 IRM-A-076 A-076 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00006503105590062111 IRM-A-077 IRM-A-077 A-077 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0002235648148148148 IRM-A-079 IRM-A-079 A-079 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0011250720461095103 IRM-A-088 IRM-A-088 A-088 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.18243451463790447 IRM-A-089 IRM-A-089 A-089 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.001774555042847726 IRM-A-090 IRM-A-090 A-090 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.005693877551020409 IRM-A-091 IRM-A-091 A-091 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.01221113243761996 IRM-B-27 IRM-B-27 B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.005172166427546629 IRM-B-28 IRM-B-28 B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00508160237388724 IRM-B-29 IRM-B-29 B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.005605940594059406 IRM-B-41 IRM-B-41 B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0061964285714285715 IRM-B-42 IRM-B-42 B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0003603174603174603 IRM-B-44 IRM-B-44 B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0016204787234042554 IRM-BGMSc-01-2 IRM-BGMSc-01-2 BGMSc-01-2 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.04168893639764832 IRM-BGMSc-02-2 IRM-BGMSc-02-2 BGMSc-02-2 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.028052386987748205 IRM-BGMSc-03-2 IRM-BGMSc-03-2 BGMSc-03-2 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.026014913007456505 IRM-BGMSc-07-2 IRM-BGMSc-07-2 BGMSc-07-2 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.02169035153328347 IRM-BGMSc-08-2 IRM-BGMSc-08-2 BGMSc-08-2 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.02603123748498198 IRM-E001 IRM-E001 E001 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0003244813278008299 IRM-E002 IRM-E002 E002 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0004938775510204082 IRM-E003 IRM-E003 E003 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.002058823529411765 IRM-E004 IRM-E004 E004 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00043478260869565214 IRM-E005 IRM-E005 E005 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00014651162790697673 IRM-E006 IRM-E006 E006 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00039537037037037036 IRM-E007 IRM-E007 E007 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00942079207920792 IRM-E010 IRM-E010 E010 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0021179999999999997 IRM-E011 IRM-E011 E011 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0003119565217391304 IRM-E012 IRM-E012 E012 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0001818292682926829 IRM-E013 IRM-E013 E013 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0005242857142857143 IRM-E014 IRM-E014 E014 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0001828636363636364 IRM-E015 IRM-E015 E015 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00014506666666666668 IRM-E016 IRM-E016 E016 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00022266666666666664 IRM-E017 IRM-E017 E017 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0004131578947368421 IRM-E018 IRM-E018 E018 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0002799655172413793 IRM-E019 IRM-E019 E019 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00014784905660377356 IRM-E020 IRM-E020 E020 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0008316205533596837 IRM-E021 IRM-E021 E021 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00015518518518518518 IRM-E022 IRM-E022 E022 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00014420408163265305 IRM-E023 IRM-E023 E023 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00027516129032258065 IRM-E024 IRM-E024 E024 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00030540540540540545 IRM-E025 IRM-E025 E025 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00033025000000000003 IRM-E026 IRM-E026 E026 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.014498412698412698 IRM-E027 IRM-E027 E027 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.009119565217391304 IRM-E028 IRM-E028 E028 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0031489473684210524 IRM-E029 IRM-E029 E029 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0006541176470588236 IRM-E030 IRM-E030 E030 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00011424581005586592 IRM-E031 IRM-E031 E031 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0001709714285714286 IRM-E032 IRM-E032 E032 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.006741046831955923 IRM-E033 IRM-E033 E033 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.006875273522975929 IRM-E034 IRM-E034 E034 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0031990825688073396 IRM-E035 IRM-E035 E035 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0010541401273885351 IRM-E036 IRM-E036 E036 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.003272277227722772 IRM-E037 IRM-E037 E037 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0037560975609756096 IRM-E038 IRM-E038 E038 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0006698924731182795 IRM-E039 IRM-E039 E039 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0001087679083094556 IRM-E040 IRM-E040 E040 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00008643962848297213 IRM-E041 IRM-E041 E041 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.000025965250965250964 IRM-E043 IRM-E043 E043 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00033182978723404256 IRM-E044 IRM-E044 E044 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.000667680608365019 IRM-E045 IRM-E045 E045 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00020876132930513594 IRM-E046 IRM-E046 E046 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00004711038961038961 IRM-E047 IRM-E047 E047 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00005862704918032787 IRM-E048 IRM-E048 E048 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.000032355658198614316 IRM-E057 IRM-E057 E057 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.000582741935483871 IRM-E058 IRM-E058 E058 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00042066079295154183 IRM-E059 IRM-E059 E059 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00030661417322834646 IRM-E060 IRM-E060 E060 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00026787234042553195 IRM-E2-30 IRM-E2-30 E2-30 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.005992727272727273 IRM-E2-32 IRM-E2-32 E2-32 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.005172727272727273 IRM-E2-39 IRM-E2-39 E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.018432343234323433 IRM-E2-42 IRM-E2-42 E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.017177655677655678 IRM-E2-43 IRM-E2-43 E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.015749473684210525 IRM-F-01 IRM-F-01 F-01 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0008392045454545455 IRM-F-02 IRM-F-02 F-02 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00005488023952095808 IRM-T50 IRM-T50 T50 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00033805194805194806 IRM-T51 IRM-T51 T51 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0001537762237762238 IRM-T52 IRM-T52 T52 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00008870023419203747 IRM-T53 IRM-T53 T53 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00018046666666666667 IRM-T54 IRM-T54 T54 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00030353982300884957 IRM-T55 IRM-T55 T55 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.02326760563380282 IRM-T56 IRM-T56 T56 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.00042568345323741 IRM-T57 IRM-T57 T57 g LP-IRM This study UWM-2G755:UWM-asc-pulse 293 1 293 0.0034937500000000003 IRMbackfield_aq-B-27-300deg-0day-1 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 0 293 9.205000000000001e-8 0.3 332.8 8.3 IRM backfield acquisition after annealing at 573K for 332.8 days IRMbackfield_aq-B-27-300deg-0day-2 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.000003398 0.6 56.9 82.7 IRM backfield acquisition after annealing at 573K for 56.9 days IRMbackfield_aq-B-27-300deg-0day-3 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.000002463 0.2 314.8 82.1 IRM backfield acquisition after annealing at 573K for 314.8 days IRMbackfield_aq-B-27-300deg-0day-4 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.0000020110000000000003 0.2 316.5 81.4 IRM backfield acquisition after annealing at 573K for 316.5 days IRMbackfield_aq-B-27-300deg-0day-5 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.000001621 0.2 302.1 80.5 IRM backfield acquisition after annealing at 573K for 302.1 days IRMbackfield_aq-B-27-300deg-0day-6 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.000001255 0.2 318.8 79.4 IRM backfield acquisition after annealing at 573K for 318.8 days IRMbackfield_aq-B-27-300deg-0day-7 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 9.316e-7 0.2 321.3 76.3 IRM backfield acquisition after annealing at 573K for 321.3 days IRMbackfield_aq-B-27-300deg-0day-8 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 3.4979999999999997e-7 0.2 313 56.3 IRM backfield acquisition after annealing at 573K for 313 days IRMbackfield_aq-B-27-300deg-0day-9 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 2.293e-7 0.4 338.4 -61.8 IRM backfield acquisition after annealing at 573K for 338.4 days IRMbackfield_aq-B-27-300deg-0day-10 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.0000011479999999999999 0.2 95.2 -87.5 IRM backfield acquisition after annealing at 573K for 95.2 days IRMbackfield_aq-B-27-300deg-0day-11 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 0.0000015989999999999999 0.1 120.3 -86.8 IRM backfield acquisition after annealing at 573K for 120.3 days IRMbackfield_aq-B-27-300deg-0day-12 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 0.000002271 0.2 121.5 -84.1 IRM backfield acquisition after annealing at 573K for 121.5 days IRMbackfield_aq-B-27-300deg-0day-13 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 0.000002698 0.1 131.9 -84.2 IRM backfield acquisition after annealing at 573K for 131.9 days IRMbackfield_aq-B-27-300deg-0day-14 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.000003081 0.2 138.1 -84 IRM backfield acquisition after annealing at 573K for 138.1 days IRMbackfield_aq-B-27-300deg-0day-15 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.000003375 0.1 139.7 -83.6 IRM backfield acquisition after annealing at 573K for 139.7 days IRMbackfield_aq-B-27-300deg-0day-16 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.000003511 0.1 152.5 -83.6 IRM backfield acquisition after annealing at 573K for 152.5 days IRMbackfield_aq-B-27-300deg-0day-17 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.0000035869999999999997 0.1 153.9 -82 IRM backfield acquisition after annealing at 573K for 153.9 days IRMbackfield_aq-B-27-300deg-0day-18 IRMbackfield_aq-B-27-300deg-0day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.0000036050000000000002 0.1 148.9 -82.7 IRM backfield acquisition after annealing at 573K for 148.9 days IRMbackfield_aq-B-27-300deg-15day-1 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 0 293 8.183e-9 3.7 187.7 60.1 IRM backfield acquisition after annealing at 573K for 187.7 days IRMbackfield_aq-B-27-300deg-15day-2 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.000003541 0.3 319.1 83.3 IRM backfield acquisition after annealing at 573K for 319.1 days IRMbackfield_aq-B-27-300deg-15day-3 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.000002467 0.3 323.1 81.7 IRM backfield acquisition after annealing at 573K for 323.1 days IRMbackfield_aq-B-27-300deg-15day-4 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.0000020100000000000002 0.2 329.9 80.3 IRM backfield acquisition after annealing at 573K for 329.9 days IRMbackfield_aq-B-27-300deg-15day-5 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.000001564 0.3 320.6 78.7 IRM backfield acquisition after annealing at 573K for 320.6 days IRMbackfield_aq-B-27-300deg-15day-6 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.000001194 0.2 322.4 77.8 IRM backfield acquisition after annealing at 573K for 322.4 days IRMbackfield_aq-B-27-300deg-15day-7 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 8.79e-7 0.3 326.4 74.4 IRM backfield acquisition after annealing at 573K for 326.4 days IRMbackfield_aq-B-27-300deg-15day-8 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 2.646e-7 0.6 323.1 50.9 IRM backfield acquisition after annealing at 573K for 323.1 days IRMbackfield_aq-B-27-300deg-15day-9 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 3.0459999999999996e-7 0.5 333.2 -72.3 IRM backfield acquisition after annealing at 573K for 333.2 days IRMbackfield_aq-B-27-300deg-15day-10 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.000001277 0.2 144.7 -87.6 IRM backfield acquisition after annealing at 573K for 144.7 days IRMbackfield_aq-B-27-300deg-15day-11 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 0.000001734 0.3 146.3 -86 IRM backfield acquisition after annealing at 573K for 146.3 days IRMbackfield_aq-B-27-300deg-15day-12 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 0.0000024060000000000003 0.2 155.1 -85 IRM backfield acquisition after annealing at 573K for 155.1 days IRMbackfield_aq-B-27-300deg-15day-13 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 0.000002822 0.3 152.3 -84.3 IRM backfield acquisition after annealing at 573K for 152.3 days IRMbackfield_aq-B-27-300deg-15day-14 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.000003212 0.3 154 -83.6 IRM backfield acquisition after annealing at 573K for 154 days IRMbackfield_aq-B-27-300deg-15day-15 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.000003422 0.2 156.8 -83.2 IRM backfield acquisition after annealing at 573K for 156.8 days IRMbackfield_aq-B-27-300deg-15day-16 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.0000035469999999999997 0.3 153.7 -83 IRM backfield acquisition after annealing at 573K for 153.7 days IRMbackfield_aq-B-27-300deg-15day-17 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.0000035950000000000003 0.3 155.3 -82.9 IRM backfield acquisition after annealing at 573K for 155.3 days IRMbackfield_aq-B-27-300deg-15day-18 IRMbackfield_aq-B-27-300deg-15day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.000003617 0.2 159.9 -82.7 IRM backfield acquisition after annealing at 573K for 159.9 days IRMbackfield_aq-B-27-300deg-30day-1 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.0000032599999999999997 0.2 318.2 80.7 IRM backfield acquisition after annealing at 573K for 318.2 days IRMbackfield_aq-B-27-300deg-30day-2 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.003 293 0.0000032230000000000003 0.2 315.2 81 IRM backfield acquisition after annealing at 573K for 315.2 days IRMbackfield_aq-B-27-300deg-30day-3 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.005 293 0.0000029740000000000002 0.2 317.9 81.4 IRM backfield acquisition after annealing at 573K for 317.9 days IRMbackfield_aq-B-27-300deg-30day-4 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0075 293 0.000002702 0.2 317.9 81.4 IRM backfield acquisition after annealing at 573K for 317.9 days IRMbackfield_aq-B-27-300deg-30day-5 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.000002442 0.2 317.9 80.8 IRM backfield acquisition after annealing at 573K for 317.9 days IRMbackfield_aq-B-27-300deg-30day-6 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0125 293 0.0000022009999999999998 0.2 321.9 80.2 IRM backfield acquisition after annealing at 573K for 321.9 days IRMbackfield_aq-B-27-300deg-30day-7 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.0000019849999999999996 0.2 322 79.6 IRM backfield acquisition after annealing at 573K for 322 days IRMbackfield_aq-B-27-300deg-30day-8 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.0000015909999999999999 0.1 313.3 78.3 IRM backfield acquisition after annealing at 573K for 313.3 days IRMbackfield_aq-B-27-300deg-30day-9 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.000001173 0.2 320.2 76 IRM backfield acquisition after annealing at 573K for 320.2 days IRMbackfield_aq-B-27-300deg-30day-10 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 9.077e-7 0.2 321.2 72.8 IRM backfield acquisition after annealing at 573K for 321.2 days IRMbackfield_aq-B-27-300deg-30day-11 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.035 293 5.739e-7 0.3 323 67.1 IRM backfield acquisition after annealing at 573K for 323 days IRMbackfield_aq-B-27-300deg-30day-12 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 2.801e-7 0.6 318.4 48.1 IRM backfield acquisition after annealing at 573K for 318.4 days IRMbackfield_aq-B-27-300deg-30day-13 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 3.001e-7 0.3 314.5 -60.3 IRM backfield acquisition after annealing at 573K for 314.5 days IRMbackfield_aq-B-27-300deg-30day-14 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.06 293 6.599e-7 0.2 307.7 -85 IRM backfield acquisition after annealing at 573K for 307.7 days IRMbackfield_aq-B-27-300deg-30day-15 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.07 293 9.81e-7 0.3 266.1 -86.5 IRM backfield acquisition after annealing at 573K for 266.1 days IRMbackfield_aq-B-27-300deg-30day-16 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.000001288 0.2 173.1 -87.5 IRM backfield acquisition after annealing at 573K for 173.1 days IRMbackfield_aq-B-27-300deg-30day-17 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 0.0000017309999999999998 0.2 136.6 -86.4 IRM backfield acquisition after annealing at 573K for 136.6 days IRMbackfield_aq-B-27-300deg-30day-18 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.125 293 0.0000021120000000000003 0.2 145.6 -85 IRM backfield acquisition after annealing at 573K for 145.6 days IRMbackfield_aq-B-27-300deg-30day-19 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 0.0000024209999999999998 0.2 153.1 -84.3 IRM backfield acquisition after annealing at 573K for 153.1 days IRMbackfield_aq-B-27-300deg-30day-20 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.175 293 0.00000265 0.2 142.9 -83.4 IRM backfield acquisition after annealing at 573K for 142.9 days IRMbackfield_aq-B-27-300deg-30day-21 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 0.000002824 0.2 148.2 -83.9 IRM backfield acquisition after annealing at 573K for 148.2 days IRMbackfield_aq-B-27-300deg-30day-22 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.25 293 0.000003048 0.2 154.6 -84 IRM backfield acquisition after annealing at 573K for 154.6 days IRMbackfield_aq-B-27-300deg-30day-23 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.000003224 0.2 148.3 -83.7 IRM backfield acquisition after annealing at 573K for 148.3 days IRMbackfield_aq-B-27-300deg-30day-24 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.35 293 0.000003339 0.2 151.1 -83.3 IRM backfield acquisition after annealing at 573K for 151.1 days IRMbackfield_aq-B-27-300deg-30day-25 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.0000034129999999999998 0.1 146.2 -83.9 IRM backfield acquisition after annealing at 573K for 146.2 days IRMbackfield_aq-B-27-300deg-30day-26 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.5 293 0.0000034749999999999998 0.2 143.5 -83.1 IRM backfield acquisition after annealing at 573K for 143.5 days IRMbackfield_aq-B-27-300deg-30day-27 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.0000035309999999999997 0.2 151.8 -82.8 IRM backfield acquisition after annealing at 573K for 151.8 days IRMbackfield_aq-B-27-300deg-30day-28 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.000003558 0.2 152.2 -82.7 IRM backfield acquisition after annealing at 573K for 152.2 days IRMbackfield_aq-B-27-300deg-30day-29 IRMbackfield_aq-B-27-300deg-30day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.0000035660000000000002 0.2 159 -82.7 IRM backfield acquisition after annealing at 573K for 159 days IRMbackfield_aq-B-27-300deg-60day-1 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.000003418 0.1 358 76.2 IRM backfield acquisition after annealing at 573K for 358 days IRMbackfield_aq-B-27-300deg-60day-2 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.003 293 0.0000033 0.1 350.8 77.4 IRM backfield acquisition after annealing at 573K for 350.8 days IRMbackfield_aq-B-27-300deg-60day-3 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.005 293 0.000003005 0.2 347.7 78 IRM backfield acquisition after annealing at 573K for 347.7 days IRMbackfield_aq-B-27-300deg-60day-4 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0075 293 0.0000027490000000000003 0.1 345.6 78 IRM backfield acquisition after annealing at 573K for 345.6 days IRMbackfield_aq-B-27-300deg-60day-5 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.0000025010000000000003 0.2 338.8 78.3 IRM backfield acquisition after annealing at 573K for 338.8 days IRMbackfield_aq-B-27-300deg-60day-6 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0125 293 0.000002293 0.2 343.9 77.6 IRM backfield acquisition after annealing at 573K for 343.9 days IRMbackfield_aq-B-27-300deg-60day-7 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.0000020769999999999998 0.2 346.5 77.4 IRM backfield acquisition after annealing at 573K for 346.5 days IRMbackfield_aq-B-27-300deg-60day-8 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.0000016999999999999998 0.1 335.5 76.2 IRM backfield acquisition after annealing at 573K for 335.5 days IRMbackfield_aq-B-27-300deg-60day-9 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.0000013350000000000001 0.1 335.8 74.3 IRM backfield acquisition after annealing at 573K for 335.8 days IRMbackfield_aq-B-27-300deg-60day-10 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 0.000001009 0.1 324.5 71.6 IRM backfield acquisition after annealing at 573K for 324.5 days IRMbackfield_aq-B-27-300deg-60day-11 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.035 293 6.772e-7 0.4 331.4 66 IRM backfield acquisition after annealing at 573K for 331.4 days IRMbackfield_aq-B-27-300deg-60day-12 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 3.624e-7 1 333 53.3 IRM backfield acquisition after annealing at 573K for 333 days IRMbackfield_aq-B-27-300deg-60day-13 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 3.0029999999999996e-7 0.4 339 -58.8 IRM backfield acquisition after annealing at 573K for 339 days IRMbackfield_aq-B-27-300deg-60day-14 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.06 293 6.078e-7 0.3 335.7 -83.1 IRM backfield acquisition after annealing at 573K for 335.7 days IRMbackfield_aq-B-27-300deg-60day-15 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.07 293 9.354e-7 0.2 347.3 -88 IRM backfield acquisition after annealing at 573K for 347.3 days IRMbackfield_aq-B-27-300deg-60day-16 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.000001238 0.2 92.3 -87.8 IRM backfield acquisition after annealing at 573K for 92.3 days IRMbackfield_aq-B-27-300deg-60day-17 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 0.000001666 0.2 138.2 -86.7 IRM backfield acquisition after annealing at 573K for 138.2 days IRMbackfield_aq-B-27-300deg-60day-18 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.125 293 0.000002152 0.1 131.6 -85.3 IRM backfield acquisition after annealing at 573K for 131.6 days IRMbackfield_aq-B-27-300deg-60day-19 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 0.000002388 0.2 144.8 -84.8 IRM backfield acquisition after annealing at 573K for 144.8 days IRMbackfield_aq-B-27-300deg-60day-20 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.175 293 0.00000264 0.2 165.3 -83.9 IRM backfield acquisition after annealing at 573K for 165.3 days IRMbackfield_aq-B-27-300deg-60day-21 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 0.000002806 0.2 160.7 -83.7 IRM backfield acquisition after annealing at 573K for 160.7 days IRMbackfield_aq-B-27-300deg-60day-22 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.25 293 0.000003072 0.2 153.3 -83.5 IRM backfield acquisition after annealing at 573K for 153.3 days IRMbackfield_aq-B-27-300deg-60day-23 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.0000032269999999999998 0.2 151.4 -83.8 IRM backfield acquisition after annealing at 573K for 151.4 days IRMbackfield_aq-B-27-300deg-60day-24 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.35 293 0.000003334 0.2 150.2 -83.5 IRM backfield acquisition after annealing at 573K for 150.2 days IRMbackfield_aq-B-27-300deg-60day-25 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.000003435 0.1 145.3 -83.4 IRM backfield acquisition after annealing at 573K for 145.3 days IRMbackfield_aq-B-27-300deg-60day-26 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.5 293 0.00000349 0.2 153.2 -83.3 IRM backfield acquisition after annealing at 573K for 153.2 days IRMbackfield_aq-B-27-300deg-60day-27 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.000003523 0.2 161.2 -82.9 IRM backfield acquisition after annealing at 573K for 161.2 days IRMbackfield_aq-B-27-300deg-60day-28 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.0000035890000000000003 0.2 146.7 -82.7 IRM backfield acquisition after annealing at 573K for 146.7 days IRMbackfield_aq-B-27-300deg-60day-29 IRMbackfield_aq-B-27-300deg-60day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.000003625 0.2 161 -82.2 IRM backfield acquisition after annealing at 573K for 161 days IRMbackfield_aq-B-27-300deg-120day-3 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.000003591 0.3 327.1 84.3 IRM backfield acquisition after annealing at 573K for 327.1 days IRMbackfield_aq-B-27-300deg-120day-4 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.003 293 0.000003416 0.2 323.7 84 IRM backfield acquisition after annealing at 573K for 323.7 days IRMbackfield_aq-B-27-300deg-120day-5 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.005 293 0.000003067 0.3 323.3 83.6 IRM backfield acquisition after annealing at 573K for 323.3 days IRMbackfield_aq-B-27-300deg-120day-6 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0075 293 0.000002789 0.3 330.9 83.2 IRM backfield acquisition after annealing at 573K for 330.9 days IRMbackfield_aq-B-27-300deg-120day-7 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.000002531 0.1 326.9 82.5 IRM backfield acquisition after annealing at 573K for 326.9 days IRMbackfield_aq-B-27-300deg-120day-8 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0125 293 0.000002323 0.3 331.2 82.1 IRM backfield acquisition after annealing at 573K for 331.2 days IRMbackfield_aq-B-27-300deg-120day-9 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.000002078 0.3 321.1 81.5 IRM backfield acquisition after annealing at 573K for 321.1 days IRMbackfield_aq-B-27-300deg-120day-10 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.0000016770000000000002 0.4 326.5 80 IRM backfield acquisition after annealing at 573K for 326.5 days IRMbackfield_aq-B-27-300deg-120day-11 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.000001315 0.3 337.3 78.4 IRM backfield acquisition after annealing at 573K for 337.3 days IRMbackfield_aq-B-27-300deg-120day-12 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 0.000001037 0.4 323.7 76.1 IRM backfield acquisition after annealing at 573K for 323.7 days IRMbackfield_aq-B-27-300deg-120day-13 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.035 293 6.962e-7 0.1 337.9 72.5 IRM backfield acquisition after annealing at 573K for 337.9 days IRMbackfield_aq-B-27-300deg-120day-14 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 3.954e-7 0.4 335.2 61 IRM backfield acquisition after annealing at 573K for 335.2 days IRMbackfield_aq-B-27-300deg-120day-15 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 1.911e-7 1.4 334.4 -47.3 IRM backfield acquisition after annealing at 573K for 334.4 days IRMbackfield_aq-B-27-300deg-120day-16 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.06 293 5.583e-7 0.4 309.6 -83.2 IRM backfield acquisition after annealing at 573K for 309.6 days IRMbackfield_aq-B-27-300deg-120day-17 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.07 293 9.104e-7 0.3 137.7 -89.3 IRM backfield acquisition after annealing at 573K for 137.7 days IRMbackfield_aq-B-27-300deg-120day-18 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.0000012 0.3 187.3 -88.4 IRM backfield acquisition after annealing at 573K for 187.3 days IRMbackfield_aq-B-27-300deg-120day-19 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 0.0000016540000000000002 0.3 135.5 -85.8 IRM backfield acquisition after annealing at 573K for 135.5 days IRMbackfield_aq-B-27-300deg-120day-20 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.125 293 0.0000020709999999999997 0.3 175.4 -84.9 IRM backfield acquisition after annealing at 573K for 175.4 days IRMbackfield_aq-B-27-300deg-120day-21 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 0.0000023739999999999996 0.2 168.2 -85.1 IRM backfield acquisition after annealing at 573K for 168.2 days IRMbackfield_aq-B-27-300deg-120day-22 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.175 293 0.000002618 0.5 149.7 -84 IRM backfield acquisition after annealing at 573K for 149.7 days IRMbackfield_aq-B-27-300deg-120day-23 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 0.000002814 0.3 141.9 -83.9 IRM backfield acquisition after annealing at 573K for 141.9 days IRMbackfield_aq-B-27-300deg-120day-24 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.25 293 0.0000030530000000000002 0.2 152.4 -84.1 IRM backfield acquisition after annealing at 573K for 152.4 days IRMbackfield_aq-B-27-300deg-120day-25 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.000003229 0.2 145.4 -84.4 IRM backfield acquisition after annealing at 573K for 145.4 days IRMbackfield_aq-B-27-300deg-120day-26 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.35 293 0.0000033540000000000004 0.3 156.5 -83.8 IRM backfield acquisition after annealing at 573K for 156.5 days IRMbackfield_aq-B-27-300deg-120day-27 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.000003426 0.4 153.4 -83.8 IRM backfield acquisition after annealing at 573K for 153.4 days IRMbackfield_aq-B-27-300deg-120day-28 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.5 293 0.000003525 0.2 155.4 -83.6 IRM backfield acquisition after annealing at 573K for 155.4 days IRMbackfield_aq-B-27-300deg-120day-29 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.00000358 0.4 142.2 -83.5 IRM backfield acquisition after annealing at 573K for 142.2 days IRMbackfield_aq-B-27-300deg-120day-30 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.000003624 0.3 143.4 -83.1 IRM backfield acquisition after annealing at 573K for 143.4 days IRMbackfield_aq-B-27-300deg-120day-31 IRMbackfield_aq-B-27-300deg-120day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.000003661 0.5 148 -82.9 IRM backfield acquisition after annealing at 573K for 148 days IRMbackfield_aq-B-27-300deg-240day-1 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 0 293 0.0000018979999999999999 0.2 143.9 -81.8 IRM backfield acquisition after annealing at 573K for 143.9 days IRMbackfield_aq-B-27-300deg-240day-2 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.000003545 0.2 309.5 84 IRM backfield acquisition after annealing at 573K for 309.5 days IRMbackfield_aq-B-27-300deg-240day-3 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.003 293 0.00000324 0.2 310 83.6 IRM backfield acquisition after annealing at 573K for 310 days IRMbackfield_aq-B-27-300deg-240day-4 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.005 293 0.000003008 0.2 307.3 83.4 IRM backfield acquisition after annealing at 573K for 307.3 days IRMbackfield_aq-B-27-300deg-240day-5 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0075 293 0.0000027330000000000003 0.3 308.9 83.1 IRM backfield acquisition after annealing at 573K for 308.9 days IRMbackfield_aq-B-27-300deg-240day-6 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.000002475 0.2 314.2 82.5 IRM backfield acquisition after annealing at 573K for 314.2 days IRMbackfield_aq-B-27-300deg-240day-7 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0125 293 0.000002235 0.3 310.1 81.6 IRM backfield acquisition after annealing at 573K for 310.1 days IRMbackfield_aq-B-27-300deg-240day-8 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.000002025 0.2 312.5 81.1 IRM backfield acquisition after annealing at 573K for 312.5 days IRMbackfield_aq-B-27-300deg-240day-9 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.00000162 0.3 315.6 80.6 IRM backfield acquisition after annealing at 573K for 315.6 days IRMbackfield_aq-B-27-300deg-240day-10 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.0000012609999999999999 0.3 309.4 78.2 IRM backfield acquisition after annealing at 573K for 309.4 days IRMbackfield_aq-B-27-300deg-240day-11 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 9.414e-7 0.4 310.4 76.3 IRM backfield acquisition after annealing at 573K for 310.4 days IRMbackfield_aq-B-27-300deg-240day-12 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.035 293 6.154e-7 0.4 305.6 69.1 IRM backfield acquisition after annealing at 573K for 305.6 days IRMbackfield_aq-B-27-300deg-240day-13 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 3.297e-7 0.3 299.1 52.4 IRM backfield acquisition after annealing at 573K for 299.1 days IRMbackfield_aq-B-27-300deg-240day-14 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.045 293 1.424e-7 1 312.3 -4.8 IRM backfield acquisition after annealing at 573K for 312.3 days IRMbackfield_aq-B-27-300deg-240day-15 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 2.771e-7 0.3 300.5 -61.8 IRM backfield acquisition after annealing at 573K for 300.5 days IRMbackfield_aq-B-27-300deg-240day-16 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.06 293 6.301e-7 0.2 281.4 -84.7 IRM backfield acquisition after annealing at 573K for 281.4 days IRMbackfield_aq-B-27-300deg-240day-17 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.07 293 9.617e-7 0.4 243.9 -87 IRM backfield acquisition after annealing at 573K for 243.9 days IRMbackfield_aq-B-27-300deg-240day-18 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.000001269 0.2 129.5 -86.7 IRM backfield acquisition after annealing at 573K for 129.5 days IRMbackfield_aq-B-27-300deg-240day-19 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.09 293 0.000001513 0.3 161.7 -86 IRM backfield acquisition after annealing at 573K for 161.7 days IRMbackfield_aq-B-27-300deg-240day-20 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 0.000001713 0.2 155.5 -86.3 IRM backfield acquisition after annealing at 573K for 155.5 days IRMbackfield_aq-B-27-300deg-240day-21 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.125 293 0.0000021159999999999997 0.2 164.6 -84.9 IRM backfield acquisition after annealing at 573K for 164.6 days IRMbackfield_aq-B-27-300deg-240day-22 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 0.000002423 0.2 144.2 -84.5 IRM backfield acquisition after annealing at 573K for 144.2 days IRMbackfield_aq-B-27-300deg-240day-23 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.175 293 0.000002651 0.2 142.8 -84.1 IRM backfield acquisition after annealing at 573K for 142.8 days IRMbackfield_aq-B-27-300deg-240day-24 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 0.000002836 0.2 149.5 -83.9 IRM backfield acquisition after annealing at 573K for 149.5 days IRMbackfield_aq-B-27-300deg-240day-25 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.25 293 0.000003081 0.3 139.7 -84.2 IRM backfield acquisition after annealing at 573K for 139.7 days IRMbackfield_aq-B-27-300deg-240day-26 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.000003245 0.2 149.1 -84.1 IRM backfield acquisition after annealing at 573K for 149.1 days IRMbackfield_aq-B-27-300deg-240day-27 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.35 293 0.000003365 0.2 141.1 -83.2 IRM backfield acquisition after annealing at 573K for 141.1 days IRMbackfield_aq-B-27-300deg-240day-28 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.00000344 0.2 149.3 -83.9 IRM backfield acquisition after annealing at 573K for 149.3 days IRMbackfield_aq-B-27-300deg-240day-29 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.5 293 0.00000352 0.1 145 -83.2 IRM backfield acquisition after annealing at 573K for 145 days IRMbackfield_aq-B-27-300deg-240day-30 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.000003565 0.2 140.1 -83.1 IRM backfield acquisition after annealing at 573K for 140.1 days IRMbackfield_aq-B-27-300deg-240day-31 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.000003596 0.3 151.2 -83.3 IRM backfield acquisition after annealing at 573K for 151.2 days IRMbackfield_aq-B-27-300deg-240day-32 IRMbackfield_aq-B-27-300deg-240day B-27 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.000003623 0.2 150.7 -83 IRM backfield acquisition after annealing at 573K for 150.7 days IRMbackfield_aq-B-28-400deg-0day-1 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 0 293 8.161e-8 3.3 329.8 -41.6 IRM backfield acquisition after annealing at 673K for 329.8 days IRMbackfield_aq-B-28-400deg-0day-2 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 0.0000032659999999999997 0.9 33.9 86.7 IRM backfield acquisition after annealing at 673K for 33.9 days IRMbackfield_aq-B-28-400deg-0day-3 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 0.0000024589999999999997 0.3 321.7 87.7 IRM backfield acquisition after annealing at 673K for 321.7 days IRMbackfield_aq-B-28-400deg-0day-4 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 0.00000203 0.2 312.7 87.2 IRM backfield acquisition after annealing at 673K for 312.7 days IRMbackfield_aq-B-28-400deg-0day-5 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 0.000001634 0.2 330.3 87.5 IRM backfield acquisition after annealing at 673K for 330.3 days IRMbackfield_aq-B-28-400deg-0day-6 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 0.0000012730000000000001 0.2 5.3 87.1 IRM backfield acquisition after annealing at 673K for 5.3 days IRMbackfield_aq-B-28-400deg-0day-7 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 9.46e-7 0.3 8 87 IRM backfield acquisition after annealing at 673K for 8 days IRMbackfield_aq-B-28-400deg-0day-8 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 3.515e-7 0.9 358.1 69.7 IRM backfield acquisition after annealing at 673K for 358.1 days IRMbackfield_aq-B-28-400deg-0day-9 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 1.964e-7 1.5 38.8 -47.7 IRM backfield acquisition after annealing at 673K for 38.8 days IRMbackfield_aq-B-28-400deg-0day-10 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 0.000001053 0.4 26.1 -85 IRM backfield acquisition after annealing at 673K for 26.1 days IRMbackfield_aq-B-28-400deg-0day-11 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 0.000001464 0.3 27.5 -84.2 IRM backfield acquisition after annealing at 673K for 27.5 days IRMbackfield_aq-B-28-400deg-0day-12 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 0.000002114 0.5 61.1 -83.5 IRM backfield acquisition after annealing at 673K for 61.1 days IRMbackfield_aq-B-28-400deg-0day-13 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 0.000002504 0.3 45.7 -86 IRM backfield acquisition after annealing at 673K for 45.7 days IRMbackfield_aq-B-28-400deg-0day-14 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 0.000003197 0.2 56.5 -86.5 IRM backfield acquisition after annealing at 673K for 56.5 days IRMbackfield_aq-B-28-400deg-0day-15 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 0.000003341 0.4 72.7 -86.5 IRM backfield acquisition after annealing at 673K for 72.7 days IRMbackfield_aq-B-28-400deg-0day-16 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 0.000003426 0.3 66 -86.9 IRM backfield acquisition after annealing at 673K for 66 days IRMbackfield_aq-B-28-400deg-0day-17 IRMbackfield_aq-B-28-400deg-0day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 0.0000034250000000000002 0.3 77.4 -86.7 IRM backfield acquisition after annealing at 673K for 77.4 days IRMbackfield_aq-B-28-400deg-15day-1 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 0 293 3.138e-8 2.2 328.6 -83.8 IRM backfield acquisition after annealing at 673K for 328.6 days IRMbackfield_aq-B-28-400deg-15day-2 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 0.000003396 0.3 237.3 86.7 IRM backfield acquisition after annealing at 673K for 237.3 days IRMbackfield_aq-B-28-400deg-15day-3 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 0.000002472 0.3 246.3 85.9 IRM backfield acquisition after annealing at 673K for 246.3 days IRMbackfield_aq-B-28-400deg-15day-4 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 0.000002025 0.2 244.2 85.9 IRM backfield acquisition after annealing at 673K for 244.2 days IRMbackfield_aq-B-28-400deg-15day-5 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 0.000001619 0.3 248.5 85.5 IRM backfield acquisition after annealing at 673K for 248.5 days IRMbackfield_aq-B-28-400deg-15day-6 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 0.00000124 0.3 255 86.2 IRM backfield acquisition after annealing at 673K for 255 days IRMbackfield_aq-B-28-400deg-15day-7 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 9.145e-7 0.3 268.8 86.3 IRM backfield acquisition after annealing at 673K for 268.8 days IRMbackfield_aq-B-28-400deg-15day-8 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 2.7040000000000004e-7 0.4 47.5 82.1 IRM backfield acquisition after annealing at 673K for 47.5 days IRMbackfield_aq-B-28-400deg-15day-9 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 2.213e-7 0.1 347.4 -73.5 IRM backfield acquisition after annealing at 673K for 347.4 days IRMbackfield_aq-B-28-400deg-15day-10 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 0.000001138 0.2 37.9 -84.2 IRM backfield acquisition after annealing at 673K for 37.9 days IRMbackfield_aq-B-28-400deg-15day-11 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 0.0000015490000000000001 0.2 45.9 -84.9 IRM backfield acquisition after annealing at 673K for 45.9 days IRMbackfield_aq-B-28-400deg-15day-12 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 0.000002182 0.3 48.4 -85.6 IRM backfield acquisition after annealing at 673K for 48.4 days IRMbackfield_aq-B-28-400deg-15day-13 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 0.0000025630000000000003 0.2 58.8 -85.8 IRM backfield acquisition after annealing at 673K for 58.8 days IRMbackfield_aq-B-28-400deg-15day-14 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 0.000003007 0.3 71.3 -86.1 IRM backfield acquisition after annealing at 673K for 71.3 days IRMbackfield_aq-B-28-400deg-15day-15 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 0.00000318 0.3 67 -86.4 IRM backfield acquisition after annealing at 673K for 67 days IRMbackfield_aq-B-28-400deg-15day-16 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 0.0000032989999999999997 0.3 82.5 -86.6 IRM backfield acquisition after annealing at 673K for 82.5 days IRMbackfield_aq-B-28-400deg-15day-17 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 0.000003344 0.3 82.6 -86.9 IRM backfield acquisition after annealing at 673K for 82.6 days IRMbackfield_aq-B-28-400deg-15day-18 IRMbackfield_aq-B-28-400deg-15day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 0.000003401 0.3 76.6 -86.7 IRM backfield acquisition after annealing at 673K for 76.6 days IRMbackfield_aq-B-28-400deg-30day-1 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 0.000003163 0.2 234.3 84.7 IRM backfield acquisition after annealing at 673K for 234.3 days IRMbackfield_aq-B-28-400deg-30day-2 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.003 293 0.000003137 0.2 239.6 84.9 IRM backfield acquisition after annealing at 673K for 239.6 days IRMbackfield_aq-B-28-400deg-30day-3 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.005 293 0.000002923 0.2 242.4 85.8 IRM backfield acquisition after annealing at 673K for 242.4 days IRMbackfield_aq-B-28-400deg-30day-4 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0075 293 0.000002663 0.2 247.6 85.9 IRM backfield acquisition after annealing at 673K for 247.6 days IRMbackfield_aq-B-28-400deg-30day-5 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 0.000002395 0.2 248.5 85.9 IRM backfield acquisition after annealing at 673K for 248.5 days IRMbackfield_aq-B-28-400deg-30day-6 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0125 293 0.000002148 0.2 250.7 85.6 IRM backfield acquisition after annealing at 673K for 250.7 days IRMbackfield_aq-B-28-400deg-30day-7 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 0.000001913 0.3 252.7 85.8 IRM backfield acquisition after annealing at 673K for 252.7 days IRMbackfield_aq-B-28-400deg-30day-8 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 0.000001489 0.2 263.7 85.6 IRM backfield acquisition after annealing at 673K for 263.7 days IRMbackfield_aq-B-28-400deg-30day-9 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 0.000001032 0.2 266.7 85 IRM backfield acquisition after annealing at 673K for 266.7 days IRMbackfield_aq-B-28-400deg-30day-10 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 7.456e-7 0.3 278.3 83.5 IRM backfield acquisition after annealing at 673K for 278.3 days IRMbackfield_aq-B-28-400deg-30day-11 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.035 293 3.97e-7 0.3 301.6 83 IRM backfield acquisition after annealing at 673K for 301.6 days IRMbackfield_aq-B-28-400deg-30day-12 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 8.658e-8 0.7 325 52.9 IRM backfield acquisition after annealing at 673K for 325 days IRMbackfield_aq-B-28-400deg-30day-13 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 4.127e-7 0.1 350.8 -80.5 IRM backfield acquisition after annealing at 673K for 350.8 days IRMbackfield_aq-B-28-400deg-30day-14 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.06 293 7.816000000000001e-7 0.1 347.7 -85.9 IRM backfield acquisition after annealing at 673K for 347.7 days IRMbackfield_aq-B-28-400deg-30day-15 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.07 293 0.000001088 0.2 18.1 -86.4 IRM backfield acquisition after annealing at 673K for 18.1 days IRMbackfield_aq-B-28-400deg-30day-16 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 0.000001352 0.2 39.8 -85.4 IRM backfield acquisition after annealing at 673K for 39.8 days IRMbackfield_aq-B-28-400deg-30day-17 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 0.000001728 0.2 47.8 -86.1 IRM backfield acquisition after annealing at 673K for 47.8 days IRMbackfield_aq-B-28-400deg-30day-18 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.125 293 0.000002053 0.2 61.1 -85.3 IRM backfield acquisition after annealing at 673K for 61.1 days IRMbackfield_aq-B-28-400deg-30day-19 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 0.000002323 0.2 63.1 -85.8 IRM backfield acquisition after annealing at 673K for 63.1 days IRMbackfield_aq-B-28-400deg-30day-20 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.175 293 0.000002536 0.2 70.2 -85.5 IRM backfield acquisition after annealing at 673K for 70.2 days IRMbackfield_aq-B-28-400deg-30day-21 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 0.000002702 0.2 68 -85.8 IRM backfield acquisition after annealing at 673K for 68 days IRMbackfield_aq-B-28-400deg-30day-22 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.25 293 0.000002931 0.2 82.4 -86.3 IRM backfield acquisition after annealing at 673K for 82.4 days IRMbackfield_aq-B-28-400deg-30day-23 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 0.000003094 0.2 77.8 -87 IRM backfield acquisition after annealing at 673K for 77.8 days IRMbackfield_aq-B-28-400deg-30day-24 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.35 293 0.000003199 0.1 79.3 -86.4 IRM backfield acquisition after annealing at 673K for 79.3 days IRMbackfield_aq-B-28-400deg-30day-25 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 0.000003272 0.2 72.2 -86.4 IRM backfield acquisition after annealing at 673K for 72.2 days IRMbackfield_aq-B-28-400deg-30day-26 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.5 293 0.000003341 0.2 81.4 -86.9 IRM backfield acquisition after annealing at 673K for 81.4 days IRMbackfield_aq-B-28-400deg-30day-27 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 0.000003392 0.2 85.9 -86.9 IRM backfield acquisition after annealing at 673K for 85.9 days IRMbackfield_aq-B-28-400deg-30day-28 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 0.000003414 0.2 86.2 -87.3 IRM backfield acquisition after annealing at 673K for 86.2 days IRMbackfield_aq-B-28-400deg-30day-29 IRMbackfield_aq-B-28-400deg-30day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 0.0000034320000000000003 0.2 85.6 -86.6 IRM backfield acquisition after annealing at 673K for 85.6 days IRMbackfield_aq-B-28-400deg-60day-1 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 0.000003555 0.1 239.4 84.3 IRM backfield acquisition after annealing at 673K for 239.4 days IRMbackfield_aq-B-28-400deg-60day-2 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.003 293 0.0000034459999999999997 0.1 237.8 83.8 IRM backfield acquisition after annealing at 673K for 237.8 days IRMbackfield_aq-B-28-400deg-60day-3 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.005 293 0.00000317 0.1 241.4 84.6 IRM backfield acquisition after annealing at 673K for 241.4 days IRMbackfield_aq-B-28-400deg-60day-4 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0075 293 0.0000028939999999999997 0.1 239.1 85.2 IRM backfield acquisition after annealing at 673K for 239.1 days IRMbackfield_aq-B-28-400deg-60day-5 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 0.0000026080000000000003 0.1 245.4 85.7 IRM backfield acquisition after annealing at 673K for 245.4 days IRMbackfield_aq-B-28-400deg-60day-6 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0125 293 0.000002326 0.1 246.1 85.8 IRM backfield acquisition after annealing at 673K for 246.1 days IRMbackfield_aq-B-28-400deg-60day-7 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 0.000002062 0.2 245.2 86.4 IRM backfield acquisition after annealing at 673K for 245.2 days IRMbackfield_aq-B-28-400deg-60day-8 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 0.000001625 0.2 251.7 86.3 IRM backfield acquisition after annealing at 673K for 251.7 days IRMbackfield_aq-B-28-400deg-60day-9 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 0.000001166 0.4 255.2 86.2 IRM backfield acquisition after annealing at 673K for 255.2 days IRMbackfield_aq-B-28-400deg-60day-10 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 7.635e-7 0.2 272.4 85 IRM backfield acquisition after annealing at 673K for 272.4 days IRMbackfield_aq-B-28-400deg-60day-11 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.035 293 3.623e-7 0.2 279.9 82 IRM backfield acquisition after annealing at 673K for 279.9 days IRMbackfield_aq-B-28-400deg-60day-12 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 6.685999999999999e-8 1.1 333.2 2.5 IRM backfield acquisition after annealing at 673K for 333.2 days IRMbackfield_aq-B-28-400deg-60day-13 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 5.929000000000001e-7 0.2 341.6 -82 IRM backfield acquisition after annealing at 673K for 341.6 days IRMbackfield_aq-B-28-400deg-60day-14 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.06 293 9.976e-7 0.1 17.7 -85.3 IRM backfield acquisition after annealing at 673K for 17.7 days IRMbackfield_aq-B-28-400deg-60day-15 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.07 293 0.000001274 0.2 34 -85.6 IRM backfield acquisition after annealing at 673K for 34 days IRMbackfield_aq-B-28-400deg-60day-16 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 0.000001554 0.1 37 -85.4 IRM backfield acquisition after annealing at 673K for 37 days IRMbackfield_aq-B-28-400deg-60day-17 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 0.000001936 0.1 50.7 -85.1 IRM backfield acquisition after annealing at 673K for 50.7 days IRMbackfield_aq-B-28-400deg-60day-18 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.125 293 0.0000022920000000000002 0.1 38.9 -87.1 IRM backfield acquisition after annealing at 673K for 38.9 days IRMbackfield_aq-B-28-400deg-60day-19 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 0.000002551 0.1 40.5 -87.3 IRM backfield acquisition after annealing at 673K for 40.5 days IRMbackfield_aq-B-28-400deg-60day-20 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.175 293 0.000002787 0.2 61.6 -86.7 IRM backfield acquisition after annealing at 673K for 61.6 days IRMbackfield_aq-B-28-400deg-60day-21 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 0.000002943 0.1 57.8 -88.4 IRM backfield acquisition after annealing at 673K for 57.8 days IRMbackfield_aq-B-28-400deg-60day-22 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.25 293 0.0000031979999999999997 0.1 65.8 -86.9 IRM backfield acquisition after annealing at 673K for 65.8 days IRMbackfield_aq-B-28-400deg-60day-23 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 0.0000033509999999999998 0.1 63 -87.2 IRM backfield acquisition after annealing at 673K for 63 days IRMbackfield_aq-B-28-400deg-60day-24 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.35 293 0.00000345 0.1 67.1 -88 IRM backfield acquisition after annealing at 673K for 67.1 days IRMbackfield_aq-B-28-400deg-60day-25 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 0.000003537 0.1 73.5 -87.5 IRM backfield acquisition after annealing at 673K for 73.5 days IRMbackfield_aq-B-28-400deg-60day-26 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.5 293 0.000003594 0.1 78.7 -87.6 IRM backfield acquisition after annealing at 673K for 78.7 days IRMbackfield_aq-B-28-400deg-60day-27 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 0.000003622 0.1 74.9 -87.3 IRM backfield acquisition after annealing at 673K for 74.9 days IRMbackfield_aq-B-28-400deg-60day-28 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 0.0000036879999999999997 0.1 88.2 -87.6 IRM backfield acquisition after annealing at 673K for 88.2 days IRMbackfield_aq-B-28-400deg-60day-29 IRMbackfield_aq-B-28-400deg-60day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 0.0000037 0.1 88.9 -87.5 IRM backfield acquisition after annealing at 673K for 88.9 days IRMbackfield_aq-B-28-400deg-120day-1 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 0.0000041469999999999994 0.1 241.6 87.8 IRM backfield acquisition after annealing at 673K for 241.6 days IRMbackfield_aq-B-28-400deg-120day-2 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.003 293 0.0000040150000000000005 0.1 241.3 87.4 IRM backfield acquisition after annealing at 673K for 241.3 days IRMbackfield_aq-B-28-400deg-120day-3 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.005 293 0.0000036740000000000003 0.2 231.8 86.8 IRM backfield acquisition after annealing at 673K for 231.8 days IRMbackfield_aq-B-28-400deg-120day-4 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0075 293 0.000003346 0.1 233 86.9 IRM backfield acquisition after annealing at 673K for 233 days IRMbackfield_aq-B-28-400deg-120day-5 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 0.000003027 0.1 238.3 86.9 IRM backfield acquisition after annealing at 673K for 238.3 days IRMbackfield_aq-B-28-400deg-120day-6 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0125 293 0.000002717 0.1 235.1 86.9 IRM backfield acquisition after annealing at 673K for 235.1 days IRMbackfield_aq-B-28-400deg-120day-7 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 0.000002431 0.1 241.3 86.9 IRM backfield acquisition after annealing at 673K for 241.3 days IRMbackfield_aq-B-28-400deg-120day-8 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 0.000001872 0.1 251 87.2 IRM backfield acquisition after annealing at 673K for 251 days IRMbackfield_aq-B-28-400deg-120day-9 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 0.000001336 0.1 260.9 87.9 IRM backfield acquisition after annealing at 673K for 260.9 days IRMbackfield_aq-B-28-400deg-120day-10 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 8.705e-7 0.1 294.2 86.5 IRM backfield acquisition after annealing at 673K for 294.2 days IRMbackfield_aq-B-28-400deg-120day-11 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.035 293 3.863e-7 0.2 342.5 82.1 IRM backfield acquisition after annealing at 673K for 342.5 days IRMbackfield_aq-B-28-400deg-120day-12 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 9.626e-8 0.7 357.1 -40.2 IRM backfield acquisition after annealing at 673K for 357.1 days IRMbackfield_aq-B-28-400deg-120day-13 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 7.283e-7 0.1 358.9 -82.1 IRM backfield acquisition after annealing at 673K for 358.9 days IRMbackfield_aq-B-28-400deg-120day-14 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.06 293 0.000001222 0.1 22.1 -85.1 IRM backfield acquisition after annealing at 673K for 22.1 days IRMbackfield_aq-B-28-400deg-120day-15 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.07 293 0.000001606 0.1 26 -86 IRM backfield acquisition after annealing at 673K for 26 days IRMbackfield_aq-B-28-400deg-120day-16 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 0.000001952 0.1 47.6 -85.4 IRM backfield acquisition after annealing at 673K for 47.6 days IRMbackfield_aq-B-28-400deg-120day-17 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 0.000002405 0.1 36.8 -86.8 IRM backfield acquisition after annealing at 673K for 36.8 days IRMbackfield_aq-B-28-400deg-120day-18 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.125 293 0.000002804 0.1 53.7 -86.6 IRM backfield acquisition after annealing at 673K for 53.7 days IRMbackfield_aq-B-28-400deg-120day-19 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 0.000003094 0.1 46.5 -87.3 IRM backfield acquisition after annealing at 673K for 46.5 days IRMbackfield_aq-B-28-400deg-120day-20 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.175 293 0.000003316 0.1 63.9 -87.5 IRM backfield acquisition after annealing at 673K for 63.9 days IRMbackfield_aq-B-28-400deg-120day-21 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 0.000003483 0.1 54.9 -87.8 IRM backfield acquisition after annealing at 673K for 54.9 days IRMbackfield_aq-B-28-400deg-120day-22 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.25 293 0.000003723 0.1 67 -87.4 IRM backfield acquisition after annealing at 673K for 67 days IRMbackfield_aq-B-28-400deg-120day-23 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 0.000003885 0.1 50.8 -87.6 IRM backfield acquisition after annealing at 673K for 50.8 days IRMbackfield_aq-B-28-400deg-120day-24 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.35 293 0.000003988000000000001 0.1 61.6 -87.6 IRM backfield acquisition after annealing at 673K for 61.6 days IRMbackfield_aq-B-28-400deg-120day-25 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 0.000004058 0.1 65.8 -87.7 IRM backfield acquisition after annealing at 673K for 65.8 days IRMbackfield_aq-B-28-400deg-120day-26 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.5 293 0.000004137 0.1 70.3 -87.9 IRM backfield acquisition after annealing at 673K for 70.3 days IRMbackfield_aq-B-28-400deg-120day-27 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 0.000004185000000000001 0.1 74.1 -87.9 IRM backfield acquisition after annealing at 673K for 74.1 days IRMbackfield_aq-B-28-400deg-120day-28 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 0.000004219999999999999 0.1 82 -88.2 IRM backfield acquisition after annealing at 673K for 82 days IRMbackfield_aq-B-28-400deg-120day-29 IRMbackfield_aq-B-28-400deg-120day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 0.0000042269999999999995 0.1 79.9 -88 IRM backfield acquisition after annealing at 673K for 79.9 days IRMbackfield_aq-B-28-400deg-240day-1 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 0 293 0.000001348 0.2 64.1 -86.5 IRM backfield acquisition after annealing at 673K for 64.1 days IRMbackfield_aq-B-28-400deg-240day-2 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 0.0000047689999999999996 0.2 211.7 87.3 IRM backfield acquisition after annealing at 673K for 211.7 days IRMbackfield_aq-B-28-400deg-240day-3 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.003 293 0.000004458 0.2 207.4 87.1 IRM backfield acquisition after annealing at 673K for 207.4 days IRMbackfield_aq-B-28-400deg-240day-4 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.005 293 0.000004191 0.2 204.3 87.3 IRM backfield acquisition after annealing at 673K for 204.3 days IRMbackfield_aq-B-28-400deg-240day-5 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0075 293 0.000003831 0.2 215.5 87.8 IRM backfield acquisition after annealing at 673K for 215.5 days IRMbackfield_aq-B-28-400deg-240day-6 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 0.000003473 0.2 213.8 87.8 IRM backfield acquisition after annealing at 673K for 213.8 days IRMbackfield_aq-B-28-400deg-240day-7 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0125 293 0.000003124 0.2 217.8 87.8 IRM backfield acquisition after annealing at 673K for 217.8 days IRMbackfield_aq-B-28-400deg-240day-8 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 0.000002804 0.2 215.8 87.8 IRM backfield acquisition after annealing at 673K for 215.8 days IRMbackfield_aq-B-28-400deg-240day-9 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 0.000002183 0.2 171.3 89.1 IRM backfield acquisition after annealing at 673K for 171.3 days IRMbackfield_aq-B-28-400deg-240day-10 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 0.0000015920000000000002 0.2 86.8 89.6 IRM backfield acquisition after annealing at 673K for 86.8 days IRMbackfield_aq-B-28-400deg-240day-11 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 0.000001063 0.2 49.7 88.1 IRM backfield acquisition after annealing at 673K for 49.7 days IRMbackfield_aq-B-28-400deg-240day-12 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.035 293 5.138000000000001e-7 0.2 20 83.3 IRM backfield acquisition after annealing at 673K for 20 days IRMbackfield_aq-B-28-400deg-240day-13 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 9.054e-8 0.3 16.2 -5.8 IRM backfield acquisition after annealing at 673K for 16.2 days IRMbackfield_aq-B-28-400deg-240day-14 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.045 293 4.457e-7 0.2 20.4 -75.3 IRM backfield acquisition after annealing at 673K for 20.4 days IRMbackfield_aq-B-28-400deg-240day-15 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 8.228000000000001e-7 0.2 357.6 -81.5 IRM backfield acquisition after annealing at 673K for 357.6 days IRMbackfield_aq-B-28-400deg-240day-16 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.06 293 0.000001426 0.2 49.7 -81.6 IRM backfield acquisition after annealing at 673K for 49.7 days IRMbackfield_aq-B-28-400deg-240day-17 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.07 293 0.000001929 0.2 43 -83.4 IRM backfield acquisition after annealing at 673K for 43 days IRMbackfield_aq-B-28-400deg-240day-18 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 0.00000235 0.2 42.1 -84.4 IRM backfield acquisition after annealing at 673K for 42.1 days IRMbackfield_aq-B-28-400deg-240day-19 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.09 293 0.00000269 0.2 49.4 -84.1 IRM backfield acquisition after annealing at 673K for 49.4 days IRMbackfield_aq-B-28-400deg-240day-20 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 0.000002966 0.2 55.5 -83 IRM backfield acquisition after annealing at 673K for 55.5 days IRMbackfield_aq-B-28-400deg-240day-21 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.125 293 0.000003416 0.2 49.2 -85.7 IRM backfield acquisition after annealing at 673K for 49.2 days IRMbackfield_aq-B-28-400deg-240day-22 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 0.000003737 0.2 59.5 -83.9 IRM backfield acquisition after annealing at 673K for 59.5 days IRMbackfield_aq-B-28-400deg-240day-23 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.175 293 0.0000039839999999999995 0.2 64.4 -83.2 IRM backfield acquisition after annealing at 673K for 64.4 days IRMbackfield_aq-B-28-400deg-240day-24 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 0.000004146000000000001 0.2 46.7 -86.9 IRM backfield acquisition after annealing at 673K for 46.7 days IRMbackfield_aq-B-28-400deg-240day-25 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.25 293 0.000004382 0.2 58.4 -86.5 IRM backfield acquisition after annealing at 673K for 58.4 days IRMbackfield_aq-B-28-400deg-240day-26 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 0.0000045160000000000005 0.2 32.7 -88 IRM backfield acquisition after annealing at 673K for 32.7 days IRMbackfield_aq-B-28-400deg-240day-27 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.35 293 0.000004623999999999999 0.2 43.5 -87.8 IRM backfield acquisition after annealing at 673K for 43.5 days IRMbackfield_aq-B-28-400deg-240day-28 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 0.0000047 0.2 56.7 -86.8 IRM backfield acquisition after annealing at 673K for 56.7 days IRMbackfield_aq-B-28-400deg-240day-29 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.5 293 0.000004776 0.2 69 -87.5 IRM backfield acquisition after annealing at 673K for 69 days IRMbackfield_aq-B-28-400deg-240day-30 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 0.000004809 0.2 43.5 -89 IRM backfield acquisition after annealing at 673K for 43.5 days IRMbackfield_aq-B-28-400deg-240day-31 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 0.000004856 0.2 81.6 -87.5 IRM backfield acquisition after annealing at 673K for 81.6 days IRMbackfield_aq-B-28-400deg-240day-32 IRMbackfield_aq-B-28-400deg-240day B-28 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 0.000004878999999999999 0.2 77.3 -87.1 IRM backfield acquisition after annealing at 673K for 77.3 days IRMbackfield_aq-B-29-200deg-0day-1 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 0 293 7.855e-8 0.5 140.2 -2.1 IRM backfield acquisition after annealing at 473K for 140.2 days IRMbackfield_aq-B-29-200deg-0day-2 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 0.000002665 0.8 9.5 83.3 IRM backfield acquisition after annealing at 473K for 9.5 days IRMbackfield_aq-B-29-200deg-0day-3 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 0.0000020869999999999997 0.2 8 82.7 IRM backfield acquisition after annealing at 473K for 8 days IRMbackfield_aq-B-29-200deg-0day-4 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 0.00000176 0.3 12 82.6 IRM backfield acquisition after annealing at 473K for 12 days IRMbackfield_aq-B-29-200deg-0day-5 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 0.000001463 0.3 14.1 81.3 IRM backfield acquisition after annealing at 473K for 14.1 days IRMbackfield_aq-B-29-200deg-0day-6 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 0.0000011770000000000001 0.2 15.1 80 IRM backfield acquisition after annealing at 473K for 15.1 days IRMbackfield_aq-B-29-200deg-0day-7 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 9.208e-7 0.3 6.8 77.4 IRM backfield acquisition after annealing at 473K for 6.8 days IRMbackfield_aq-B-29-200deg-0day-8 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 4.2079999999999996e-7 0.3 27.2 71.6 IRM backfield acquisition after annealing at 473K for 27.2 days IRMbackfield_aq-B-29-200deg-0day-9 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 6.574e-8 0.4 342.8 4.9 IRM backfield acquisition after annealing at 473K for 342.8 days IRMbackfield_aq-B-29-200deg-0day-10 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 7.651e-7 0.2 235.9 -88.3 IRM backfield acquisition after annealing at 473K for 235.9 days IRMbackfield_aq-B-29-200deg-0day-11 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 0.000001102 0.1 193.4 -87.9 IRM backfield acquisition after annealing at 473K for 193.4 days IRMbackfield_aq-B-29-200deg-0day-12 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 0.000001688 0.2 196.6 -82.5 IRM backfield acquisition after annealing at 473K for 196.6 days IRMbackfield_aq-B-29-200deg-0day-13 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 0.000002024 0.2 201.2 -82.2 IRM backfield acquisition after annealing at 473K for 201.2 days IRMbackfield_aq-B-29-200deg-0day-14 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 0.000002604 0.2 184.8 -81.7 IRM backfield acquisition after annealing at 473K for 184.8 days IRMbackfield_aq-B-29-200deg-0day-15 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 0.0000027699999999999997 0.1 192.8 -81.3 IRM backfield acquisition after annealing at 473K for 192.8 days IRMbackfield_aq-B-29-200deg-0day-16 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 0.00000279 0.2 196.5 -80.9 IRM backfield acquisition after annealing at 473K for 196.5 days IRMbackfield_aq-B-29-200deg-0day-17 IRMbackfield_aq-B-29-200deg-0day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 0.000002831 0.2 197.3 -81.5 IRM backfield acquisition after annealing at 473K for 197.3 days IRMbackfield_aq-B-29-200deg-15day-1 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 0 293 4.95e-8 2.5 11.6 -82.1 IRM backfield acquisition after annealing at 473K for 11.6 days IRMbackfield_aq-B-29-200deg-15day-2 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 0.0000027859999999999997 0.3 14.4 83.4 IRM backfield acquisition after annealing at 473K for 14.4 days IRMbackfield_aq-B-29-200deg-15day-3 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 0.000002159 0.3 8.9 83.3 IRM backfield acquisition after annealing at 473K for 8.9 days IRMbackfield_aq-B-29-200deg-15day-4 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 0.000001833 0.3 15.8 81.5 IRM backfield acquisition after annealing at 473K for 15.8 days IRMbackfield_aq-B-29-200deg-15day-5 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 0.0000015289999999999999 0.3 11.8 80.6 IRM backfield acquisition after annealing at 473K for 11.8 days IRMbackfield_aq-B-29-200deg-15day-6 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 0.000001245 0.3 24.3 78.5 IRM backfield acquisition after annealing at 473K for 24.3 days IRMbackfield_aq-B-29-200deg-15day-7 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 9.878e-7 0.3 24.3 77.2 IRM backfield acquisition after annealing at 473K for 24.3 days IRMbackfield_aq-B-29-200deg-15day-8 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 4.9e-7 0.3 21.2 66.8 IRM backfield acquisition after annealing at 473K for 21.2 days IRMbackfield_aq-B-29-200deg-15day-9 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 1.549e-7 0.2 24.5 19.3 IRM backfield acquisition after annealing at 473K for 24.5 days IRMbackfield_aq-B-29-200deg-15day-10 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 7.486e-7 0.3 44.4 -87.7 IRM backfield acquisition after annealing at 473K for 44.4 days IRMbackfield_aq-B-29-200deg-15day-11 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 0.0000011180000000000001 0.3 197.3 -87.9 IRM backfield acquisition after annealing at 473K for 197.3 days IRMbackfield_aq-B-29-200deg-15day-12 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 0.000001686 0.3 175.2 -85 IRM backfield acquisition after annealing at 473K for 175.2 days IRMbackfield_aq-B-29-200deg-15day-13 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 0.000002051 0.3 191.5 -84.1 IRM backfield acquisition after annealing at 473K for 191.5 days IRMbackfield_aq-B-29-200deg-15day-14 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 0.0000024429999999999997 0.3 196.9 -82.7 IRM backfield acquisition after annealing at 473K for 196.9 days IRMbackfield_aq-B-29-200deg-15day-15 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 0.000002617 0.3 200.5 -81.8 IRM backfield acquisition after annealing at 473K for 200.5 days IRMbackfield_aq-B-29-200deg-15day-16 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 0.000002727 0.3 195 -82.3 IRM backfield acquisition after annealing at 473K for 195 days IRMbackfield_aq-B-29-200deg-15day-17 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 0.0000027720000000000003 0.3 198.7 -82.1 IRM backfield acquisition after annealing at 473K for 198.7 days IRMbackfield_aq-B-29-200deg-15day-18 IRMbackfield_aq-B-29-200deg-15day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 0.000002801 0.3 193.3 -81.8 IRM backfield acquisition after annealing at 473K for 193.3 days IRMbackfield_aq-B-29-200deg-30day-1 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 0.0000025400000000000002 0.3 357.4 85.9 IRM backfield acquisition after annealing at 473K for 357.4 days IRMbackfield_aq-B-29-200deg-30day-2 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.003 293 0.000002526 0.3 3.5 85.7 IRM backfield acquisition after annealing at 473K for 3.5 days IRMbackfield_aq-B-29-200deg-30day-3 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.005 293 0.000002395 0.2 4.7 84.3 IRM backfield acquisition after annealing at 473K for 4.7 days IRMbackfield_aq-B-29-200deg-30day-4 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0075 293 0.000002223 0.3 6.9 84.3 IRM backfield acquisition after annealing at 473K for 6.9 days IRMbackfield_aq-B-29-200deg-30day-5 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 0.0000020500000000000003 0.3 7.8 83.5 IRM backfield acquisition after annealing at 473K for 7.8 days IRMbackfield_aq-B-29-200deg-30day-6 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0125 293 0.0000018779999999999998 0.3 4.6 83.7 IRM backfield acquisition after annealing at 473K for 4.6 days IRMbackfield_aq-B-29-200deg-30day-7 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 0.0000017229999999999999 0.3 8.5 83.1 IRM backfield acquisition after annealing at 473K for 8.5 days IRMbackfield_aq-B-29-200deg-30day-8 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 0.00000142 0.3 7 81.8 IRM backfield acquisition after annealing at 473K for 7 days IRMbackfield_aq-B-29-200deg-30day-9 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 0.000001088 0.3 5.4 79.9 IRM backfield acquisition after annealing at 473K for 5.4 days IRMbackfield_aq-B-29-200deg-30day-10 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 8.643e-7 0.3 13.8 78.7 IRM backfield acquisition after annealing at 473K for 13.8 days IRMbackfield_aq-B-29-200deg-30day-11 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.035 293 6.051e-7 0.3 11 74.8 IRM backfield acquisition after annealing at 473K for 11 days IRMbackfield_aq-B-29-200deg-30day-12 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 3.471e-7 0.3 2.9 68.5 IRM backfield acquisition after annealing at 473K for 2.9 days IRMbackfield_aq-B-29-200deg-30day-13 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 1.172e-7 0.2 5 -28.5 IRM backfield acquisition after annealing at 473K for 5 days IRMbackfield_aq-B-29-200deg-30day-14 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.06 293 3.726e-7 0.3 9.1 -81.9 IRM backfield acquisition after annealing at 473K for 9.1 days IRMbackfield_aq-B-29-200deg-30day-15 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.07 293 6.656e-7 0.3 320.3 -88.7 IRM backfield acquisition after annealing at 473K for 320.3 days IRMbackfield_aq-B-29-200deg-30day-16 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 8.937e-7 0.3 220.2 -88.7 IRM backfield acquisition after annealing at 473K for 220.2 days IRMbackfield_aq-B-29-200deg-30day-17 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 0.000001196 0.3 209.3 -86 IRM backfield acquisition after annealing at 473K for 209.3 days IRMbackfield_aq-B-29-200deg-30day-18 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.125 293 0.000001505 0.3 206.5 -84.5 IRM backfield acquisition after annealing at 473K for 206.5 days IRMbackfield_aq-B-29-200deg-30day-19 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 0.0000017520000000000001 0.3 201.5 -84.2 IRM backfield acquisition after annealing at 473K for 201.5 days IRMbackfield_aq-B-29-200deg-30day-20 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.175 293 0.000001952 0.3 199.7 -83.5 IRM backfield acquisition after annealing at 473K for 199.7 days IRMbackfield_aq-B-29-200deg-30day-21 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 0.000002103 0.3 198.9 -83.4 IRM backfield acquisition after annealing at 473K for 198.9 days IRMbackfield_aq-B-29-200deg-30day-22 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.25 293 0.000002323 0.3 203 -83.2 IRM backfield acquisition after annealing at 473K for 203 days IRMbackfield_aq-B-29-200deg-30day-23 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 0.000002465 0.3 198.5 -82.8 IRM backfield acquisition after annealing at 473K for 198.5 days IRMbackfield_aq-B-29-200deg-30day-24 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.35 293 0.0000025669999999999997 0.3 202.4 -82.3 IRM backfield acquisition after annealing at 473K for 202.4 days IRMbackfield_aq-B-29-200deg-30day-25 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 0.00000263 0.3 200.9 -82.4 IRM backfield acquisition after annealing at 473K for 200.9 days IRMbackfield_aq-B-29-200deg-30day-26 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.5 293 0.000002693 0.3 196.5 -81.9 IRM backfield acquisition after annealing at 473K for 196.5 days IRMbackfield_aq-B-29-200deg-30day-27 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 0.000002737 0.4 199.4 -81.8 IRM backfield acquisition after annealing at 473K for 199.4 days IRMbackfield_aq-B-29-200deg-30day-28 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 0.000002761 0.3 198.1 -81.2 IRM backfield acquisition after annealing at 473K for 198.1 days IRMbackfield_aq-B-29-200deg-30day-29 IRMbackfield_aq-B-29-200deg-30day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 0.000002768 0.3 200.6 -81.8 IRM backfield acquisition after annealing at 473K for 200.6 days IRMbackfield_aq-B-29-200deg-60day-1 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 0.000002703 0.1 19.6 81.8 IRM backfield acquisition after annealing at 473K for 19.6 days IRMbackfield_aq-B-29-200deg-60day-2 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.003 293 0.000002631 0.1 17.1 81.8 IRM backfield acquisition after annealing at 473K for 17.1 days IRMbackfield_aq-B-29-200deg-60day-3 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.005 293 0.0000024489999999999998 0.2 10.2 82.4 IRM backfield acquisition after annealing at 473K for 10.2 days IRMbackfield_aq-B-29-200deg-60day-4 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0075 293 0.000002272 0.2 9.8 82.5 IRM backfield acquisition after annealing at 473K for 9.8 days IRMbackfield_aq-B-29-200deg-60day-5 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 0.0000020960000000000003 0.2 15.5 82.3 IRM backfield acquisition after annealing at 473K for 15.5 days IRMbackfield_aq-B-29-200deg-60day-6 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0125 293 0.000001926 0.2 10.6 81.2 IRM backfield acquisition after annealing at 473K for 10.6 days IRMbackfield_aq-B-29-200deg-60day-7 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 0.000001769 0.2 10.7 80.7 IRM backfield acquisition after annealing at 473K for 10.7 days IRMbackfield_aq-B-29-200deg-60day-8 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 0.0000014840000000000001 0.2 14.2 79.8 IRM backfield acquisition after annealing at 473K for 14.2 days IRMbackfield_aq-B-29-200deg-60day-9 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 0.000001198 0.2 14.4 78.2 IRM backfield acquisition after annealing at 473K for 14.4 days IRMbackfield_aq-B-29-200deg-60day-10 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 9.33e-7 0.1 15.8 75.6 IRM backfield acquisition after annealing at 473K for 15.8 days IRMbackfield_aq-B-29-200deg-60day-11 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.035 293 6.658e-7 0.2 12.3 72.4 IRM backfield acquisition after annealing at 473K for 12.3 days IRMbackfield_aq-B-29-200deg-60day-12 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 4.146e-7 0.4 27.8 64.4 IRM backfield acquisition after annealing at 473K for 27.8 days IRMbackfield_aq-B-29-200deg-60day-13 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 1.5880000000000002e-7 0.2 17.1 -22.7 IRM backfield acquisition after annealing at 473K for 17.1 days IRMbackfield_aq-B-29-200deg-60day-14 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.06 293 3.798e-7 0.2 17.9 -76.4 IRM backfield acquisition after annealing at 473K for 17.9 days IRMbackfield_aq-B-29-200deg-60day-15 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.07 293 5.899e-7 0.2 21 -84.9 IRM backfield acquisition after annealing at 473K for 21 days IRMbackfield_aq-B-29-200deg-60day-16 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 8.129e-7 0.2 49.2 -88.7 IRM backfield acquisition after annealing at 473K for 49.2 days IRMbackfield_aq-B-29-200deg-60day-17 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 0.000001152 0.2 180.1 -87.3 IRM backfield acquisition after annealing at 473K for 180.1 days IRMbackfield_aq-B-29-200deg-60day-18 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.125 293 0.0000015180000000000001 0.2 195.7 -85.8 IRM backfield acquisition after annealing at 473K for 195.7 days IRMbackfield_aq-B-29-200deg-60day-19 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 0.000001735 0.1 217.9 -84.6 IRM backfield acquisition after annealing at 473K for 217.9 days IRMbackfield_aq-B-29-200deg-60day-20 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.175 293 0.000001929 0.2 201.6 -84.4 IRM backfield acquisition after annealing at 473K for 201.6 days IRMbackfield_aq-B-29-200deg-60day-21 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 0.0000020939999999999998 0.2 200 -83.8 IRM backfield acquisition after annealing at 473K for 200 days IRMbackfield_aq-B-29-200deg-60day-22 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.25 293 0.000002326 0.2 207.9 -83.2 IRM backfield acquisition after annealing at 473K for 207.9 days IRMbackfield_aq-B-29-200deg-60day-23 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 0.000002464 0.2 195.7 -82.2 IRM backfield acquisition after annealing at 473K for 195.7 days IRMbackfield_aq-B-29-200deg-60day-24 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.35 293 0.000002571 0.2 193.6 -81.9 IRM backfield acquisition after annealing at 473K for 193.6 days IRMbackfield_aq-B-29-200deg-60day-25 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 0.00000264 0.2 201.8 -82.3 IRM backfield acquisition after annealing at 473K for 201.8 days IRMbackfield_aq-B-29-200deg-60day-26 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.5 293 0.000002698 0.2 204.1 -82.2 IRM backfield acquisition after annealing at 473K for 204.1 days IRMbackfield_aq-B-29-200deg-60day-27 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 0.0000027299999999999997 0.2 196.8 -82.2 IRM backfield acquisition after annealing at 473K for 196.8 days IRMbackfield_aq-B-29-200deg-60day-28 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 0.000002777 0.2 200.4 -82.1 IRM backfield acquisition after annealing at 473K for 200.4 days IRMbackfield_aq-B-29-200deg-60day-29 IRMbackfield_aq-B-29-200deg-60day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 0.000002787 0.2 198.2 -81.9 IRM backfield acquisition after annealing at 473K for 198.2 days IRMbackfield_aq-B-29-200deg-120day-3 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 0.0000027950000000000003 0.2 7 83.9 IRM backfield acquisition after annealing at 473K for 7 days IRMbackfield_aq-B-29-200deg-120day-4 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.003 293 0.0000027009999999999996 0.2 12.4 84.5 IRM backfield acquisition after annealing at 473K for 12.4 days IRMbackfield_aq-B-29-200deg-120day-5 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.005 293 0.000002504 0.2 12.4 84.3 IRM backfield acquisition after annealing at 473K for 12.4 days IRMbackfield_aq-B-29-200deg-120day-6 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0075 293 0.000002326 0.2 14.6 83.9 IRM backfield acquisition after annealing at 473K for 14.6 days IRMbackfield_aq-B-29-200deg-120day-7 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 0.000002148 0.2 15.1 83.1 IRM backfield acquisition after annealing at 473K for 15.1 days IRMbackfield_aq-B-29-200deg-120day-8 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0125 293 0.00000198 0.2 17.8 83.1 IRM backfield acquisition after annealing at 473K for 17.8 days IRMbackfield_aq-B-29-200deg-120day-9 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 0.000001821 0.2 10.4 82.5 IRM backfield acquisition after annealing at 473K for 10.4 days IRMbackfield_aq-B-29-200deg-120day-10 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 0.00000152 0.2 15.4 81.2 IRM backfield acquisition after annealing at 473K for 15.4 days IRMbackfield_aq-B-29-200deg-120day-11 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 0.0000012299999999999999 0.2 11.9 79.6 IRM backfield acquisition after annealing at 473K for 11.9 days IRMbackfield_aq-B-29-200deg-120day-12 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 9.705999999999999e-7 0.2 14.9 77 IRM backfield acquisition after annealing at 473K for 14.9 days IRMbackfield_aq-B-29-200deg-120day-13 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.035 293 7.027e-7 0.2 14.4 74.1 IRM backfield acquisition after annealing at 473K for 14.4 days IRMbackfield_aq-B-29-200deg-120day-14 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 4.5570000000000004e-7 0.2 22.4 66.8 IRM backfield acquisition after annealing at 473K for 22.4 days IRMbackfield_aq-B-29-200deg-120day-15 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 1.53e-7 0.2 25.8 10.3 IRM backfield acquisition after annealing at 473K for 25.8 days IRMbackfield_aq-B-29-200deg-120day-16 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.06 293 2.982e-7 0.2 21.6 -70.5 IRM backfield acquisition after annealing at 473K for 21.6 days IRMbackfield_aq-B-29-200deg-120day-17 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.07 293 5.473999999999999e-7 0.2 24.6 -83 IRM backfield acquisition after annealing at 473K for 24.6 days IRMbackfield_aq-B-29-200deg-120day-18 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 7.789e-7 0.2 3.9 -88 IRM backfield acquisition after annealing at 473K for 3.9 days IRMbackfield_aq-B-29-200deg-120day-19 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 0.000001132 0.2 184.4 -88.5 IRM backfield acquisition after annealing at 473K for 184.4 days IRMbackfield_aq-B-29-200deg-120day-20 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.125 293 0.000001442 0.2 187.9 -85.5 IRM backfield acquisition after annealing at 473K for 187.9 days IRMbackfield_aq-B-29-200deg-120day-21 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 0.000001711 0.2 190.7 -85.2 IRM backfield acquisition after annealing at 473K for 190.7 days IRMbackfield_aq-B-29-200deg-120day-22 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.175 293 0.000001916 0.2 199 -85.1 IRM backfield acquisition after annealing at 473K for 199 days IRMbackfield_aq-B-29-200deg-120day-23 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 0.00000208 0.2 193.8 -84.4 IRM backfield acquisition after annealing at 473K for 193.8 days IRMbackfield_aq-B-29-200deg-120day-24 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.25 293 0.0000023050000000000004 0.2 193.9 -83.5 IRM backfield acquisition after annealing at 473K for 193.9 days IRMbackfield_aq-B-29-200deg-120day-25 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 0.0000024599999999999997 0.2 195.4 -82.9 IRM backfield acquisition after annealing at 473K for 195.4 days IRMbackfield_aq-B-29-200deg-120day-26 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.35 293 0.000002562 0.2 198.3 -83.2 IRM backfield acquisition after annealing at 473K for 198.3 days IRMbackfield_aq-B-29-200deg-120day-27 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 0.000002633 0.2 200.7 -83 IRM backfield acquisition after annealing at 473K for 200.7 days IRMbackfield_aq-B-29-200deg-120day-28 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.5 293 0.00000269 0.2 197.5 -82.5 IRM backfield acquisition after annealing at 473K for 197.5 days IRMbackfield_aq-B-29-200deg-120day-29 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 0.0000027309999999999998 0.3 190.6 -83.2 IRM backfield acquisition after annealing at 473K for 190.6 days IRMbackfield_aq-B-29-200deg-120day-30 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 0.000002789 0.2 194.2 -81.9 IRM backfield acquisition after annealing at 473K for 194.2 days IRMbackfield_aq-B-29-200deg-120day-31 IRMbackfield_aq-B-29-200deg-120day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 0.000002792 0.2 194.5 -82.6 IRM backfield acquisition after annealing at 473K for 194.5 days IRMbackfield_aq-B-29-200deg-240day-1 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 0 293 0.000001676 0.8 193.6 -81.2 IRM backfield acquisition after annealing at 473K for 193.6 days IRMbackfield_aq-B-29-200deg-240day-2 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 0.000002725 0.8 358.2 84.4 IRM backfield acquisition after annealing at 473K for 358.2 days IRMbackfield_aq-B-29-200deg-240day-3 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.003 293 0.000002547 1.4 358.9 83.8 IRM backfield acquisition after annealing at 473K for 358.9 days IRMbackfield_aq-B-29-200deg-240day-4 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.005 293 0.0000024060000000000003 1 9.3 83.7 IRM backfield acquisition after annealing at 473K for 9.3 days IRMbackfield_aq-B-29-200deg-240day-5 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0075 293 0.000002226 0.6 16 83.8 IRM backfield acquisition after annealing at 473K for 16 days IRMbackfield_aq-B-29-200deg-240day-6 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 0.0000020479999999999997 1.2 2.8 82.8 IRM backfield acquisition after annealing at 473K for 2.8 days IRMbackfield_aq-B-29-200deg-240day-7 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0125 293 0.000001882 1.2 5.2 82.2 IRM backfield acquisition after annealing at 473K for 5.2 days IRMbackfield_aq-B-29-200deg-240day-8 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 0.000001719 0.8 13.1 82 IRM backfield acquisition after annealing at 473K for 13.1 days IRMbackfield_aq-B-29-200deg-240day-9 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 0.000001412 1.4 16.8 81.1 IRM backfield acquisition after annealing at 473K for 16.8 days IRMbackfield_aq-B-29-200deg-240day-10 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 0.0000011169999999999999 0.9 22.6 80.3 IRM backfield acquisition after annealing at 473K for 22.6 days IRMbackfield_aq-B-29-200deg-240day-11 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 8.689000000000001e-7 0.9 9.9 77.2 IRM backfield acquisition after annealing at 473K for 9.9 days IRMbackfield_aq-B-29-200deg-240day-12 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.035 293 6.011000000000001e-7 1 4.2 72.3 IRM backfield acquisition after annealing at 473K for 4.2 days IRMbackfield_aq-B-29-200deg-240day-13 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 3.5609999999999997e-7 1.1 355.5 63.9 IRM backfield acquisition after annealing at 473K for 355.5 days IRMbackfield_aq-B-29-200deg-240day-14 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.045 293 1.7349999999999999e-7 1.3 30.2 34.2 IRM backfield acquisition after annealing at 473K for 30.2 days IRMbackfield_aq-B-29-200deg-240day-15 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 1.258e-7 0.8 10.3 -32.3 IRM backfield acquisition after annealing at 473K for 10.3 days IRMbackfield_aq-B-29-200deg-240day-16 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.06 293 3.8670000000000004e-7 0.9 352.9 -84 IRM backfield acquisition after annealing at 473K for 352.9 days IRMbackfield_aq-B-29-200deg-240day-17 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.07 293 6.561e-7 0.8 349.5 -89.3 IRM backfield acquisition after annealing at 473K for 349.5 days IRMbackfield_aq-B-29-200deg-240day-18 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 8.915000000000001e-7 0.5 222.7 -85.8 IRM backfield acquisition after annealing at 473K for 222.7 days IRMbackfield_aq-B-29-200deg-240day-19 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 0.0000012299999999999999 0.7 220.9 -83.8 IRM backfield acquisition after annealing at 473K for 220.9 days IRMbackfield_aq-B-29-200deg-240day-20 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.125 293 0.000001544 0.4 171.7 -84.2 IRM backfield acquisition after annealing at 473K for 171.7 days IRMbackfield_aq-B-29-200deg-240day-21 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 0.000001768 0.6 173.9 -85.8 IRM backfield acquisition after annealing at 473K for 173.9 days IRMbackfield_aq-B-29-200deg-240day-22 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.175 293 0.000001981 1.2 174.2 -82.7 IRM backfield acquisition after annealing at 473K for 174.2 days IRMbackfield_aq-B-29-200deg-240day-23 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 0.000002123 0.6 190 -83.8 IRM backfield acquisition after annealing at 473K for 190 days IRMbackfield_aq-B-29-200deg-240day-24 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.25 293 0.000002349 0.9 185.3 -82.1 IRM backfield acquisition after annealing at 473K for 185.3 days IRMbackfield_aq-B-29-200deg-240day-25 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 0.0000024979999999999996 0.9 183.8 -82.1 IRM backfield acquisition after annealing at 473K for 183.8 days IRMbackfield_aq-B-29-200deg-240day-26 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.35 293 0.000002604 1.2 183.4 -80.8 IRM backfield acquisition after annealing at 473K for 183.4 days IRMbackfield_aq-B-29-200deg-240day-27 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 0.000002665 0.9 191.4 -81.6 IRM backfield acquisition after annealing at 473K for 191.4 days IRMbackfield_aq-B-29-200deg-240day-28 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.5 293 0.0000027330000000000003 0.8 193 -80.9 IRM backfield acquisition after annealing at 473K for 193 days IRMbackfield_aq-B-29-200deg-240day-29 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 0.0000027759999999999998 1 178.1 -81.1 IRM backfield acquisition after annealing at 473K for 178.1 days IRMbackfield_aq-B-29-200deg-240day-30 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 0.0000028019999999999996 0.5 181.9 -81.8 IRM backfield acquisition after annealing at 473K for 181.9 days IRMbackfield_aq-B-29-200deg-240day-31 IRMbackfield_aq-B-29-200deg-240day B-29 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 0.0000028319999999999997 0.7 183.9 -80.5 IRM backfield acquisition after annealing at 473K for 183.9 days IRMbackfield_aq-B-41-300deg-0day-1 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 0 293 5.933e-8 0.5 161.3 44.4 IRM backfield acquisition after annealing at 573K for 161.3 days IRMbackfield_aq-B-41-300deg-0day-2 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.000002082 0.7 138.2 88.8 IRM backfield acquisition after annealing at 573K for 138.2 days IRMbackfield_aq-B-41-300deg-0day-3 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.000002101 0.2 210 88.5 IRM backfield acquisition after annealing at 573K for 210 days IRMbackfield_aq-B-41-300deg-0day-4 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.00000209 0.2 197.9 88.3 IRM backfield acquisition after annealing at 573K for 197.9 days IRMbackfield_aq-B-41-300deg-0day-5 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.000002076 0.2 204.5 88.3 IRM backfield acquisition after annealing at 573K for 204.5 days IRMbackfield_aq-B-41-300deg-0day-6 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.00000206 0.2 197.3 88.3 IRM backfield acquisition after annealing at 573K for 197.3 days IRMbackfield_aq-B-41-300deg-0day-7 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 0.000002043 0.2 206 88.3 IRM backfield acquisition after annealing at 573K for 206 days IRMbackfield_aq-B-41-300deg-0day-8 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 0.000001991 0.2 206.8 88.2 IRM backfield acquisition after annealing at 573K for 206.8 days IRMbackfield_aq-B-41-300deg-0day-9 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 0.000001932 0.2 212.8 88.2 IRM backfield acquisition after annealing at 573K for 212.8 days IRMbackfield_aq-B-41-300deg-0day-10 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.000001655 0.2 199.9 88.5 IRM backfield acquisition after annealing at 573K for 199.9 days IRMbackfield_aq-B-41-300deg-0day-11 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 0.000001387 0.2 190.4 87.5 IRM backfield acquisition after annealing at 573K for 190.4 days IRMbackfield_aq-B-41-300deg-0day-12 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 5.055e-7 0.3 175.2 88.8 IRM backfield acquisition after annealing at 573K for 175.2 days IRMbackfield_aq-B-41-300deg-0day-13 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 5.101e-7 0.3 167 89.1 IRM backfield acquisition after annealing at 573K for 167 days IRMbackfield_aq-B-41-300deg-0day-14 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 4.0920000000000004e-7 0.2 180 -80.2 IRM backfield acquisition after annealing at 573K for 180 days IRMbackfield_aq-B-41-300deg-0day-15 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.000001449 0.2 188.6 -87.3 IRM backfield acquisition after annealing at 573K for 188.6 days IRMbackfield_aq-B-41-300deg-0day-16 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.000001859 0.2 129.6 -88 IRM backfield acquisition after annealing at 573K for 129.6 days IRMbackfield_aq-B-41-300deg-0day-17 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.000002075 0.1 165.1 -88.2 IRM backfield acquisition after annealing at 573K for 165.1 days IRMbackfield_aq-B-41-300deg-0day-18 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.000002117 0.2 207.7 -89 IRM backfield acquisition after annealing at 573K for 207.7 days IRMbackfield_aq-B-41-300deg-0day-19 IRMbackfield_aq-B-41-300deg-0day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.000002126 0.2 332.2 -88.8 IRM backfield acquisition after annealing at 573K for 332.2 days IRMbackfield_aq-B-41-300deg-15day-1 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 0 293 3.675e-8 2.3 11.2 -85.5 IRM backfield acquisition after annealing at 573K for 11.2 days IRMbackfield_aq-B-41-300deg-15day-2 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.000002252 0.3 223.8 88.6 IRM backfield acquisition after annealing at 573K for 223.8 days IRMbackfield_aq-B-41-300deg-15day-3 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.0000022300000000000002 0.3 209.1 88 IRM backfield acquisition after annealing at 573K for 209.1 days IRMbackfield_aq-B-41-300deg-15day-4 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.0000022109999999999997 0.3 221.8 88.4 IRM backfield acquisition after annealing at 573K for 221.8 days IRMbackfield_aq-B-41-300deg-15day-5 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.000002193 0.3 217 88.1 IRM backfield acquisition after annealing at 573K for 217 days IRMbackfield_aq-B-41-300deg-15day-6 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.000002168 0.3 211.1 88 IRM backfield acquisition after annealing at 573K for 211.1 days IRMbackfield_aq-B-41-300deg-15day-7 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 0.0000020479999999999997 0.3 229.4 88.5 IRM backfield acquisition after annealing at 573K for 229.4 days IRMbackfield_aq-B-41-300deg-15day-8 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 0.000001953 0.3 230.1 88.5 IRM backfield acquisition after annealing at 573K for 230.1 days IRMbackfield_aq-B-41-300deg-15day-9 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.000001539 0.3 231.8 87.8 IRM backfield acquisition after annealing at 573K for 231.8 days IRMbackfield_aq-B-41-300deg-15day-10 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 0.000001181 0.3 240.3 88.1 IRM backfield acquisition after annealing at 573K for 240.3 days IRMbackfield_aq-B-41-300deg-15day-11 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 1.782e-7 0.3 296.2 79.8 IRM backfield acquisition after annealing at 573K for 296.2 days IRMbackfield_aq-B-41-300deg-15day-12 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 7.15e-7 0.3 356 -86.5 IRM backfield acquisition after annealing at 573K for 356 days IRMbackfield_aq-B-41-300deg-15day-13 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.000001663 0.3 358.7 -87.9 IRM backfield acquisition after annealing at 573K for 358.7 days IRMbackfield_aq-B-41-300deg-15day-14 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.0000020149999999999998 0.3 327.8 -87.5 IRM backfield acquisition after annealing at 573K for 327.8 days IRMbackfield_aq-B-41-300deg-15day-15 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.0000022009999999999998 0.3 16.3 -87.8 IRM backfield acquisition after annealing at 573K for 16.3 days IRMbackfield_aq-B-41-300deg-15day-16 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.000002237 0.3 4.9 -88 IRM backfield acquisition after annealing at 573K for 4.9 days IRMbackfield_aq-B-41-300deg-15day-17 IRMbackfield_aq-B-41-300deg-15day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.000002247 0.3 15.8 -87.8 IRM backfield acquisition after annealing at 573K for 15.8 days IRMbackfield_aq-B-41-300deg-30day-1 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.0000022799999999999998 0.3 215.8 88.3 IRM backfield acquisition after annealing at 573K for 215.8 days IRMbackfield_aq-B-41-300deg-30day-2 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.003 293 0.0000022799999999999998 0.3 210.5 88 IRM backfield acquisition after annealing at 573K for 210.5 days IRMbackfield_aq-B-41-300deg-30day-3 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.005 293 0.0000022750000000000002 0.3 218.2 88.4 IRM backfield acquisition after annealing at 573K for 218.2 days IRMbackfield_aq-B-41-300deg-30day-4 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0075 293 0.000002271 0.3 216.9 88.4 IRM backfield acquisition after annealing at 573K for 216.9 days IRMbackfield_aq-B-41-300deg-30day-5 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.000002262 0.3 218.3 88.3 IRM backfield acquisition after annealing at 573K for 218.3 days IRMbackfield_aq-B-41-300deg-30day-6 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0125 293 0.000002253 0.3 221 88.5 IRM backfield acquisition after annealing at 573K for 221 days IRMbackfield_aq-B-41-300deg-30day-7 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.000002244 0.3 220.8 88.3 IRM backfield acquisition after annealing at 573K for 220.8 days IRMbackfield_aq-B-41-300deg-30day-8 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.000002221 0.3 226.1 88.5 IRM backfield acquisition after annealing at 573K for 226.1 days IRMbackfield_aq-B-41-300deg-30day-9 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.000002189 0.3 222.2 88.4 IRM backfield acquisition after annealing at 573K for 222.2 days IRMbackfield_aq-B-41-300deg-30day-10 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 0.000002159 0.3 233.2 88.6 IRM backfield acquisition after annealing at 573K for 233.2 days IRMbackfield_aq-B-41-300deg-30day-11 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.035 293 0.000002115 0.3 222.9 88.2 IRM backfield acquisition after annealing at 573K for 222.9 days IRMbackfield_aq-B-41-300deg-30day-12 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 0.000002061 0.3 223.6 88.3 IRM backfield acquisition after annealing at 573K for 223.6 days IRMbackfield_aq-B-41-300deg-30day-13 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 0.00000195 0.3 230.2 88.5 IRM backfield acquisition after annealing at 573K for 230.2 days IRMbackfield_aq-B-41-300deg-30day-14 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.06 293 0.000001824 0.3 231.4 88.3 IRM backfield acquisition after annealing at 573K for 231.4 days IRMbackfield_aq-B-41-300deg-30day-15 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.07 293 0.0000016839999999999999 0.3 228.7 88.1 IRM backfield acquisition after annealing at 573K for 228.7 days IRMbackfield_aq-B-41-300deg-30day-16 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.0000015150000000000001 0.4 231 88.1 IRM backfield acquisition after annealing at 573K for 231 days IRMbackfield_aq-B-41-300deg-30day-17 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 0.000001133 0.3 244.7 88.2 IRM backfield acquisition after annealing at 573K for 244.7 days IRMbackfield_aq-B-41-300deg-30day-18 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.125 293 6.031e-7 0.4 266.4 87.7 IRM backfield acquisition after annealing at 573K for 266.4 days IRMbackfield_aq-B-41-300deg-30day-19 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 6.986999999999999e-8 0.7 310 73.5 IRM backfield acquisition after annealing at 573K for 310 days IRMbackfield_aq-B-41-300deg-30day-20 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.175 293 4.387e-7 0.3 5.2 -87.2 IRM backfield acquisition after annealing at 573K for 5.2 days IRMbackfield_aq-B-41-300deg-30day-21 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 8.375999999999999e-7 0.3 11.7 -87.2 IRM backfield acquisition after annealing at 573K for 11.7 days IRMbackfield_aq-B-41-300deg-30day-22 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.25 293 0.0000014170000000000002 0.3 34.8 -87.9 IRM backfield acquisition after annealing at 573K for 34.8 days IRMbackfield_aq-B-41-300deg-30day-23 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.000001759 0.3 28.6 -87.6 IRM backfield acquisition after annealing at 573K for 28.6 days IRMbackfield_aq-B-41-300deg-30day-24 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.35 293 0.00000196 0.3 20.6 -87.4 IRM backfield acquisition after annealing at 573K for 20.6 days IRMbackfield_aq-B-41-300deg-30day-25 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.000002078 0.3 37.9 -87.8 IRM backfield acquisition after annealing at 573K for 37.9 days IRMbackfield_aq-B-41-300deg-30day-26 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.5 293 0.0000022009999999999998 0.3 41.9 -88 IRM backfield acquisition after annealing at 573K for 41.9 days IRMbackfield_aq-B-41-300deg-30day-27 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.000002251 0.3 25 -87.7 IRM backfield acquisition after annealing at 573K for 25 days IRMbackfield_aq-B-41-300deg-30day-28 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.0000022820000000000003 0.3 22.6 -88.6 IRM backfield acquisition after annealing at 573K for 22.6 days IRMbackfield_aq-B-41-300deg-30day-29 IRMbackfield_aq-B-41-300deg-30day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.000002294 0.3 32 -87.8 IRM backfield acquisition after annealing at 573K for 32 days IRMbackfield_aq-B-41-300deg-60day-1 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.000002336 0.1 196.5 88.7 IRM backfield acquisition after annealing at 573K for 196.5 days IRMbackfield_aq-B-41-300deg-60day-2 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.003 293 0.00000233 0.1 196 88.9 IRM backfield acquisition after annealing at 573K for 196 days IRMbackfield_aq-B-41-300deg-60day-3 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.005 293 0.000002323 0.1 203.9 88.9 IRM backfield acquisition after annealing at 573K for 203.9 days IRMbackfield_aq-B-41-300deg-60day-4 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0075 293 0.000002315 0.1 202.7 89 IRM backfield acquisition after annealing at 573K for 202.7 days IRMbackfield_aq-B-41-300deg-60day-5 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.000002306 0.1 199.2 88.8 IRM backfield acquisition after annealing at 573K for 199.2 days IRMbackfield_aq-B-41-300deg-60day-6 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0125 293 0.000002295 0.2 201.2 89 IRM backfield acquisition after annealing at 573K for 201.2 days IRMbackfield_aq-B-41-300deg-60day-7 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.000002284 0.1 196.5 89.1 IRM backfield acquisition after annealing at 573K for 196.5 days IRMbackfield_aq-B-41-300deg-60day-8 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.00000226 0.1 196.1 88.9 IRM backfield acquisition after annealing at 573K for 196.1 days IRMbackfield_aq-B-41-300deg-60day-9 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.000002228 0.1 198 88.7 IRM backfield acquisition after annealing at 573K for 198 days IRMbackfield_aq-B-41-300deg-60day-10 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 0.000002189 0.1 191.7 88.9 IRM backfield acquisition after annealing at 573K for 191.7 days IRMbackfield_aq-B-41-300deg-60day-11 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.035 293 0.00000214 0.1 196.8 88.9 IRM backfield acquisition after annealing at 573K for 196.8 days IRMbackfield_aq-B-41-300deg-60day-12 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 0.00000208 0.2 198.8 88.3 IRM backfield acquisition after annealing at 573K for 198.8 days IRMbackfield_aq-B-41-300deg-60day-13 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 0.000001954 0.2 202.3 89 IRM backfield acquisition after annealing at 573K for 202.3 days IRMbackfield_aq-B-41-300deg-60day-14 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.06 293 0.000001799 0.1 210.4 89.1 IRM backfield acquisition after annealing at 573K for 210.4 days IRMbackfield_aq-B-41-300deg-60day-15 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.07 293 0.000001643 0.1 192.1 89.1 IRM backfield acquisition after annealing at 573K for 192.1 days IRMbackfield_aq-B-41-300deg-60day-16 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.0000014560000000000001 0.1 199.9 89.3 IRM backfield acquisition after annealing at 573K for 199.9 days IRMbackfield_aq-B-41-300deg-60day-17 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 0.000001017 0.1 223.3 89.4 IRM backfield acquisition after annealing at 573K for 223.3 days IRMbackfield_aq-B-41-300deg-60day-18 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.125 293 4.4020000000000004e-7 0.2 89.8 87.5 IRM backfield acquisition after annealing at 573K for 89.8 days IRMbackfield_aq-B-41-300deg-60day-19 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 1.2280000000000001e-7 0.1 57 -78.3 IRM backfield acquisition after annealing at 573K for 57 days IRMbackfield_aq-B-41-300deg-60day-20 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.175 293 6.149999999999999e-7 0.1 29.4 -85.9 IRM backfield acquisition after annealing at 573K for 29.4 days IRMbackfield_aq-B-41-300deg-60day-21 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 0.000001013 0.1 38.4 -86.8 IRM backfield acquisition after annealing at 573K for 38.4 days IRMbackfield_aq-B-41-300deg-60day-22 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.25 293 0.000001564 0.1 27.3 -87.9 IRM backfield acquisition after annealing at 573K for 27.3 days IRMbackfield_aq-B-41-300deg-60day-23 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.000001865 0.1 37.7 -87 IRM backfield acquisition after annealing at 573K for 37.7 days IRMbackfield_aq-B-41-300deg-60day-24 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.35 293 0.0000020500000000000003 0.1 22.1 -87.5 IRM backfield acquisition after annealing at 573K for 22.1 days IRMbackfield_aq-B-41-300deg-60day-25 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.000002154 0.1 37.6 -87.5 IRM backfield acquisition after annealing at 573K for 37.6 days IRMbackfield_aq-B-41-300deg-60day-26 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.5 293 0.000002253 0.1 11.6 -88.5 IRM backfield acquisition after annealing at 573K for 11.6 days IRMbackfield_aq-B-41-300deg-60day-27 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.5 293 0.000002252 0.1 10.2 -87.7 IRM backfield acquisition after annealing at 573K for 10.2 days IRMbackfield_aq-B-41-300deg-60day-28 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.000002293 0.1 18.6 -87.7 IRM backfield acquisition after annealing at 573K for 18.6 days IRMbackfield_aq-B-41-300deg-60day-29 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.0000023280000000000004 0.1 33.9 -88 IRM backfield acquisition after annealing at 573K for 33.9 days IRMbackfield_aq-B-41-300deg-60day-30 IRMbackfield_aq-B-41-300deg-60day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.0000023349999999999997 0.1 36.3 -87.9 IRM backfield acquisition after annealing at 573K for 36.3 days IRMbackfield_aq-B-41-300deg-120day-3 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.0000023969999999999997 0.2 200.1 87.7 IRM backfield acquisition after annealing at 573K for 200.1 days IRMbackfield_aq-B-41-300deg-120day-4 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.003 293 0.00000239 0.2 205.6 88.3 IRM backfield acquisition after annealing at 573K for 205.6 days IRMbackfield_aq-B-41-300deg-120day-5 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.005 293 0.00000238 0.2 204.7 88.3 IRM backfield acquisition after annealing at 573K for 204.7 days IRMbackfield_aq-B-41-300deg-120day-6 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0075 293 0.000002372 0.2 205.2 88.2 IRM backfield acquisition after annealing at 573K for 205.2 days IRMbackfield_aq-B-41-300deg-120day-7 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.000002362 0.2 204.5 88.2 IRM backfield acquisition after annealing at 573K for 204.5 days IRMbackfield_aq-B-41-300deg-120day-8 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0125 293 0.0000023509999999999996 0.2 201.5 87.8 IRM backfield acquisition after annealing at 573K for 201.5 days IRMbackfield_aq-B-41-300deg-120day-9 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.000002339 0.2 206.5 88.2 IRM backfield acquisition after annealing at 573K for 206.5 days IRMbackfield_aq-B-41-300deg-120day-10 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.0000023119999999999996 0.2 208.7 88.4 IRM backfield acquisition after annealing at 573K for 208.7 days IRMbackfield_aq-B-41-300deg-120day-11 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.0000022750000000000002 0.2 202.1 87.9 IRM backfield acquisition after annealing at 573K for 202.1 days IRMbackfield_aq-B-41-300deg-120day-12 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 0.000002231 0.2 204.7 88 IRM backfield acquisition after annealing at 573K for 204.7 days IRMbackfield_aq-B-41-300deg-120day-13 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.035 293 0.000002177 0.2 201.6 87.8 IRM backfield acquisition after annealing at 573K for 201.6 days IRMbackfield_aq-B-41-300deg-120day-14 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 0.000002107 0.2 208.7 88.5 IRM backfield acquisition after annealing at 573K for 208.7 days IRMbackfield_aq-B-41-300deg-120day-15 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 0.000001964 0.2 205.8 87.9 IRM backfield acquisition after annealing at 573K for 205.8 days IRMbackfield_aq-B-41-300deg-120day-16 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.06 293 0.000001799 0.2 213.5 88.5 IRM backfield acquisition after annealing at 573K for 213.5 days IRMbackfield_aq-B-41-300deg-120day-17 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.07 293 0.0000016000000000000001 0.2 212.1 88 IRM backfield acquisition after annealing at 573K for 212.1 days IRMbackfield_aq-B-41-300deg-120day-18 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.000001389 0.2 222.7 87.5 IRM backfield acquisition after annealing at 573K for 222.7 days IRMbackfield_aq-B-41-300deg-120day-19 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 9.008e-7 0.2 230.6 87.9 IRM backfield acquisition after annealing at 573K for 230.6 days IRMbackfield_aq-B-41-300deg-120day-20 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.125 293 2.815e-7 0.2 295.5 88.3 IRM backfield acquisition after annealing at 573K for 295.5 days IRMbackfield_aq-B-41-300deg-120day-21 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 3.233e-7 0.2 332.3 -84.7 IRM backfield acquisition after annealing at 573K for 332.3 days IRMbackfield_aq-B-41-300deg-120day-22 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.175 293 8.247e-7 0.2 19.9 -86.6 IRM backfield acquisition after annealing at 573K for 19.9 days IRMbackfield_aq-B-41-300deg-120day-23 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 0.000001212 0.2 4.8 -86.7 IRM backfield acquisition after annealing at 573K for 4.8 days IRMbackfield_aq-B-41-300deg-120day-24 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.25 293 0.000001714 0.2 3.5 -87.8 IRM backfield acquisition after annealing at 573K for 3.5 days IRMbackfield_aq-B-41-300deg-120day-25 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.000001989 0.2 359.1 -87.2 IRM backfield acquisition after annealing at 573K for 359.1 days IRMbackfield_aq-B-41-300deg-120day-26 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.35 293 0.000002147 0.2 18.6 -87.2 IRM backfield acquisition after annealing at 573K for 18.6 days IRMbackfield_aq-B-41-300deg-120day-27 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.000002233 0.2 21.7 -87.2 IRM backfield acquisition after annealing at 573K for 21.7 days IRMbackfield_aq-B-41-300deg-120day-28 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.5 293 0.000002314 0.2 18.8 -87.4 IRM backfield acquisition after annealing at 573K for 18.8 days IRMbackfield_aq-B-41-300deg-120day-29 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.00000235 0.2 26.1 -87.4 IRM backfield acquisition after annealing at 573K for 26.1 days IRMbackfield_aq-B-41-300deg-120day-30 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.0000023770000000000003 0.1 15.2 -88.1 IRM backfield acquisition after annealing at 573K for 15.2 days IRMbackfield_aq-B-41-300deg-120day-31 IRMbackfield_aq-B-41-300deg-120day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.000002386 0.1 37.3 -88.2 IRM backfield acquisition after annealing at 573K for 37.3 days IRMbackfield_aq-B-41-300deg-240day-1 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 0 293 0.000002425 0.1 20.7 -88.8 IRM backfield acquisition after annealing at 573K for 20.7 days IRMbackfield_aq-B-41-300deg-240day-2 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.0000024610000000000002 0.1 229.9 88.5 IRM backfield acquisition after annealing at 573K for 229.9 days IRMbackfield_aq-B-41-300deg-240day-3 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.003 293 0.000002448 0.1 225.7 88.4 IRM backfield acquisition after annealing at 573K for 225.7 days IRMbackfield_aq-B-41-300deg-240day-4 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.005 293 0.0000024390000000000003 0.1 222.3 88.4 IRM backfield acquisition after annealing at 573K for 222.3 days IRMbackfield_aq-B-41-300deg-240day-5 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0075 293 0.00000243 0.1 223.3 88.4 IRM backfield acquisition after annealing at 573K for 223.3 days IRMbackfield_aq-B-41-300deg-240day-6 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.000002419 0.1 225.2 88.4 IRM backfield acquisition after annealing at 573K for 225.2 days IRMbackfield_aq-B-41-300deg-240day-7 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0125 293 0.000002407 0.1 228.4 88.5 IRM backfield acquisition after annealing at 573K for 228.4 days IRMbackfield_aq-B-41-300deg-240day-8 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.000002392 0.1 225.2 88.3 IRM backfield acquisition after annealing at 573K for 225.2 days IRMbackfield_aq-B-41-300deg-240day-9 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.0000023579999999999997 0.1 225.8 88.3 IRM backfield acquisition after annealing at 573K for 225.8 days IRMbackfield_aq-B-41-300deg-240day-10 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.000002316 0.1 221.8 88.2 IRM backfield acquisition after annealing at 573K for 221.8 days IRMbackfield_aq-B-41-300deg-240day-11 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 0.000002265 0.1 230.1 88.4 IRM backfield acquisition after annealing at 573K for 230.1 days IRMbackfield_aq-B-41-300deg-240day-12 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.035 293 0.0000021970000000000003 0.1 231.6 88.4 IRM backfield acquisition after annealing at 573K for 231.6 days IRMbackfield_aq-B-41-300deg-240day-13 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 0.000002114 0.1 233.4 88.3 IRM backfield acquisition after annealing at 573K for 233.4 days IRMbackfield_aq-B-41-300deg-240day-14 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 0.000001943 0.1 227.1 88.4 IRM backfield acquisition after annealing at 573K for 227.1 days IRMbackfield_aq-B-41-300deg-240day-15 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.06 293 0.000001749 0.1 232.4 88.1 IRM backfield acquisition after annealing at 573K for 232.4 days IRMbackfield_aq-B-41-300deg-240day-16 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.07 293 0.00000153 0.1 233.8 88.4 IRM backfield acquisition after annealing at 573K for 233.8 days IRMbackfield_aq-B-41-300deg-240day-17 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.000001259 0.1 245.3 88.5 IRM backfield acquisition after annealing at 573K for 245.3 days IRMbackfield_aq-B-41-300deg-240day-18 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 7.183e-7 0.1 269.3 86.7 IRM backfield acquisition after annealing at 573K for 269.3 days IRMbackfield_aq-B-41-300deg-240day-19 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.125 293 3.6180000000000004e-8 0.4 298.6 6.6 IRM backfield acquisition after annealing at 573K for 298.6 days IRMbackfield_aq-B-41-300deg-240day-20 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.14 293 3.815e-7 0.1 327 -85.9 IRM backfield acquisition after annealing at 573K for 327 days IRMbackfield_aq-B-41-300deg-240day-21 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 6.258e-7 0.1 294.7 -83.4 IRM backfield acquisition after annealing at 573K for 294.7 days IRMbackfield_aq-B-41-300deg-240day-22 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.175 293 0.000001107 0.1 13 -87.7 IRM backfield acquisition after annealing at 573K for 13 days IRMbackfield_aq-B-41-300deg-240day-23 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 0.000001469 0.1 345.3 -87.8 IRM backfield acquisition after annealing at 573K for 345.3 days IRMbackfield_aq-B-41-300deg-240day-24 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.25 293 0.000001927 0.2 12 -88.1 IRM backfield acquisition after annealing at 573K for 12 days IRMbackfield_aq-B-41-300deg-240day-25 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.000002152 0.1 335.8 -87.9 IRM backfield acquisition after annealing at 573K for 335.8 days IRMbackfield_aq-B-41-300deg-240day-26 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.35 293 0.0000022799999999999998 0.1 350.7 -87.5 IRM backfield acquisition after annealing at 573K for 350.7 days IRMbackfield_aq-B-41-300deg-240day-27 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.000002347 0.1 48.7 -88.3 IRM backfield acquisition after annealing at 573K for 48.7 days IRMbackfield_aq-B-41-300deg-240day-28 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.5 293 0.000002412 0.1 37.2 -88.1 IRM backfield acquisition after annealing at 573K for 37.2 days IRMbackfield_aq-B-41-300deg-240day-29 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.000002431 0.1 350.4 -88.6 IRM backfield acquisition after annealing at 573K for 350.4 days IRMbackfield_aq-B-41-300deg-240day-30 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.000002454 0.1 352.8 -88.1 IRM backfield acquisition after annealing at 573K for 352.8 days IRMbackfield_aq-B-41-300deg-240day-31 IRMbackfield_aq-B-41-300deg-240day B-41 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.0000024599999999999997 0.1 60.7 -87.6 IRM backfield acquisition after annealing at 573K for 60.7 days IRMbackfield_aq-B-42-400deg-0day-1 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 0 293 2.18e-9 1.5 26.6 -29 IRM backfield acquisition after annealing at 673K for 26.6 days IRMbackfield_aq-B-42-400deg-0day-2 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 1.1349999999999999e-7 0.8 29.2 88.6 IRM backfield acquisition after annealing at 673K for 29.2 days IRMbackfield_aq-B-42-400deg-0day-3 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 1.109e-7 0.2 351.6 89.7 IRM backfield acquisition after annealing at 673K for 351.6 days IRMbackfield_aq-B-42-400deg-0day-4 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 1.085e-7 0.5 294 89.7 IRM backfield acquisition after annealing at 673K for 294 days IRMbackfield_aq-B-42-400deg-0day-5 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 1.055e-7 0.4 118.6 89.7 IRM backfield acquisition after annealing at 673K for 118.6 days IRMbackfield_aq-B-42-400deg-0day-6 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 1.0280000000000001e-7 0.3 314.6 89.4 IRM backfield acquisition after annealing at 673K for 314.6 days IRMbackfield_aq-B-42-400deg-0day-7 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 9.935e-8 0.3 69.2 89.3 IRM backfield acquisition after annealing at 673K for 69.2 days IRMbackfield_aq-B-42-400deg-0day-8 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 9.259000000000001e-8 0.4 354.4 89.4 IRM backfield acquisition after annealing at 673K for 354.4 days IRMbackfield_aq-B-42-400deg-0day-9 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 8.569e-8 0.3 340.1 88.9 IRM backfield acquisition after annealing at 673K for 340.1 days IRMbackfield_aq-B-42-400deg-0day-10 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 6.245000000000001e-8 0.4 319.3 89.7 IRM backfield acquisition after annealing at 673K for 319.3 days IRMbackfield_aq-B-42-400deg-0day-11 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 4.451e-8 0.6 83.9 89 IRM backfield acquisition after annealing at 673K for 83.9 days IRMbackfield_aq-B-42-400deg-0day-12 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 5.5509999999999995e-9 2.3 314.2 -42.9 IRM backfield acquisition after annealing at 673K for 314.2 days IRMbackfield_aq-B-42-400deg-0day-13 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 4.51e-9 1.8 299.3 -52.1 IRM backfield acquisition after annealing at 673K for 299.3 days IRMbackfield_aq-B-42-400deg-0day-14 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 4.5399999999999996e-8 0.3 295.9 -87.3 IRM backfield acquisition after annealing at 673K for 295.9 days IRMbackfield_aq-B-42-400deg-0day-15 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 8.906e-8 0.2 62.7 -89.6 IRM backfield acquisition after annealing at 673K for 62.7 days IRMbackfield_aq-B-42-400deg-0day-16 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 1.054e-7 0.2 180.2 -89.3 IRM backfield acquisition after annealing at 673K for 180.2 days IRMbackfield_aq-B-42-400deg-0day-17 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 1.1620000000000001e-7 0.1 343.6 -89.5 IRM backfield acquisition after annealing at 673K for 343.6 days IRMbackfield_aq-B-42-400deg-0day-18 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 1.167e-7 0.2 291.2 -88.8 IRM backfield acquisition after annealing at 673K for 291.2 days IRMbackfield_aq-B-42-400deg-0day-19 IRMbackfield_aq-B-42-400deg-0day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 1.1780000000000001e-7 0.2 309.8 -88.9 IRM backfield acquisition after annealing at 673K for 309.8 days IRMbackfield_aq-B-42-400deg-15day-3 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 0 293 6.041999999999999e-10 2.7 48.2 -82.4 IRM backfield acquisition after annealing at 673K for 48.2 days IRMbackfield_aq-B-42-400deg-15day-4 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 1.434e-7 0.3 157 88.7 IRM backfield acquisition after annealing at 673K for 157 days IRMbackfield_aq-B-42-400deg-15day-5 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 1.3880000000000003e-7 0.3 154.2 88.6 IRM backfield acquisition after annealing at 673K for 154.2 days IRMbackfield_aq-B-42-400deg-15day-6 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 1.351e-7 0.3 157.2 88.5 IRM backfield acquisition after annealing at 673K for 157.2 days IRMbackfield_aq-B-42-400deg-15day-7 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 1.307e-7 0.3 152.9 88.8 IRM backfield acquisition after annealing at 673K for 152.9 days IRMbackfield_aq-B-42-400deg-15day-8 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 1.258e-7 0.3 168.1 88.7 IRM backfield acquisition after annealing at 673K for 168.1 days IRMbackfield_aq-B-42-400deg-15day-9 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 1.056e-7 0.3 172.6 88.4 IRM backfield acquisition after annealing at 673K for 172.6 days IRMbackfield_aq-B-42-400deg-15day-10 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 9.055e-8 0.3 180.5 88.8 IRM backfield acquisition after annealing at 673K for 180.5 days IRMbackfield_aq-B-42-400deg-15day-11 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 4.317e-8 0.3 207.5 88.5 IRM backfield acquisition after annealing at 673K for 207.5 days IRMbackfield_aq-B-42-400deg-15day-12 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 1.3349999999999999e-8 0.3 242 89 IRM backfield acquisition after annealing at 673K for 242 days IRMbackfield_aq-B-42-400deg-15day-13 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 4.8399999999999997e-8 0.3 316.5 -86.7 IRM backfield acquisition after annealing at 673K for 316.5 days IRMbackfield_aq-B-42-400deg-15day-14 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 8.855e-8 0.3 330.4 -87.4 IRM backfield acquisition after annealing at 673K for 330.4 days IRMbackfield_aq-B-42-400deg-15day-15 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 1.229e-7 0.3 355.6 -88.2 IRM backfield acquisition after annealing at 673K for 355.6 days IRMbackfield_aq-B-42-400deg-15day-16 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 1.3439999999999999e-7 0.3 7.8 -87.9 IRM backfield acquisition after annealing at 673K for 7.8 days IRMbackfield_aq-B-42-400deg-15day-17 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 1.407e-7 0.3 355.3 -88.3 IRM backfield acquisition after annealing at 673K for 355.3 days IRMbackfield_aq-B-42-400deg-15day-18 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 1.421e-7 0.3 1.7 -88.1 IRM backfield acquisition after annealing at 673K for 1.7 days IRMbackfield_aq-B-42-400deg-15day-19 IRMbackfield_aq-B-42-400deg-15day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 1.418e-7 0.4 4.8 -88.7 IRM backfield acquisition after annealing at 673K for 4.8 days IRMbackfield_aq-B-42-400deg-30day-1 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 1.4550000000000003e-7 0.3 136.6 88.2 IRM backfield acquisition after annealing at 673K for 136.6 days IRMbackfield_aq-B-42-400deg-30day-2 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.003 293 1.447e-7 0.5 133.8 88.4 IRM backfield acquisition after annealing at 673K for 133.8 days IRMbackfield_aq-B-42-400deg-30day-3 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.005 293 1.43e-7 0.3 134.3 88.3 IRM backfield acquisition after annealing at 673K for 134.3 days IRMbackfield_aq-B-42-400deg-30day-4 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0075 293 1.42e-7 0.3 122 88.4 IRM backfield acquisition after annealing at 673K for 122 days IRMbackfield_aq-B-42-400deg-30day-5 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 1.391e-7 0.3 140.7 88.2 IRM backfield acquisition after annealing at 673K for 140.7 days IRMbackfield_aq-B-42-400deg-30day-6 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0125 293 1.39e-7 0.4 144.6 88.2 IRM backfield acquisition after annealing at 673K for 144.6 days IRMbackfield_aq-B-42-400deg-30day-7 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 1.3620000000000002e-7 0.4 147.6 88.3 IRM backfield acquisition after annealing at 673K for 147.6 days IRMbackfield_aq-B-42-400deg-30day-8 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 1.332e-7 0.3 151.6 88.1 IRM backfield acquisition after annealing at 673K for 151.6 days IRMbackfield_aq-B-42-400deg-30day-9 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 1.273e-7 0.4 148.7 88.3 IRM backfield acquisition after annealing at 673K for 148.7 days IRMbackfield_aq-B-42-400deg-30day-10 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 1.21e-7 0.3 154.7 88.2 IRM backfield acquisition after annealing at 673K for 154.7 days IRMbackfield_aq-B-42-400deg-30day-11 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.035 293 1.1349999999999999e-7 0.4 148 88.3 IRM backfield acquisition after annealing at 673K for 148 days IRMbackfield_aq-B-42-400deg-30day-12 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 1.054e-7 0.3 146.1 88.5 IRM backfield acquisition after annealing at 673K for 146.1 days IRMbackfield_aq-B-42-400deg-30day-13 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 9.035e-8 0.3 141.9 88.5 IRM backfield acquisition after annealing at 673K for 141.9 days IRMbackfield_aq-B-42-400deg-30day-14 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.06 293 7.465e-8 0.3 140 88 IRM backfield acquisition after annealing at 673K for 140 days IRMbackfield_aq-B-42-400deg-30day-15 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.07 293 5.767e-8 0.3 121.4 87.8 IRM backfield acquisition after annealing at 673K for 121.4 days IRMbackfield_aq-B-42-400deg-30day-16 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 4.078e-8 0.8 104.3 87.9 IRM backfield acquisition after annealing at 673K for 104.3 days IRMbackfield_aq-B-42-400deg-30day-17 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 8.41e-9 0.5 69.5 83.7 IRM backfield acquisition after annealing at 673K for 69.5 days IRMbackfield_aq-B-42-400deg-30day-18 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.125 293 2.6049999999999998e-8 0.2 35.5 -84.7 IRM backfield acquisition after annealing at 673K for 35.5 days IRMbackfield_aq-B-42-400deg-30day-19 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 5.588e-8 0.1 340.4 -87.3 IRM backfield acquisition after annealing at 673K for 340.4 days IRMbackfield_aq-B-42-400deg-30day-20 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.175 293 7.934e-8 0.3 25.5 -87.3 IRM backfield acquisition after annealing at 673K for 25.5 days IRMbackfield_aq-B-42-400deg-30day-21 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 9.668e-8 0.3 4.8 -87.6 IRM backfield acquisition after annealing at 673K for 4.8 days IRMbackfield_aq-B-42-400deg-30day-22 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.25 293 1.1900000000000001e-7 0.3 5.8 -88 IRM backfield acquisition after annealing at 673K for 5.8 days IRMbackfield_aq-B-42-400deg-30day-23 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 1.286e-7 0.3 348.9 -88.2 IRM backfield acquisition after annealing at 673K for 348.9 days IRMbackfield_aq-B-42-400deg-30day-24 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.35 293 1.3469999999999998e-7 0.2 7.6 -88.1 IRM backfield acquisition after annealing at 673K for 7.6 days IRMbackfield_aq-B-42-400deg-30day-25 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 1.406e-7 0.3 16.2 -88 IRM backfield acquisition after annealing at 673K for 16.2 days IRMbackfield_aq-B-42-400deg-30day-26 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.5 293 1.449e-7 0.3 19.8 -87.5 IRM backfield acquisition after annealing at 673K for 19.8 days IRMbackfield_aq-B-42-400deg-30day-27 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 1.469e-7 0.3 17.2 -88.3 IRM backfield acquisition after annealing at 673K for 17.2 days IRMbackfield_aq-B-42-400deg-30day-28 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 1.4809999999999998e-7 0.3 23 -88.1 IRM backfield acquisition after annealing at 673K for 23 days IRMbackfield_aq-B-42-400deg-30day-29 IRMbackfield_aq-B-42-400deg-30day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 1.4919999999999999e-7 0.3 8.5 -88.5 IRM backfield acquisition after annealing at 673K for 8.5 days IRMbackfield_aq-B-42-400deg-60day-1 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 1.493e-7 0.2 184.3 87.9 IRM backfield acquisition after annealing at 673K for 184.3 days IRMbackfield_aq-B-42-400deg-60day-2 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.003 293 1.482e-7 0.1 192.2 87.8 IRM backfield acquisition after annealing at 673K for 192.2 days IRMbackfield_aq-B-42-400deg-60day-3 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.005 293 1.474e-7 0.1 192.9 87.7 IRM backfield acquisition after annealing at 673K for 192.9 days IRMbackfield_aq-B-42-400deg-60day-4 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0075 293 1.448e-7 0.1 169.5 88.5 IRM backfield acquisition after annealing at 673K for 169.5 days IRMbackfield_aq-B-42-400deg-60day-5 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 1.438e-7 0.1 173.6 88.3 IRM backfield acquisition after annealing at 673K for 173.6 days IRMbackfield_aq-B-42-400deg-60day-6 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0125 293 1.422e-7 0.1 185.2 88.6 IRM backfield acquisition after annealing at 673K for 185.2 days IRMbackfield_aq-B-42-400deg-60day-7 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 1.402e-7 0.1 186.8 87.9 IRM backfield acquisition after annealing at 673K for 186.8 days IRMbackfield_aq-B-42-400deg-60day-8 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 1.354e-7 0.1 177.2 88.1 IRM backfield acquisition after annealing at 673K for 177.2 days IRMbackfield_aq-B-42-400deg-60day-9 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 1.288e-7 0.1 183.2 88.4 IRM backfield acquisition after annealing at 673K for 183.2 days IRMbackfield_aq-B-42-400deg-60day-10 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 1.2320000000000002e-7 0.1 170 88.6 IRM backfield acquisition after annealing at 673K for 170 days IRMbackfield_aq-B-42-400deg-60day-11 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.035 293 1.1579999999999999e-7 0.1 173.3 88.7 IRM backfield acquisition after annealing at 673K for 173.3 days IRMbackfield_aq-B-42-400deg-60day-12 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 1.0670000000000001e-7 0.3 194.6 88.4 IRM backfield acquisition after annealing at 673K for 194.6 days IRMbackfield_aq-B-42-400deg-60day-13 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 9.003e-8 0.1 193.7 88.5 IRM backfield acquisition after annealing at 673K for 193.7 days IRMbackfield_aq-B-42-400deg-60day-14 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.06 293 7.156e-8 0.5 181.8 89 IRM backfield acquisition after annealing at 673K for 181.8 days IRMbackfield_aq-B-42-400deg-60day-15 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.07 293 5.704e-8 0.1 216.2 88.9 IRM backfield acquisition after annealing at 673K for 216.2 days IRMbackfield_aq-B-42-400deg-60day-16 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 3.847e-8 0.2 234.8 88.9 IRM backfield acquisition after annealing at 673K for 234.8 days IRMbackfield_aq-B-42-400deg-60day-17 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 2.85e-9 0.8 304 71.7 IRM backfield acquisition after annealing at 673K for 304 days IRMbackfield_aq-B-42-400deg-60day-18 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.125 293 3.245e-8 0.2 44.1 -87.4 IRM backfield acquisition after annealing at 673K for 44.1 days IRMbackfield_aq-B-42-400deg-60day-19 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 6.164e-8 0.1 345.7 -87.2 IRM backfield acquisition after annealing at 673K for 345.7 days IRMbackfield_aq-B-42-400deg-60day-20 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.175 293 8.455e-8 0.1 348 -87.7 IRM backfield acquisition after annealing at 673K for 348 days IRMbackfield_aq-B-42-400deg-60day-21 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 1.022e-7 0.1 352.6 -87.8 IRM backfield acquisition after annealing at 673K for 352.6 days IRMbackfield_aq-B-42-400deg-60day-22 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.25 293 1.219e-7 0.1 16.6 -87.4 IRM backfield acquisition after annealing at 673K for 16.6 days IRMbackfield_aq-B-42-400deg-60day-23 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 1.3219999999999998e-7 0.3 2.1 -87.7 IRM backfield acquisition after annealing at 673K for 2.1 days IRMbackfield_aq-B-42-400deg-60day-24 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.35 293 1.38e-7 0.3 347.4 -88.2 IRM backfield acquisition after annealing at 673K for 347.4 days IRMbackfield_aq-B-42-400deg-60day-25 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 1.423e-7 0.1 324.9 -88.3 IRM backfield acquisition after annealing at 673K for 324.9 days IRMbackfield_aq-B-42-400deg-60day-26 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.5 293 1.477e-7 0.1 347.6 -88.1 IRM backfield acquisition after annealing at 673K for 347.6 days IRMbackfield_aq-B-42-400deg-60day-27 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 1.491e-7 0.2 344 -88.4 IRM backfield acquisition after annealing at 673K for 344 days IRMbackfield_aq-B-42-400deg-60day-28 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 1.515e-7 0.2 356.9 -88.5 IRM backfield acquisition after annealing at 673K for 356.9 days IRMbackfield_aq-B-42-400deg-60day-29 IRMbackfield_aq-B-42-400deg-60day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 1.5220000000000003e-7 0.2 13.6 -88.4 IRM backfield acquisition after annealing at 673K for 13.6 days IRMbackfield_aq-B-42-400deg-120day-3 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 1.5589999999999999e-7 0.2 163.7 87.8 IRM backfield acquisition after annealing at 673K for 163.7 days IRMbackfield_aq-B-42-400deg-120day-4 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.003 293 1.553e-7 0.2 164.9 87.9 IRM backfield acquisition after annealing at 673K for 164.9 days IRMbackfield_aq-B-42-400deg-120day-5 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.005 293 1.541e-7 0.2 166.4 87.9 IRM backfield acquisition after annealing at 673K for 166.4 days IRMbackfield_aq-B-42-400deg-120day-6 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0075 293 1.525e-7 0.2 168.3 87.5 IRM backfield acquisition after annealing at 673K for 168.3 days IRMbackfield_aq-B-42-400deg-120day-7 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 1.503e-7 0.2 162.8 88 IRM backfield acquisition after annealing at 673K for 162.8 days IRMbackfield_aq-B-42-400deg-120day-8 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0125 293 1.483e-7 0.2 166.4 87.8 IRM backfield acquisition after annealing at 673K for 166.4 days IRMbackfield_aq-B-42-400deg-120day-9 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 1.461e-7 0.3 169.7 87.7 IRM backfield acquisition after annealing at 673K for 169.7 days IRMbackfield_aq-B-42-400deg-120day-10 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 1.4080000000000002e-7 0.2 183.2 87.6 IRM backfield acquisition after annealing at 673K for 183.2 days IRMbackfield_aq-B-42-400deg-120day-11 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 1.343e-7 0.2 166 87.9 IRM backfield acquisition after annealing at 673K for 166 days IRMbackfield_aq-B-42-400deg-120day-12 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 1.273e-7 0.2 161.2 88.1 IRM backfield acquisition after annealing at 673K for 161.2 days IRMbackfield_aq-B-42-400deg-120day-13 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.035 293 1.197e-7 0.2 177.9 87.7 IRM backfield acquisition after annealing at 673K for 177.9 days IRMbackfield_aq-B-42-400deg-120day-14 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 1.102e-7 0.2 156.5 88.2 IRM backfield acquisition after annealing at 673K for 156.5 days IRMbackfield_aq-B-42-400deg-120day-15 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 9.178e-8 0.3 167 88.3 IRM backfield acquisition after annealing at 673K for 167 days IRMbackfield_aq-B-42-400deg-120day-16 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.06 293 7.337e-8 0.2 147.9 88.1 IRM backfield acquisition after annealing at 673K for 147.9 days IRMbackfield_aq-B-42-400deg-120day-17 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.07 293 5.415e-8 0.2 144.2 88.3 IRM backfield acquisition after annealing at 673K for 144.2 days IRMbackfield_aq-B-42-400deg-120day-18 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 3.617e-8 0.3 154.9 89.7 IRM backfield acquisition after annealing at 673K for 154.9 days IRMbackfield_aq-B-42-400deg-120day-19 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 1.809e-9 1 30.1 54.7 IRM backfield acquisition after annealing at 673K for 30.1 days IRMbackfield_aq-B-42-400deg-120day-20 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.125 293 3.6100000000000006e-8 0.2 16.7 -85.9 IRM backfield acquisition after annealing at 673K for 16.7 days IRMbackfield_aq-B-42-400deg-120day-21 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 6.655000000000001e-8 0.2 20.6 -86.9 IRM backfield acquisition after annealing at 673K for 20.6 days IRMbackfield_aq-B-42-400deg-120day-22 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.175 293 9.054e-8 0.2 353.3 -87.1 IRM backfield acquisition after annealing at 673K for 353.3 days IRMbackfield_aq-B-42-400deg-120day-23 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 1.069e-7 0.2 10.8 -87.2 IRM backfield acquisition after annealing at 673K for 10.8 days IRMbackfield_aq-B-42-400deg-120day-24 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.25 293 1.278e-7 0.2 12.5 -87.3 IRM backfield acquisition after annealing at 673K for 12.5 days IRMbackfield_aq-B-42-400deg-120day-25 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 1.3870000000000002e-7 0.2 359.5 -87.5 IRM backfield acquisition after annealing at 673K for 359.5 days IRMbackfield_aq-B-42-400deg-120day-26 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.35 293 1.4449999999999998e-7 0.3 354.6 -87.6 IRM backfield acquisition after annealing at 673K for 354.6 days IRMbackfield_aq-B-42-400deg-120day-27 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 1.484e-7 0.2 343.6 -87.6 IRM backfield acquisition after annealing at 673K for 343.6 days IRMbackfield_aq-B-42-400deg-120day-28 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.5 293 1.52e-7 0.2 2.6 -87.7 IRM backfield acquisition after annealing at 673K for 2.6 days IRMbackfield_aq-B-42-400deg-120day-29 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 1.545e-7 0.3 359.1 -87.8 IRM backfield acquisition after annealing at 673K for 359.1 days IRMbackfield_aq-B-42-400deg-120day-30 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 1.564e-7 0.2 11.2 -88.1 IRM backfield acquisition after annealing at 673K for 11.2 days IRMbackfield_aq-B-42-400deg-120day-31 IRMbackfield_aq-B-42-400deg-120day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 1.574e-7 0.2 12.1 -88.2 IRM backfield acquisition after annealing at 673K for 12.1 days IRMbackfield_aq-B-42-400deg-240day-3 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 0 293 6.675e-8 0.3 2.7 -88.3 IRM backfield acquisition after annealing at 673K for 2.7 days IRMbackfield_aq-B-42-400deg-240day-4 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 1.6090000000000002e-7 0.1 178.7 88.1 IRM backfield acquisition after annealing at 673K for 178.7 days IRMbackfield_aq-B-42-400deg-240day-5 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.003 293 1.5789999999999998e-7 0.2 190.5 87.9 IRM backfield acquisition after annealing at 673K for 190.5 days IRMbackfield_aq-B-42-400deg-240day-6 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.005 293 1.558e-7 0.2 190.4 87.8 IRM backfield acquisition after annealing at 673K for 190.4 days IRMbackfield_aq-B-42-400deg-240day-7 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0075 293 1.56e-7 0.2 180.3 88.4 IRM backfield acquisition after annealing at 673K for 180.3 days IRMbackfield_aq-B-42-400deg-240day-8 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 1.539e-7 0.2 178.4 88.2 IRM backfield acquisition after annealing at 673K for 178.4 days IRMbackfield_aq-B-42-400deg-240day-9 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0125 293 1.517e-7 0.2 180.3 88.1 IRM backfield acquisition after annealing at 673K for 180.3 days IRMbackfield_aq-B-42-400deg-240day-10 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 1.489e-7 0.2 181.4 88.3 IRM backfield acquisition after annealing at 673K for 181.4 days IRMbackfield_aq-B-42-400deg-240day-11 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 1.434e-7 0.2 174.3 88.2 IRM backfield acquisition after annealing at 673K for 174.3 days IRMbackfield_aq-B-42-400deg-240day-12 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 1.365e-7 0.2 183 88.2 IRM backfield acquisition after annealing at 673K for 183 days IRMbackfield_aq-B-42-400deg-240day-13 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 1.287e-7 0.2 185.7 87.7 IRM backfield acquisition after annealing at 673K for 185.7 days IRMbackfield_aq-B-42-400deg-240day-14 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.035 293 1.195e-7 0.2 191.7 87.6 IRM backfield acquisition after annealing at 673K for 191.7 days IRMbackfield_aq-B-42-400deg-240day-15 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 1.089e-7 0.2 193.7 87.7 IRM backfield acquisition after annealing at 673K for 193.7 days IRMbackfield_aq-B-42-400deg-240day-16 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 8.943e-8 0.2 208.2 87.7 IRM backfield acquisition after annealing at 673K for 208.2 days IRMbackfield_aq-B-42-400deg-240day-17 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.06 293 7.022e-8 0.2 203.6 87.6 IRM backfield acquisition after annealing at 673K for 203.6 days IRMbackfield_aq-B-42-400deg-240day-18 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.07 293 5.0779999999999995e-8 0.2 176.1 88.1 IRM backfield acquisition after annealing at 673K for 176.1 days IRMbackfield_aq-B-42-400deg-240day-19 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 3.126e-8 0.1 242 87.6 IRM backfield acquisition after annealing at 673K for 242 days IRMbackfield_aq-B-42-400deg-240day-20 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.09 293 1.228e-8 0.2 281.3 82.5 IRM backfield acquisition after annealing at 673K for 281.3 days IRMbackfield_aq-B-42-400deg-240day-21 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 5.566e-9 0.5 56.8 -70.7 IRM backfield acquisition after annealing at 673K for 56.8 days IRMbackfield_aq-B-42-400deg-240day-22 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.125 293 4.4249999999999996e-8 0.2 298.7 -83.8 IRM backfield acquisition after annealing at 673K for 298.7 days IRMbackfield_aq-B-42-400deg-240day-23 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 7.483e-8 0.1 294.2 -84.4 IRM backfield acquisition after annealing at 673K for 294.2 days IRMbackfield_aq-B-42-400deg-240day-24 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.175 293 9.874000000000001e-8 0.2 321.2 -86.5 IRM backfield acquisition after annealing at 673K for 321.2 days IRMbackfield_aq-B-42-400deg-240day-25 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 1.146e-7 0.2 330.7 -86.9 IRM backfield acquisition after annealing at 673K for 330.7 days IRMbackfield_aq-B-42-400deg-240day-26 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.25 293 1.359e-7 0.2 313.6 -86.4 IRM backfield acquisition after annealing at 673K for 313.6 days IRMbackfield_aq-B-42-400deg-240day-27 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 1.461e-7 0.1 314.5 -86.6 IRM backfield acquisition after annealing at 673K for 314.5 days IRMbackfield_aq-B-42-400deg-240day-28 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.35 293 1.5220000000000003e-7 0.2 316.4 -86.8 IRM backfield acquisition after annealing at 673K for 316.4 days IRMbackfield_aq-B-42-400deg-240day-29 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 1.555e-7 0.1 310.2 -87.1 IRM backfield acquisition after annealing at 673K for 310.2 days IRMbackfield_aq-B-42-400deg-240day-30 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.5 293 1.586e-7 0.2 352.6 -87.7 IRM backfield acquisition after annealing at 673K for 352.6 days IRMbackfield_aq-B-42-400deg-240day-31 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 1.61e-7 0.2 337.9 -87.5 IRM backfield acquisition after annealing at 673K for 337.9 days IRMbackfield_aq-B-42-400deg-240day-32 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 1.624e-7 0.1 352.1 -88 IRM backfield acquisition after annealing at 673K for 352.1 days IRMbackfield_aq-B-42-400deg-240day-33 IRMbackfield_aq-B-42-400deg-240day B-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 1.633e-7 0.2 22.8 -87.4 IRM backfield acquisition after annealing at 673K for 22.8 days IRMbackfield_aq-B-44-200deg-0day-1 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 0 293 1.45e-8 0.5 68.6 54.1 IRM backfield acquisition after annealing at 473K for 68.6 days IRMbackfield_aq-B-44-200deg-0day-2 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 6.093e-7 0.2 20.6 89.2 IRM backfield acquisition after annealing at 473K for 20.6 days IRMbackfield_aq-B-44-200deg-0day-3 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 6.011000000000001e-7 0.3 144.5 88.2 IRM backfield acquisition after annealing at 473K for 144.5 days IRMbackfield_aq-B-44-200deg-0day-4 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 5.96e-7 0.2 18 89.6 IRM backfield acquisition after annealing at 473K for 18 days IRMbackfield_aq-B-44-200deg-0day-5 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 5.906e-7 0.2 27.9 89.8 IRM backfield acquisition after annealing at 473K for 27.9 days IRMbackfield_aq-B-44-200deg-0day-6 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 5.835e-7 0.2 114.8 88.7 IRM backfield acquisition after annealing at 473K for 114.8 days IRMbackfield_aq-B-44-200deg-0day-7 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 5.759e-7 0.2 131.1 88.5 IRM backfield acquisition after annealing at 473K for 131.1 days IRMbackfield_aq-B-44-200deg-0day-8 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 5.563e-7 0.2 267.4 89.8 IRM backfield acquisition after annealing at 473K for 267.4 days IRMbackfield_aq-B-44-200deg-0day-9 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 5.338e-7 0.2 133.6 88.4 IRM backfield acquisition after annealing at 473K for 133.6 days IRMbackfield_aq-B-44-200deg-0day-10 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 4.4030000000000004e-7 0.3 127.2 87.6 IRM backfield acquisition after annealing at 473K for 127.2 days IRMbackfield_aq-B-44-200deg-0day-11 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 3.5480000000000003e-7 0.2 117.8 87.2 IRM backfield acquisition after annealing at 473K for 117.8 days IRMbackfield_aq-B-44-200deg-0day-12 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 1.6359999999999998e-7 0.2 343.3 -83.3 IRM backfield acquisition after annealing at 473K for 343.3 days IRMbackfield_aq-B-44-200deg-0day-13 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 4.397e-7 0.2 331.1 -87.4 IRM backfield acquisition after annealing at 473K for 331.1 days IRMbackfield_aq-B-44-200deg-0day-14 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 5.400999999999999e-7 0.2 57.1 -88.1 IRM backfield acquisition after annealing at 473K for 57.1 days IRMbackfield_aq-B-44-200deg-0day-15 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 5.957e-7 0.1 68.1 -89 IRM backfield acquisition after annealing at 473K for 68.1 days IRMbackfield_aq-B-44-200deg-0day-16 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 6.076e-7 0.2 314.2 -88.8 IRM backfield acquisition after annealing at 473K for 314.2 days IRMbackfield_aq-B-44-200deg-0day-17 IRMbackfield_aq-B-44-200deg-0day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 6.120999999999999e-7 0.2 359.3 -88.9 IRM backfield acquisition after annealing at 473K for 359.3 days IRMbackfield_aq-B-44-200deg-15day-1 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 0 293 1.529e-8 3.4 301.3 -86.1 IRM backfield acquisition after annealing at 473K for 301.3 days IRMbackfield_aq-B-44-200deg-15day-2 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 0 293 1.526e-8 3.5 312.4 -85.6 IRM backfield acquisition after annealing at 473K for 312.4 days IRMbackfield_aq-B-44-200deg-15day-3 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 6.262e-7 0.2 141.7 88.8 IRM backfield acquisition after annealing at 473K for 141.7 days IRMbackfield_aq-B-44-200deg-15day-4 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 6.149e-7 0.3 154.9 88.2 IRM backfield acquisition after annealing at 473K for 154.9 days IRMbackfield_aq-B-44-200deg-15day-5 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 6.085e-7 0.3 145.3 88.5 IRM backfield acquisition after annealing at 473K for 145.3 days IRMbackfield_aq-B-44-200deg-15day-6 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 6.009999999999999e-7 0.2 142.6 88.7 IRM backfield acquisition after annealing at 473K for 142.6 days IRMbackfield_aq-B-44-200deg-15day-7 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 5.93e-7 0.3 136.8 88.7 IRM backfield acquisition after annealing at 473K for 136.8 days IRMbackfield_aq-B-44-200deg-15day-8 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 5.847e-7 0.3 135 88.6 IRM backfield acquisition after annealing at 473K for 135 days IRMbackfield_aq-B-44-200deg-15day-9 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 5.595e-7 0.3 143.2 88.3 IRM backfield acquisition after annealing at 473K for 143.2 days IRMbackfield_aq-B-44-200deg-15day-10 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 5.347999999999999e-7 0.3 131 88.4 IRM backfield acquisition after annealing at 473K for 131 days IRMbackfield_aq-B-44-200deg-15day-11 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 4.274e-7 0.3 123.7 88.3 IRM backfield acquisition after annealing at 473K for 123.7 days IRMbackfield_aq-B-44-200deg-15day-12 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 3.303e-7 0.3 123.4 87.5 IRM backfield acquisition after annealing at 473K for 123.4 days IRMbackfield_aq-B-44-200deg-15day-13 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 5.0319999999999997e-8 0.5 89.6 79.4 IRM backfield acquisition after annealing at 473K for 89.6 days IRMbackfield_aq-B-44-200deg-15day-14 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 1.985e-7 0.3 48.7 -87.3 IRM backfield acquisition after annealing at 473K for 48.7 days IRMbackfield_aq-B-44-200deg-15day-15 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 4.662e-7 0.3 330.6 -86.3 IRM backfield acquisition after annealing at 473K for 330.6 days IRMbackfield_aq-B-44-200deg-15day-16 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 5.603000000000001e-7 0.3 12.5 -88.1 IRM backfield acquisition after annealing at 473K for 12.5 days IRMbackfield_aq-B-44-200deg-15day-17 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 6.114e-7 0.3 346.3 -88.1 IRM backfield acquisition after annealing at 473K for 346.3 days IRMbackfield_aq-B-44-200deg-15day-18 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 6.229e-7 0.3 352.3 -88.6 IRM backfield acquisition after annealing at 473K for 352.3 days IRMbackfield_aq-B-44-200deg-15day-19 IRMbackfield_aq-B-44-200deg-15day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 6.264e-7 0.3 338 -88.1 IRM backfield acquisition after annealing at 473K for 338 days IRMbackfield_aq-B-44-200deg-30day-1 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 6.244999999999999e-7 0.3 157.8 89 IRM backfield acquisition after annealing at 473K for 157.8 days IRMbackfield_aq-B-44-200deg-30day-2 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.003 293 6.244e-7 0.3 153.4 89.1 IRM backfield acquisition after annealing at 473K for 153.4 days IRMbackfield_aq-B-44-200deg-30day-3 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.005 293 6.218e-7 0.3 169.2 88.8 IRM backfield acquisition after annealing at 473K for 169.2 days IRMbackfield_aq-B-44-200deg-30day-4 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0075 293 6.196e-7 0.3 166.7 88.9 IRM backfield acquisition after annealing at 473K for 166.7 days IRMbackfield_aq-B-44-200deg-30day-5 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 6.166000000000001e-7 0.3 162.2 89 IRM backfield acquisition after annealing at 473K for 162.2 days IRMbackfield_aq-B-44-200deg-30day-6 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0125 293 6.141e-7 0.3 159.3 89.1 IRM backfield acquisition after annealing at 473K for 159.3 days IRMbackfield_aq-B-44-200deg-30day-7 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 6.112e-7 0.3 164.6 88.9 IRM backfield acquisition after annealing at 473K for 164.6 days IRMbackfield_aq-B-44-200deg-30day-8 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 6.043e-7 0.3 163.2 88.8 IRM backfield acquisition after annealing at 473K for 163.2 days IRMbackfield_aq-B-44-200deg-30day-9 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 5.871000000000001e-7 0.3 164.3 88.9 IRM backfield acquisition after annealing at 473K for 164.3 days IRMbackfield_aq-B-44-200deg-30day-10 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.035 293 5.758000000000001e-7 0.3 157.8 89.1 IRM backfield acquisition after annealing at 473K for 157.8 days IRMbackfield_aq-B-44-200deg-30day-11 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 5.64e-7 0.3 153.4 89.2 IRM backfield acquisition after annealing at 473K for 153.4 days IRMbackfield_aq-B-44-200deg-30day-12 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 5.352e-7 0.3 125.1 89.2 IRM backfield acquisition after annealing at 473K for 125.1 days IRMbackfield_aq-B-44-200deg-30day-13 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.06 293 5.078e-7 0.2 132 89.1 IRM backfield acquisition after annealing at 473K for 132 days IRMbackfield_aq-B-44-200deg-30day-14 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.07 293 4.734e-7 0.3 150.9 88.8 IRM backfield acquisition after annealing at 473K for 150.9 days IRMbackfield_aq-B-44-200deg-30day-15 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 4.306e-7 0.3 147.1 88.8 IRM backfield acquisition after annealing at 473K for 147.1 days IRMbackfield_aq-B-44-200deg-30day-16 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 3.3530000000000004e-7 0.3 126.2 88.3 IRM backfield acquisition after annealing at 473K for 126.2 days IRMbackfield_aq-B-44-200deg-30day-17 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.125 293 1.988e-7 0.4 72.3 88.4 IRM backfield acquisition after annealing at 473K for 72.3 days IRMbackfield_aq-B-44-200deg-30day-18 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 5.84e-8 0.5 46.8 83.6 IRM backfield acquisition after annealing at 473K for 46.8 days IRMbackfield_aq-B-44-200deg-30day-19 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.175 293 7.904e-8 0.3 58.5 -83.4 IRM backfield acquisition after annealing at 473K for 58.5 days IRMbackfield_aq-B-44-200deg-30day-20 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 1.8929999999999998e-7 0.3 23.3 -86.7 IRM backfield acquisition after annealing at 473K for 23.3 days IRMbackfield_aq-B-44-200deg-30day-21 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.25 293 3.5980000000000003e-7 0.3 61.4 -87.4 IRM backfield acquisition after annealing at 473K for 61.4 days IRMbackfield_aq-B-44-200deg-30day-22 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 4.609e-7 0.3 42.1 -87.7 IRM backfield acquisition after annealing at 473K for 42.1 days IRMbackfield_aq-B-44-200deg-30day-23 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.35 293 5.253000000000001e-7 0.3 37.9 -88.1 IRM backfield acquisition after annealing at 473K for 37.9 days IRMbackfield_aq-B-44-200deg-30day-24 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 5.593e-7 0.3 349.3 -88.1 IRM backfield acquisition after annealing at 473K for 349.3 days IRMbackfield_aq-B-44-200deg-30day-25 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.5 293 5.999e-7 0.3 27.6 -88.8 IRM backfield acquisition after annealing at 473K for 27.6 days IRMbackfield_aq-B-44-200deg-30day-26 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 6.142e-7 0.3 348.9 -87.7 IRM backfield acquisition after annealing at 473K for 348.9 days IRMbackfield_aq-B-44-200deg-30day-27 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 6.256e-7 0.3 355.9 -88.4 IRM backfield acquisition after annealing at 473K for 355.9 days IRMbackfield_aq-B-44-200deg-30day-28 IRMbackfield_aq-B-44-200deg-30day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 6.292e-7 0.3 320.5 -89 IRM backfield acquisition after annealing at 473K for 320.5 days IRMbackfield_aq-B-44-200deg-60day-1 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 6.339e-7 0.1 144.5 89.4 IRM backfield acquisition after annealing at 473K for 144.5 days IRMbackfield_aq-B-44-200deg-60day-2 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.003 293 6.309e-7 0.1 163.8 89 IRM backfield acquisition after annealing at 473K for 163.8 days IRMbackfield_aq-B-44-200deg-60day-3 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.005 293 6.289e-7 0.1 156 89.4 IRM backfield acquisition after annealing at 473K for 156 days IRMbackfield_aq-B-44-200deg-60day-4 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0075 293 6.266000000000001e-7 0.1 177.8 88.8 IRM backfield acquisition after annealing at 473K for 177.8 days IRMbackfield_aq-B-44-200deg-60day-5 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 6.238e-7 0.2 177.3 88.9 IRM backfield acquisition after annealing at 473K for 177.3 days IRMbackfield_aq-B-44-200deg-60day-6 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0125 293 6.206e-7 0.2 175.5 88.8 IRM backfield acquisition after annealing at 473K for 175.5 days IRMbackfield_aq-B-44-200deg-60day-7 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 6.175e-7 0.2 166.7 89.3 IRM backfield acquisition after annealing at 473K for 166.7 days IRMbackfield_aq-B-44-200deg-60day-8 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 6.104e-7 0.2 167.4 89 IRM backfield acquisition after annealing at 473K for 167.4 days IRMbackfield_aq-B-44-200deg-60day-9 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 6.028e-7 0.2 167 89 IRM backfield acquisition after annealing at 473K for 167 days IRMbackfield_aq-B-44-200deg-60day-10 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 5.92e-7 0.2 167.8 88.7 IRM backfield acquisition after annealing at 473K for 167.8 days IRMbackfield_aq-B-44-200deg-60day-11 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.035 293 5.814000000000001e-7 0.2 169.7 88.8 IRM backfield acquisition after annealing at 473K for 169.7 days IRMbackfield_aq-B-44-200deg-60day-12 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 5.684e-7 0.2 161.3 89.1 IRM backfield acquisition after annealing at 473K for 161.3 days IRMbackfield_aq-B-44-200deg-60day-13 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 5.423e-7 0.2 166.5 88.9 IRM backfield acquisition after annealing at 473K for 166.5 days IRMbackfield_aq-B-44-200deg-60day-14 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.06 293 5.077e-7 0.2 171.5 88.8 IRM backfield acquisition after annealing at 473K for 171.5 days IRMbackfield_aq-B-44-200deg-60day-15 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.07 293 4.731e-7 0.2 137.4 89.3 IRM backfield acquisition after annealing at 473K for 137.4 days IRMbackfield_aq-B-44-200deg-60day-16 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 4.287e-7 0.2 135.7 89.2 IRM backfield acquisition after annealing at 473K for 135.7 days IRMbackfield_aq-B-44-200deg-60day-17 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 3.2890000000000004e-7 0.2 139 88.6 IRM backfield acquisition after annealing at 473K for 139 days IRMbackfield_aq-B-44-200deg-60day-18 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.125 293 1.948e-7 0.2 85 89.1 IRM backfield acquisition after annealing at 473K for 85 days IRMbackfield_aq-B-44-200deg-60day-19 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 5.753e-8 0.3 62.5 82.8 IRM backfield acquisition after annealing at 473K for 62.5 days IRMbackfield_aq-B-44-200deg-60day-20 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.175 293 7.699e-8 0.1 10.5 -82.9 IRM backfield acquisition after annealing at 473K for 10.5 days IRMbackfield_aq-B-44-200deg-60day-21 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.175 293 7.686e-8 0.1 10.3 -83 IRM backfield acquisition after annealing at 473K for 10.3 days IRMbackfield_aq-B-44-200deg-60day-22 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 1.947e-7 0.2 1.6 -86.1 IRM backfield acquisition after annealing at 473K for 1.6 days IRMbackfield_aq-B-44-200deg-60day-23 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.25 293 3.742e-7 0.2 45.4 -88.1 IRM backfield acquisition after annealing at 473K for 45.4 days IRMbackfield_aq-B-44-200deg-60day-24 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 4.66e-7 0.2 322.1 -86.5 IRM backfield acquisition after annealing at 473K for 322.1 days IRMbackfield_aq-B-44-200deg-60day-25 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.35 293 5.26e-7 0.2 355.3 -87.7 IRM backfield acquisition after annealing at 473K for 355.3 days IRMbackfield_aq-B-44-200deg-60day-26 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 5.624e-7 0.2 356 -87.8 IRM backfield acquisition after annealing at 473K for 356 days IRMbackfield_aq-B-44-200deg-60day-27 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.5 293 6.003e-7 0.1 2.4 -87.9 IRM backfield acquisition after annealing at 473K for 2.4 days IRMbackfield_aq-B-44-200deg-60day-28 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 6.147e-7 0.2 344.7 -87.6 IRM backfield acquisition after annealing at 473K for 344.7 days IRMbackfield_aq-B-44-200deg-60day-29 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 6.275e-7 0.1 346.2 -88 IRM backfield acquisition after annealing at 473K for 346.2 days IRMbackfield_aq-B-44-200deg-60day-30 IRMbackfield_aq-B-44-200deg-60day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 6.313e-7 0.1 321 -88.7 IRM backfield acquisition after annealing at 473K for 321 days IRMbackfield_aq-B-44-200deg-120day-4 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 6.375e-7 0.3 199.4 88.1 IRM backfield acquisition after annealing at 473K for 199.4 days IRMbackfield_aq-B-44-200deg-120day-5 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.003 293 6.37e-7 0.2 201.6 88.2 IRM backfield acquisition after annealing at 473K for 201.6 days IRMbackfield_aq-B-44-200deg-120day-6 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.005 293 6.346e-7 0.2 205.1 88.8 IRM backfield acquisition after annealing at 473K for 205.1 days IRMbackfield_aq-B-44-200deg-120day-7 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0075 293 6.326e-7 0.2 202.9 88.7 IRM backfield acquisition after annealing at 473K for 202.9 days IRMbackfield_aq-B-44-200deg-120day-8 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 6.296e-7 0.2 201.2 88.5 IRM backfield acquisition after annealing at 473K for 201.2 days IRMbackfield_aq-B-44-200deg-120day-9 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0125 293 6.27e-7 0.2 205.4 88.9 IRM backfield acquisition after annealing at 473K for 205.4 days IRMbackfield_aq-B-44-200deg-120day-10 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 6.238e-7 0.2 206.8 88.9 IRM backfield acquisition after annealing at 473K for 206.8 days IRMbackfield_aq-B-44-200deg-120day-11 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 6.166000000000001e-7 0.2 203.7 88.6 IRM backfield acquisition after annealing at 473K for 203.7 days IRMbackfield_aq-B-44-200deg-120day-12 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 6.077e-7 0.2 200.4 88.3 IRM backfield acquisition after annealing at 473K for 200.4 days IRMbackfield_aq-B-44-200deg-120day-13 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 5.975e-7 0.2 203.7 88.4 IRM backfield acquisition after annealing at 473K for 203.7 days IRMbackfield_aq-B-44-200deg-120day-14 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.035 293 5.861e-7 0.2 203.7 88.4 IRM backfield acquisition after annealing at 473K for 203.7 days IRMbackfield_aq-B-44-200deg-120day-15 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 5.705000000000001e-7 0.2 208.2 88.9 IRM backfield acquisition after annealing at 473K for 208.2 days IRMbackfield_aq-B-44-200deg-120day-16 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 5.415e-7 0.2 208.5 88.6 IRM backfield acquisition after annealing at 473K for 208.5 days IRMbackfield_aq-B-44-200deg-120day-17 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.06 293 5.078e-7 0.2 206.6 88.9 IRM backfield acquisition after annealing at 473K for 206.6 days IRMbackfield_aq-B-44-200deg-120day-18 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.07 293 4.6739999999999996e-7 0.2 226.2 89 IRM backfield acquisition after annealing at 473K for 226.2 days IRMbackfield_aq-B-44-200deg-120day-19 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 4.206e-7 0.2 251.1 89.2 IRM backfield acquisition after annealing at 473K for 251.1 days IRMbackfield_aq-B-44-200deg-120day-20 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 3.1980000000000004e-7 0.2 293.8 89.4 IRM backfield acquisition after annealing at 473K for 293.8 days IRMbackfield_aq-B-44-200deg-120day-21 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.125 293 1.769e-7 0.3 315 88.2 IRM backfield acquisition after annealing at 473K for 315 days IRMbackfield_aq-B-44-200deg-120day-22 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 3.22e-8 0.4 341.6 72.3 IRM backfield acquisition after annealing at 473K for 341.6 days IRMbackfield_aq-B-44-200deg-120day-23 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.175 293 1.0119999999999999e-7 0.2 338.6 -81.8 IRM backfield acquisition after annealing at 473K for 338.6 days IRMbackfield_aq-B-44-200deg-120day-24 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 2.135e-7 0.2 16.3 -85.5 IRM backfield acquisition after annealing at 473K for 16.3 days IRMbackfield_aq-B-44-200deg-120day-25 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.25 293 3.77e-7 0.2 10.6 -86.5 IRM backfield acquisition after annealing at 473K for 10.6 days IRMbackfield_aq-B-44-200deg-120day-26 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 4.7540000000000004e-7 0.2 21.4 -86.7 IRM backfield acquisition after annealing at 473K for 21.4 days IRMbackfield_aq-B-44-200deg-120day-27 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.35 293 5.352e-7 0.2 25 -87.2 IRM backfield acquisition after annealing at 473K for 25 days IRMbackfield_aq-B-44-200deg-120day-28 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 5.689e-7 0.3 21.9 -87.2 IRM backfield acquisition after annealing at 473K for 21.9 days IRMbackfield_aq-B-44-200deg-120day-29 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.5 293 6.041e-7 0.3 340.7 -88.5 IRM backfield acquisition after annealing at 473K for 340.7 days IRMbackfield_aq-B-44-200deg-120day-30 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 6.222e-7 0.3 20.7 -88.2 IRM backfield acquisition after annealing at 473K for 20.7 days IRMbackfield_aq-B-44-200deg-120day-31 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 6.337e-7 0.3 25.8 -88.2 IRM backfield acquisition after annealing at 473K for 25.8 days IRMbackfield_aq-B-44-200deg-120day-32 IRMbackfield_aq-B-44-200deg-120day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 6.361999999999999e-7 0.2 8.5 -88.3 IRM backfield acquisition after annealing at 473K for 8.5 days IRMbackfield_aq-B-44-200deg-240day-1 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 0 293 4.24e-7 0.4 332.5 -88.8 IRM backfield acquisition after annealing at 473K for 332.5 days IRMbackfield_aq-B-44-200deg-240day-2 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 6.507000000000001e-7 0.4 204 88 IRM backfield acquisition after annealing at 473K for 204 days IRMbackfield_aq-B-44-200deg-240day-3 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.003 293 6.455e-7 0.5 209 88.3 IRM backfield acquisition after annealing at 473K for 209 days IRMbackfield_aq-B-44-200deg-240day-4 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.005 293 6.427e-7 0.5 203.4 88.5 IRM backfield acquisition after annealing at 473K for 203.4 days IRMbackfield_aq-B-44-200deg-240day-5 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0075 293 6.403999999999999e-7 0.6 205.4 88.6 IRM backfield acquisition after annealing at 473K for 205.4 days IRMbackfield_aq-B-44-200deg-240day-6 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 6.372e-7 0.6 211.3 88.9 IRM backfield acquisition after annealing at 473K for 211.3 days IRMbackfield_aq-B-44-200deg-240day-7 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0125 293 6.335e-7 0.7 197.8 88.1 IRM backfield acquisition after annealing at 473K for 197.8 days IRMbackfield_aq-B-44-200deg-240day-8 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 6.302e-7 0.6 201.8 88.2 IRM backfield acquisition after annealing at 473K for 201.8 days IRMbackfield_aq-B-44-200deg-240day-9 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 6.218e-7 0.7 194.6 88.2 IRM backfield acquisition after annealing at 473K for 194.6 days IRMbackfield_aq-B-44-200deg-240day-10 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 6.117e-7 0.7 214.1 88.9 IRM backfield acquisition after annealing at 473K for 214.1 days IRMbackfield_aq-B-44-200deg-240day-11 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 6.004e-7 0.6 203.4 88.6 IRM backfield acquisition after annealing at 473K for 203.4 days IRMbackfield_aq-B-44-200deg-240day-12 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.035 293 5.865999999999999e-7 0.8 211.3 89 IRM backfield acquisition after annealing at 473K for 211.3 days IRMbackfield_aq-B-44-200deg-240day-13 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 5.695e-7 0.7 219.4 88.9 IRM backfield acquisition after annealing at 473K for 219.4 days IRMbackfield_aq-B-44-200deg-240day-14 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 5.341e-7 0.7 203.1 88.9 IRM backfield acquisition after annealing at 473K for 203.1 days IRMbackfield_aq-B-44-200deg-240day-15 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.06 293 4.951e-7 0.8 200.4 88.9 IRM backfield acquisition after annealing at 473K for 200.4 days IRMbackfield_aq-B-44-200deg-240day-16 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.07 293 4.48e-7 0.8 212.5 89 IRM backfield acquisition after annealing at 473K for 212.5 days IRMbackfield_aq-B-44-200deg-240day-17 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 3.969e-7 0.7 168.1 89.4 IRM backfield acquisition after annealing at 473K for 168.1 days IRMbackfield_aq-B-44-200deg-240day-18 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.09 293 3.41e-7 1 252.1 89.6 IRM backfield acquisition after annealing at 473K for 252.1 days IRMbackfield_aq-B-44-200deg-240day-19 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 2.854e-7 0.8 317.1 88.3 IRM backfield acquisition after annealing at 473K for 317.1 days IRMbackfield_aq-B-44-200deg-240day-20 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.125 293 1.354e-7 0.8 30.9 82.5 IRM backfield acquisition after annealing at 473K for 30.9 days IRMbackfield_aq-B-44-200deg-240day-21 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.14 293 4.4249999999999996e-8 1 337.2 65.9 IRM backfield acquisition after annealing at 473K for 337.2 days IRMbackfield_aq-B-44-200deg-240day-22 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 2.7379999999999998e-8 1 343.5 -38.3 IRM backfield acquisition after annealing at 473K for 343.5 days IRMbackfield_aq-B-44-200deg-240day-23 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.16 293 8.26e-8 0.9 18 -71 IRM backfield acquisition after annealing at 473K for 18 days IRMbackfield_aq-B-44-200deg-240day-24 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.175 293 1.581e-7 0.9 36.7 -77.3 IRM backfield acquisition after annealing at 473K for 36.7 days IRMbackfield_aq-B-44-200deg-240day-25 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 2.668e-7 0.8 336.7 -84.2 IRM backfield acquisition after annealing at 473K for 336.7 days IRMbackfield_aq-B-44-200deg-240day-26 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.25 293 4.239e-7 0.9 357.6 -84.9 IRM backfield acquisition after annealing at 473K for 357.6 days IRMbackfield_aq-B-44-200deg-240day-27 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 5.132e-7 1 350.3 -85.5 IRM backfield acquisition after annealing at 473K for 350.3 days IRMbackfield_aq-B-44-200deg-240day-28 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.35 293 5.647e-7 0.8 353.3 -86.1 IRM backfield acquisition after annealing at 473K for 353.3 days IRMbackfield_aq-B-44-200deg-240day-29 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 5.958e-7 1 19.8 -85.4 IRM backfield acquisition after annealing at 473K for 19.8 days IRMbackfield_aq-B-44-200deg-240day-30 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.5 293 6.252000000000001e-7 0.9 286.8 -88.2 IRM backfield acquisition after annealing at 473K for 286.8 days IRMbackfield_aq-B-44-200deg-240day-31 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 6.396000000000001e-7 0.9 17.4 -87.3 IRM backfield acquisition after annealing at 473K for 17.4 days IRMbackfield_aq-B-44-200deg-240day-32 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 6.489e-7 0.8 22.1 -87.2 IRM backfield acquisition after annealing at 473K for 22.1 days IRMbackfield_aq-B-44-200deg-240day-33 IRMbackfield_aq-B-44-200deg-240day B-44 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 6.514999999999999e-7 0.7 21 -87.1 IRM backfield acquisition after annealing at 473K for 21 days IRMbackfield_aq-E2-39-400deg-0day-1 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 0.00001117 0.1 223.3 84.1 IRM backfield acquisition after annealing at 673K for 223.3 days IRMbackfield_aq-E2-39-400deg-0day-2 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.003 293 0.000010510000000000001 0.1 222.9 84.2 IRM backfield acquisition after annealing at 673K for 222.9 days IRMbackfield_aq-E2-39-400deg-0day-3 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.005 293 0.000009934 0.1 227.4 84.3 IRM backfield acquisition after annealing at 673K for 227.4 days IRMbackfield_aq-E2-39-400deg-0day-4 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0075 293 0.000009225 0.1 227.6 84 IRM backfield acquisition after annealing at 673K for 227.6 days IRMbackfield_aq-E2-39-400deg-0day-5 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 0.000008504 0.1 228.3 84 IRM backfield acquisition after annealing at 673K for 228.3 days IRMbackfield_aq-E2-39-400deg-0day-6 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0125 293 0.000007827000000000001 0.1 224.6 83.9 IRM backfield acquisition after annealing at 673K for 224.6 days IRMbackfield_aq-E2-39-400deg-0day-7 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 0.000007197 0.1 228.9 83.4 IRM backfield acquisition after annealing at 673K for 228.9 days IRMbackfield_aq-E2-39-400deg-0day-8 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 0.000005933 0.2 230.2 83.3 IRM backfield acquisition after annealing at 673K for 230.2 days IRMbackfield_aq-E2-39-400deg-0day-9 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 0.000004744 0.1 227.4 83 IRM backfield acquisition after annealing at 673K for 227.4 days IRMbackfield_aq-E2-39-400deg-0day-10 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 0.000003687 0.1 232.5 82.3 IRM backfield acquisition after annealing at 673K for 232.5 days IRMbackfield_aq-E2-39-400deg-0day-11 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.035 293 0.00000257 0.2 243.2 80.1 IRM backfield acquisition after annealing at 673K for 243.2 days IRMbackfield_aq-E2-39-400deg-0day-12 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 0.0000015 0.2 246.2 75.5 IRM backfield acquisition after annealing at 673K for 246.2 days IRMbackfield_aq-E2-39-400deg-0day-13 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.045 293 6.767e-7 0.3 253.3 67.1 IRM backfield acquisition after annealing at 673K for 253.3 days IRMbackfield_aq-E2-39-400deg-0day-14 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 2.389e-7 0.4 265.3 -35.4 IRM backfield acquisition after annealing at 673K for 265.3 days IRMbackfield_aq-E2-39-400deg-0day-15 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.06 293 0.000001312 0.1 270.4 -87.1 IRM backfield acquisition after annealing at 673K for 270.4 days IRMbackfield_aq-E2-39-400deg-0day-16 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.07 293 0.000002343 0.1 354.3 -88.3 IRM backfield acquisition after annealing at 673K for 354.3 days IRMbackfield_aq-E2-39-400deg-0day-17 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 0.000003279 0.1 1.4 -87.5 IRM backfield acquisition after annealing at 673K for 1.4 days IRMbackfield_aq-E2-39-400deg-0day-18 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.09 293 0.000004053 0.1 30.2 -87 IRM backfield acquisition after annealing at 673K for 30.2 days IRMbackfield_aq-E2-39-400deg-0day-19 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 0.00000473 0.1 43.7 -86.1 IRM backfield acquisition after annealing at 673K for 43.7 days IRMbackfield_aq-E2-39-400deg-0day-20 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.125 293 0.0000059969999999999995 0.1 26.8 -86.4 IRM backfield acquisition after annealing at 673K for 26.8 days IRMbackfield_aq-E2-39-400deg-0day-21 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 0.000007054999999999999 0.1 32.1 -86.2 IRM backfield acquisition after annealing at 673K for 32.1 days IRMbackfield_aq-E2-39-400deg-0day-22 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.175 293 0.000007859 0.1 45 -85.8 IRM backfield acquisition after annealing at 673K for 45 days IRMbackfield_aq-E2-39-400deg-0day-23 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 0.000008514 0.1 36.6 -85.9 IRM backfield acquisition after annealing at 673K for 36.6 days IRMbackfield_aq-E2-39-400deg-0day-24 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.25 293 0.000009410999999999998 0.1 44.1 -85.7 IRM backfield acquisition after annealing at 673K for 44.1 days IRMbackfield_aq-E2-39-400deg-0day-25 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 0.00001004 0.1 47.9 -85.3 IRM backfield acquisition after annealing at 673K for 47.9 days IRMbackfield_aq-E2-39-400deg-0day-26 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.35 293 0.00001046 0.1 51.9 -85.6 IRM backfield acquisition after annealing at 673K for 51.9 days IRMbackfield_aq-E2-39-400deg-0day-27 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 0.00001073 0.1 46.3 -85.5 IRM backfield acquisition after annealing at 673K for 46.3 days IRMbackfield_aq-E2-39-400deg-0day-28 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.5 293 0.00001104 0.1 45.4 -85.6 IRM backfield acquisition after annealing at 673K for 45.4 days IRMbackfield_aq-E2-39-400deg-0day-29 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 0.00001121 0.1 46.1 -85.6 IRM backfield acquisition after annealing at 673K for 46.1 days IRMbackfield_aq-E2-39-400deg-0day-30 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 0.000011350000000000001 0.1 52.4 -85.5 IRM backfield acquisition after annealing at 673K for 52.4 days IRMbackfield_aq-E2-39-400deg-0day-31 IRMbackfield_aq-E2-39-400deg-0day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 0.000011429999999999999 0.1 47.3 -85.8 IRM backfield acquisition after annealing at 673K for 47.3 days IRMbackfield_aq-E2-39-400deg-7day-1 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 0 293 0.00000395 0.1 41.8 -84.3 IRM backfield acquisition after annealing at 673K for 41.8 days IRMbackfield_aq-E2-39-400deg-7day-2 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 0.0000111 0.1 227 84 IRM backfield acquisition after annealing at 673K for 227 days IRMbackfield_aq-E2-39-400deg-7day-3 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.003 293 0.00001038 0.1 234.2 83.9 IRM backfield acquisition after annealing at 673K for 234.2 days IRMbackfield_aq-E2-39-400deg-7day-4 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.005 293 0.000009809 0.1 231.7 83.7 IRM backfield acquisition after annealing at 673K for 231.7 days IRMbackfield_aq-E2-39-400deg-7day-5 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0075 293 0.000009082 0.1 229.8 83.7 IRM backfield acquisition after annealing at 673K for 229.8 days IRMbackfield_aq-E2-39-400deg-7day-6 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 0.000008337 0.1 230.2 83.7 IRM backfield acquisition after annealing at 673K for 230.2 days IRMbackfield_aq-E2-39-400deg-7day-7 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0125 293 0.00000763 0.1 235.9 83.3 IRM backfield acquisition after annealing at 673K for 235.9 days IRMbackfield_aq-E2-39-400deg-7day-8 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 0.0000069719999999999995 0.2 235.2 82.9 IRM backfield acquisition after annealing at 673K for 235.2 days IRMbackfield_aq-E2-39-400deg-7day-9 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 0.000005683 0.1 240.4 82.7 IRM backfield acquisition after annealing at 673K for 240.4 days IRMbackfield_aq-E2-39-400deg-7day-10 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 0.0000044289999999999994 0.1 236.3 82.8 IRM backfield acquisition after annealing at 673K for 236.3 days IRMbackfield_aq-E2-39-400deg-7day-11 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 0.000003326 0.1 246.8 81.5 IRM backfield acquisition after annealing at 673K for 246.8 days IRMbackfield_aq-E2-39-400deg-7day-12 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.035 293 0.000002169 0.1 248.8 79 IRM backfield acquisition after annealing at 673K for 248.8 days IRMbackfield_aq-E2-39-400deg-7day-13 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 0.0000011249999999999998 0.2 262.7 72.4 IRM backfield acquisition after annealing at 673K for 262.7 days IRMbackfield_aq-E2-39-400deg-7day-14 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.045 293 3.2600000000000003e-7 0.3 276.9 37.8 IRM backfield acquisition after annealing at 673K for 276.9 days IRMbackfield_aq-E2-39-400deg-7day-15 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 4.808e-7 0.2 277.4 -60.7 IRM backfield acquisition after annealing at 673K for 277.4 days IRMbackfield_aq-E2-39-400deg-7day-16 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.06 293 0.000001718 0.1 318 -83.9 IRM backfield acquisition after annealing at 673K for 318 days IRMbackfield_aq-E2-39-400deg-7day-17 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.07 293 0.000002783 0.1 27.8 -85.9 IRM backfield acquisition after annealing at 673K for 27.8 days IRMbackfield_aq-E2-39-400deg-7day-18 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 0.000003676 0.1 14 -86 IRM backfield acquisition after annealing at 673K for 14 days IRMbackfield_aq-E2-39-400deg-7day-19 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.09 293 0.000004448 0.1 20 -85.6 IRM backfield acquisition after annealing at 673K for 20 days IRMbackfield_aq-E2-39-400deg-7day-20 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 0.000005013 0.1 13.5 -85.8 IRM backfield acquisition after annealing at 673K for 13.5 days IRMbackfield_aq-E2-39-400deg-7day-21 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.125 293 0.0000062810000000000005 0.1 18.2 -86.1 IRM backfield acquisition after annealing at 673K for 18.2 days IRMbackfield_aq-E2-39-400deg-7day-22 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 0.000007211 0.1 25.4 -85.7 IRM backfield acquisition after annealing at 673K for 25.4 days IRMbackfield_aq-E2-39-400deg-7day-23 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.175 293 0.00000799 0.1 32.7 -85.6 IRM backfield acquisition after annealing at 673K for 32.7 days IRMbackfield_aq-E2-39-400deg-7day-24 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 0.000008606 0.1 38.3 -85.5 IRM backfield acquisition after annealing at 673K for 38.3 days IRMbackfield_aq-E2-39-400deg-7day-25 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.25 293 0.00000943 0.2 39 -85.3 IRM backfield acquisition after annealing at 673K for 39 days IRMbackfield_aq-E2-39-400deg-7day-26 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 0.000009984 0.1 35.8 -85.7 IRM backfield acquisition after annealing at 673K for 35.8 days IRMbackfield_aq-E2-39-400deg-7day-27 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.35 293 0.00001038 0.1 41.4 -85.3 IRM backfield acquisition after annealing at 673K for 41.4 days IRMbackfield_aq-E2-39-400deg-7day-28 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 0.00001055 0.2 42.9 -85.1 IRM backfield acquisition after annealing at 673K for 42.9 days IRMbackfield_aq-E2-39-400deg-7day-29 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.5 293 0.00001087 0.1 44.5 -85.5 IRM backfield acquisition after annealing at 673K for 44.5 days IRMbackfield_aq-E2-39-400deg-7day-30 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 0.000011079999999999999 0.1 47.9 -85 IRM backfield acquisition after annealing at 673K for 47.9 days IRMbackfield_aq-E2-39-400deg-7day-31 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 0.00001121 0.2 50.6 -85.4 IRM backfield acquisition after annealing at 673K for 50.6 days IRMbackfield_aq-E2-39-400deg-7day-32 IRMbackfield_aq-E2-39-400deg-7day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 0.00001129 0.1 48.6 -85.3 IRM backfield acquisition after annealing at 673K for 48.6 days IRMbackfield_aq-E2-39-400deg-14day-1 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 0 293 0.000004162 0.1 46 -84.2 IRM backfield acquisition after annealing at 673K for 46 days IRMbackfield_aq-E2-39-400deg-14day-2 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 0 293 0.000004161 0.1 46.7 -84.5 IRM backfield acquisition after annealing at 673K for 46.7 days IRMbackfield_aq-E2-39-400deg-14day-3 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 0.00001116 0.1 222.1 84.1 IRM backfield acquisition after annealing at 673K for 222.1 days IRMbackfield_aq-E2-39-400deg-14day-4 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.003 293 0.00001039 0.1 224 84.2 IRM backfield acquisition after annealing at 673K for 224 days IRMbackfield_aq-E2-39-400deg-14day-5 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.005 293 0.000009799 0.1 224.9 84.2 IRM backfield acquisition after annealing at 673K for 224.9 days IRMbackfield_aq-E2-39-400deg-14day-6 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0075 293 0.000009068 0.1 223.3 84 IRM backfield acquisition after annealing at 673K for 223.3 days IRMbackfield_aq-E2-39-400deg-14day-7 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 0.000008322 0.1 225.7 83.9 IRM backfield acquisition after annealing at 673K for 225.7 days IRMbackfield_aq-E2-39-400deg-14day-8 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0125 293 0.0000075969999999999994 0.1 223.8 83.7 IRM backfield acquisition after annealing at 673K for 223.8 days IRMbackfield_aq-E2-39-400deg-14day-9 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 0.000006919 0.1 227.8 83.8 IRM backfield acquisition after annealing at 673K for 227.8 days IRMbackfield_aq-E2-39-400deg-14day-10 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 0.00000562 0.1 229.7 83 IRM backfield acquisition after annealing at 673K for 229.7 days IRMbackfield_aq-E2-39-400deg-14day-11 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 0.000004333 0.1 229.1 82.6 IRM backfield acquisition after annealing at 673K for 229.1 days IRMbackfield_aq-E2-39-400deg-14day-12 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 0.000003217 0.2 237.3 81.5 IRM backfield acquisition after annealing at 673K for 237.3 days IRMbackfield_aq-E2-39-400deg-14day-13 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 0.0000032209999999999997 0.1 237.6 81.5 IRM backfield acquisition after annealing at 673K for 237.6 days IRMbackfield_aq-E2-39-400deg-14day-14 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 0.000003225 0.1 237 81.5 IRM backfield acquisition after annealing at 673K for 237 days IRMbackfield_aq-E2-39-400deg-14day-15 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 0.000003229 0.1 236.9 81.6 IRM backfield acquisition after annealing at 673K for 236.9 days IRMbackfield_aq-E2-39-400deg-14day-16 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.035 293 0.000002066 0.2 236.4 80.1 IRM backfield acquisition after annealing at 673K for 236.4 days IRMbackfield_aq-E2-39-400deg-14day-17 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 9.889e-7 0.2 248.7 72.3 IRM backfield acquisition after annealing at 673K for 248.7 days IRMbackfield_aq-E2-39-400deg-14day-18 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.045 293 1.736e-7 0.5 257.8 14.6 IRM backfield acquisition after annealing at 673K for 257.8 days IRMbackfield_aq-E2-39-400deg-14day-19 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 7.19e-7 0.2 283.8 -79.8 IRM backfield acquisition after annealing at 673K for 283.8 days IRMbackfield_aq-E2-39-400deg-14day-20 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.06 293 0.000001963 0.1 353.2 -88 IRM backfield acquisition after annealing at 673K for 353.2 days IRMbackfield_aq-E2-39-400deg-14day-21 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.07 293 0.000003027 0.1 32.7 -87.5 IRM backfield acquisition after annealing at 673K for 32.7 days IRMbackfield_aq-E2-39-400deg-14day-22 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 0.0000038769999999999995 0.1 26.3 -86.7 IRM backfield acquisition after annealing at 673K for 26.3 days IRMbackfield_aq-E2-39-400deg-14day-23 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.09 293 0.000004566 0.1 23.7 -86.6 IRM backfield acquisition after annealing at 673K for 23.7 days IRMbackfield_aq-E2-39-400deg-14day-24 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 0.0000052069999999999994 0.1 41.7 -86 IRM backfield acquisition after annealing at 673K for 41.7 days IRMbackfield_aq-E2-39-400deg-14day-25 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.125 293 0.00000638 0.1 38.8 -85.9 IRM backfield acquisition after annealing at 673K for 38.8 days IRMbackfield_aq-E2-39-400deg-14day-26 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 0.0000073920000000000005 0.1 48.6 -85.4 IRM backfield acquisition after annealing at 673K for 48.6 days IRMbackfield_aq-E2-39-400deg-14day-27 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.175 293 0.000008082 0.1 37.8 -85.7 IRM backfield acquisition after annealing at 673K for 37.8 days IRMbackfield_aq-E2-39-400deg-14day-28 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 0.000008718 0.1 44.2 -85.7 IRM backfield acquisition after annealing at 673K for 44.2 days IRMbackfield_aq-E2-39-400deg-14day-29 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.25 293 0.000009523 0.1 43.6 -85.8 IRM backfield acquisition after annealing at 673K for 43.6 days IRMbackfield_aq-E2-39-400deg-14day-30 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 0.00001008 0.1 46.9 -85.2 IRM backfield acquisition after annealing at 673K for 46.9 days IRMbackfield_aq-E2-39-400deg-14day-31 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.35 293 0.00001046 0.1 52.4 -84.9 IRM backfield acquisition after annealing at 673K for 52.4 days IRMbackfield_aq-E2-39-400deg-14day-32 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 0.00001069 0.1 48.1 -85.2 IRM backfield acquisition after annealing at 673K for 48.1 days IRMbackfield_aq-E2-39-400deg-14day-33 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.5 293 0.00001096 0.1 54.3 -84.5 IRM backfield acquisition after annealing at 673K for 54.3 days IRMbackfield_aq-E2-39-400deg-14day-34 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 0.00001111 0.1 43.1 -85.5 IRM backfield acquisition after annealing at 673K for 43.1 days IRMbackfield_aq-E2-39-400deg-14day-35 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 0.00001124 0.1 51.1 -85.5 IRM backfield acquisition after annealing at 673K for 51.1 days IRMbackfield_aq-E2-39-400deg-14day-36 IRMbackfield_aq-E2-39-400deg-14day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 0.00001133 0.1 52.4 -85.4 IRM backfield acquisition after annealing at 673K for 52.4 days IRMbackfield_aq-E2-39-400deg-30day-1 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 0 293 0.000006308 0.1 32.8 -85.8 IRM backfield acquisition after annealing at 673K for 32.8 days IRMbackfield_aq-E2-39-400deg-30day-2 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 1 293 0.000011180000000000001 0.2 228 84.8 IRM backfield acquisition after annealing at 673K for 228 days IRMbackfield_aq-E2-39-400deg-30day-3 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.003 293 0.00001043 0.1 225.9 84.5 IRM backfield acquisition after annealing at 673K for 225.9 days IRMbackfield_aq-E2-39-400deg-30day-4 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.005 293 0.000009821 0.1 225.5 84.4 IRM backfield acquisition after annealing at 673K for 225.5 days IRMbackfield_aq-E2-39-400deg-30day-5 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0075 293 0.000009055 0.1 227.1 84.4 IRM backfield acquisition after annealing at 673K for 227.1 days IRMbackfield_aq-E2-39-400deg-30day-6 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.01 293 0.000008286 0.1 226.9 84.3 IRM backfield acquisition after annealing at 673K for 226.9 days IRMbackfield_aq-E2-39-400deg-30day-7 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0125 293 0.0000075529999999999995 0.1 230.6 84.3 IRM backfield acquisition after annealing at 673K for 230.6 days IRMbackfield_aq-E2-39-400deg-30day-8 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.015 293 0.000006879 0.2 232.8 83.9 IRM backfield acquisition after annealing at 673K for 232.8 days IRMbackfield_aq-E2-39-400deg-30day-9 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.0175 293 0.000006184 0.2 228.1 83.9 IRM backfield acquisition after annealing at 673K for 228.1 days IRMbackfield_aq-E2-39-400deg-30day-10 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.02 293 0.0000055059999999999995 0.1 233.2 83.7 IRM backfield acquisition after annealing at 673K for 233.2 days IRMbackfield_aq-E2-39-400deg-30day-11 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.025 293 0.000004247 0.1 236.1 83 IRM backfield acquisition after annealing at 673K for 236.1 days IRMbackfield_aq-E2-39-400deg-30day-12 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.03 293 0.0000031029999999999998 0.1 241.5 82.3 IRM backfield acquisition after annealing at 673K for 241.5 days IRMbackfield_aq-E2-39-400deg-30day-13 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.035 293 0.0000019059999999999998 0.2 233.2 83.1 IRM backfield acquisition after annealing at 673K for 233.2 days IRMbackfield_aq-E2-39-400deg-30day-14 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.04 293 8.495e-7 0.2 253.4 76.7 IRM backfield acquisition after annealing at 673K for 253.4 days IRMbackfield_aq-E2-39-400deg-30day-15 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.045 293 1.217e-7 0.5 269.8 -29.6 IRM backfield acquisition after annealing at 673K for 269.8 days IRMbackfield_aq-E2-39-400deg-30day-16 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.05 293 8.210000000000001e-7 0.2 316 -84.2 IRM backfield acquisition after annealing at 673K for 316 days IRMbackfield_aq-E2-39-400deg-30day-17 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.055 293 0.000001534 0.2 7 -86.4 IRM backfield acquisition after annealing at 673K for 7 days IRMbackfield_aq-E2-39-400deg-30day-18 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.06 293 0.000002059 0.2 340.7 -87.1 IRM backfield acquisition after annealing at 673K for 340.7 days IRMbackfield_aq-E2-39-400deg-30day-19 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.07 293 0.000003006 0.1 24.5 -86.9 IRM backfield acquisition after annealing at 673K for 24.5 days IRMbackfield_aq-E2-39-400deg-30day-20 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.08 293 0.000003865 0.1 13.5 -86.8 IRM backfield acquisition after annealing at 673K for 13.5 days IRMbackfield_aq-E2-39-400deg-30day-21 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.09 293 0.00000458 0.1 3.2 -86.9 IRM backfield acquisition after annealing at 673K for 3.2 days IRMbackfield_aq-E2-39-400deg-30day-22 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.1 293 0.000005181 0.2 33.4 -86.5 IRM backfield acquisition after annealing at 673K for 33.4 days IRMbackfield_aq-E2-39-400deg-30day-23 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.125 293 0.000006361000000000001 0.2 40.3 -85.8 IRM backfield acquisition after annealing at 673K for 40.3 days IRMbackfield_aq-E2-39-400deg-30day-24 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.15 293 0.000007365 0.1 47.1 -85.7 IRM backfield acquisition after annealing at 673K for 47.1 days IRMbackfield_aq-E2-39-400deg-30day-25 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.175 293 0.000008135 0.1 47.5 -86 IRM backfield acquisition after annealing at 673K for 47.5 days IRMbackfield_aq-E2-39-400deg-30day-26 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.2 293 0.000008738 0.1 41.9 -85.6 IRM backfield acquisition after annealing at 673K for 41.9 days IRMbackfield_aq-E2-39-400deg-30day-27 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.25 293 0.000009571 0.1 45.2 -85.5 IRM backfield acquisition after annealing at 673K for 45.2 days IRMbackfield_aq-E2-39-400deg-30day-28 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.3 293 0.00001014 0.1 47.7 -85.4 IRM backfield acquisition after annealing at 673K for 47.7 days IRMbackfield_aq-E2-39-400deg-30day-29 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.35 293 0.00001054 0.1 47.6 -85.6 IRM backfield acquisition after annealing at 673K for 47.6 days IRMbackfield_aq-E2-39-400deg-30day-30 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.4 293 0.00001077 0.1 46.2 -85.4 IRM backfield acquisition after annealing at 673K for 46.2 days IRMbackfield_aq-E2-39-400deg-30day-31 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.5 293 0.00001106 0.2 51.3 -85.5 IRM backfield acquisition after annealing at 673K for 51.3 days IRMbackfield_aq-E2-39-400deg-30day-32 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.6 293 0.000011220000000000001 0.2 50.9 -85.5 IRM backfield acquisition after annealing at 673K for 50.9 days IRMbackfield_aq-E2-39-400deg-30day-33 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -0.8 293 0.00001136 0.1 51.9 -85.5 IRM backfield acquisition after annealing at 673K for 51.9 days IRMbackfield_aq-E2-39-400deg-30day-34 IRMbackfield_aq-E2-39-400deg-30day E2-39 g LP-IRM This study UWM-2G755:UWM-asc-pulse 673 -1 293 0.000011390000000000001 0.1 50.8 -85.6 IRM backfield acquisition after annealing at 673K for 50.8 days IRMbackfield_aq-E2-42-300deg-0day-1 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.000009379 0.1 160.6 82.8 IRM backfield acquisition after annealing at 573K for 160.6 days IRMbackfield_aq-E2-42-300deg-0day-2 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.003 293 0.000008764 0.1 154.6 82.7 IRM backfield acquisition after annealing at 573K for 154.6 days IRMbackfield_aq-E2-42-300deg-0day-3 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.005 293 0.000008278000000000001 0.1 156.7 82.6 IRM backfield acquisition after annealing at 573K for 156.7 days IRMbackfield_aq-E2-42-300deg-0day-4 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0075 293 0.000007665 0.1 157.2 82.6 IRM backfield acquisition after annealing at 573K for 157.2 days IRMbackfield_aq-E2-42-300deg-0day-5 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.000007045 0.1 157.8 82.4 IRM backfield acquisition after annealing at 573K for 157.8 days IRMbackfield_aq-E2-42-300deg-0day-6 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0125 293 0.000006449 0.1 158.7 82.2 IRM backfield acquisition after annealing at 573K for 158.7 days IRMbackfield_aq-E2-42-300deg-0day-7 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.0000059040000000000006 0.1 160.9 82.1 IRM backfield acquisition after annealing at 573K for 160.9 days IRMbackfield_aq-E2-42-300deg-0day-8 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.000004856 0.1 157 82 IRM backfield acquisition after annealing at 573K for 157 days IRMbackfield_aq-E2-42-300deg-0day-9 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.000003839 0.1 155.9 81.2 IRM backfield acquisition after annealing at 573K for 155.9 days IRMbackfield_aq-E2-42-300deg-0day-10 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 0.00000294 0.1 165 81.1 IRM backfield acquisition after annealing at 573K for 165 days IRMbackfield_aq-E2-42-300deg-0day-11 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.035 293 0.0000020270000000000002 0.1 154.6 79.4 IRM backfield acquisition after annealing at 573K for 154.6 days IRMbackfield_aq-E2-42-300deg-0day-12 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 0.0000011490000000000001 0.2 162.9 78.1 IRM backfield acquisition after annealing at 573K for 162.9 days IRMbackfield_aq-E2-42-300deg-0day-13 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.045 293 4.567e-7 0.2 168.5 71.4 IRM backfield acquisition after annealing at 573K for 168.5 days IRMbackfield_aq-E2-42-300deg-0day-14 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 1.334e-7 0.5 180.9 -31.6 IRM backfield acquisition after annealing at 573K for 180.9 days IRMbackfield_aq-E2-42-300deg-0day-15 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.06 293 0.000001074 0.1 108.7 -88.4 IRM backfield acquisition after annealing at 573K for 108.7 days IRMbackfield_aq-E2-42-300deg-0day-16 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.07 293 0.00000193 0.1 343.2 -87.1 IRM backfield acquisition after annealing at 573K for 343.2 days IRMbackfield_aq-E2-42-300deg-0day-17 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.000002739 0.1 334.1 -85.3 IRM backfield acquisition after annealing at 573K for 334.1 days IRMbackfield_aq-E2-42-300deg-0day-18 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.09 293 0.000003342 0.2 349.4 -84.9 IRM backfield acquisition after annealing at 573K for 349.4 days IRMbackfield_aq-E2-42-300deg-0day-19 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 0.000003910000000000001 0.1 334.3 -84.4 IRM backfield acquisition after annealing at 573K for 334.3 days IRMbackfield_aq-E2-42-300deg-0day-20 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.125 293 0.000004943 0.1 337.8 -84.2 IRM backfield acquisition after annealing at 573K for 337.8 days IRMbackfield_aq-E2-42-300deg-0day-21 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 0.000005784 0.1 340.4 -84.1 IRM backfield acquisition after annealing at 573K for 340.4 days IRMbackfield_aq-E2-42-300deg-0day-22 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.175 293 0.0000064660000000000004 0.1 349.1 -84.3 IRM backfield acquisition after annealing at 573K for 349.1 days IRMbackfield_aq-E2-42-300deg-0day-23 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 0.000007036 0.1 333.6 -83.6 IRM backfield acquisition after annealing at 573K for 333.6 days IRMbackfield_aq-E2-42-300deg-0day-24 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.25 293 0.000007781 0.1 335.6 -83.8 IRM backfield acquisition after annealing at 573K for 335.6 days IRMbackfield_aq-E2-42-300deg-0day-25 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.000008311 0.1 335.2 -83.6 IRM backfield acquisition after annealing at 573K for 335.2 days IRMbackfield_aq-E2-42-300deg-0day-26 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.35 293 0.000008656 0.1 328.8 -83.3 IRM backfield acquisition after annealing at 573K for 328.8 days IRMbackfield_aq-E2-42-300deg-0day-27 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.00000891 0.1 336.3 -83.7 IRM backfield acquisition after annealing at 573K for 336.3 days IRMbackfield_aq-E2-42-300deg-0day-28 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.5 293 0.000009188 0.1 333.2 -83.4 IRM backfield acquisition after annealing at 573K for 333.2 days IRMbackfield_aq-E2-42-300deg-0day-29 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.000009383000000000001 0.1 321.3 -82.4 IRM backfield acquisition after annealing at 573K for 321.3 days IRMbackfield_aq-E2-42-300deg-0day-30 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.000009506 0.1 330.7 -83.4 IRM backfield acquisition after annealing at 573K for 330.7 days IRMbackfield_aq-E2-42-300deg-0day-31 IRMbackfield_aq-E2-42-300deg-0day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.000009551 0.1 330.5 -83.5 IRM backfield acquisition after annealing at 573K for 330.5 days IRMbackfield_aq-E2-42-300deg-7day-1 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 0 293 0.000005171 0.1 334.6 -82.5 IRM backfield acquisition after annealing at 573K for 334.6 days IRMbackfield_aq-E2-42-300deg-7day-2 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.000009266 0.1 159.5 82.5 IRM backfield acquisition after annealing at 573K for 159.5 days IRMbackfield_aq-E2-42-300deg-7day-3 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.003 293 0.000008642 0.1 153.1 82.4 IRM backfield acquisition after annealing at 573K for 153.1 days IRMbackfield_aq-E2-42-300deg-7day-4 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.005 293 0.000008149 0.1 157.1 82.2 IRM backfield acquisition after annealing at 573K for 157.1 days IRMbackfield_aq-E2-42-300deg-7day-5 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0075 293 0.000007533 0.1 152.9 82.3 IRM backfield acquisition after annealing at 573K for 152.9 days IRMbackfield_aq-E2-42-300deg-7day-6 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.000006925 0.1 156.3 82.2 IRM backfield acquisition after annealing at 573K for 156.3 days IRMbackfield_aq-E2-42-300deg-7day-7 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0125 293 0.0000063200000000000005 0.1 148.3 81.8 IRM backfield acquisition after annealing at 573K for 148.3 days IRMbackfield_aq-E2-42-300deg-7day-8 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.000005777 0.1 154.1 81.9 IRM backfield acquisition after annealing at 573K for 154.1 days IRMbackfield_aq-E2-42-300deg-7day-9 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.000004691 0.1 155.3 81.7 IRM backfield acquisition after annealing at 573K for 155.3 days IRMbackfield_aq-E2-42-300deg-7day-10 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.000003652 0.1 158.3 81.1 IRM backfield acquisition after annealing at 573K for 158.3 days IRMbackfield_aq-E2-42-300deg-7day-11 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 0.000002713 0.1 157.8 80.9 IRM backfield acquisition after annealing at 573K for 157.8 days IRMbackfield_aq-E2-42-300deg-7day-12 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.035 293 0.0000017750000000000002 0.1 159.8 79.8 IRM backfield acquisition after annealing at 573K for 159.8 days IRMbackfield_aq-E2-42-300deg-7day-13 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 8.7e-7 0.1 136.9 73.9 IRM backfield acquisition after annealing at 573K for 136.9 days IRMbackfield_aq-E2-42-300deg-7day-14 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.045 293 1.961e-7 0.3 130.5 48.6 IRM backfield acquisition after annealing at 573K for 130.5 days IRMbackfield_aq-E2-42-300deg-7day-15 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 4.963e-7 0.2 100 -82.9 IRM backfield acquisition after annealing at 573K for 100 days IRMbackfield_aq-E2-42-300deg-7day-16 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.06 293 0.000001439 0.1 357.4 -87.2 IRM backfield acquisition after annealing at 573K for 357.4 days IRMbackfield_aq-E2-42-300deg-7day-17 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.07 293 0.000002301 0.2 344.9 -85.6 IRM backfield acquisition after annealing at 573K for 344.9 days IRMbackfield_aq-E2-42-300deg-7day-18 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.000003063 0.1 328.8 -84.5 IRM backfield acquisition after annealing at 573K for 328.8 days IRMbackfield_aq-E2-42-300deg-7day-19 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.09 293 0.000003669 0.1 337.4 -84.3 IRM backfield acquisition after annealing at 573K for 337.4 days IRMbackfield_aq-E2-42-300deg-7day-20 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 0.000004194 0.1 344.3 -84.1 IRM backfield acquisition after annealing at 573K for 344.3 days IRMbackfield_aq-E2-42-300deg-7day-21 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.125 293 0.000005257000000000001 0.1 328.5 -83.3 IRM backfield acquisition after annealing at 573K for 328.5 days IRMbackfield_aq-E2-42-300deg-7day-22 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 0.000006052 0.1 354.8 -83.9 IRM backfield acquisition after annealing at 573K for 354.8 days IRMbackfield_aq-E2-42-300deg-7day-23 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.175 293 0.0000067 0.1 332.9 -83.2 IRM backfield acquisition after annealing at 573K for 332.9 days IRMbackfield_aq-E2-42-300deg-7day-24 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 0.000007205 0.1 348.7 -83.7 IRM backfield acquisition after annealing at 573K for 348.7 days IRMbackfield_aq-E2-42-300deg-7day-25 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.25 293 0.000007898000000000001 0.1 340.8 -83.6 IRM backfield acquisition after annealing at 573K for 340.8 days IRMbackfield_aq-E2-42-300deg-7day-26 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.000008385 0.1 335.8 -83.3 IRM backfield acquisition after annealing at 573K for 335.8 days IRMbackfield_aq-E2-42-300deg-7day-27 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.35 293 0.000008704999999999999 0.1 342.1 -83.3 IRM backfield acquisition after annealing at 573K for 342.1 days IRMbackfield_aq-E2-42-300deg-7day-28 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.000008902 0.1 336.4 -83.2 IRM backfield acquisition after annealing at 573K for 336.4 days IRMbackfield_aq-E2-42-300deg-7day-29 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.5 293 0.000009135000000000001 0.1 344.9 -83.4 IRM backfield acquisition after annealing at 573K for 344.9 days IRMbackfield_aq-E2-42-300deg-7day-30 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.000009292 0.1 334.7 -83.2 IRM backfield acquisition after annealing at 573K for 334.7 days IRMbackfield_aq-E2-42-300deg-7day-31 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.000009417 0.1 332.4 -83.1 IRM backfield acquisition after annealing at 573K for 332.4 days IRMbackfield_aq-E2-42-300deg-7day-32 IRMbackfield_aq-E2-42-300deg-7day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.000009473 0.2 334 -83.5 IRM backfield acquisition after annealing at 573K for 334 days IRMbackfield_aq-E2-42-300deg-14day-1 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 0 293 0.000005369 0.1 340.1 -83 IRM backfield acquisition after annealing at 573K for 340.1 days IRMbackfield_aq-E2-42-300deg-14day-2 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.000009239 0.1 160.2 82.1 IRM backfield acquisition after annealing at 573K for 160.2 days IRMbackfield_aq-E2-42-300deg-14day-3 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.003 293 0.000008615 0.1 161.2 82 IRM backfield acquisition after annealing at 573K for 161.2 days IRMbackfield_aq-E2-42-300deg-14day-4 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.005 293 0.000008136 0.1 161.4 81.9 IRM backfield acquisition after annealing at 573K for 161.4 days IRMbackfield_aq-E2-42-300deg-14day-5 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0075 293 0.000007508 0.1 161.3 82.2 IRM backfield acquisition after annealing at 573K for 161.3 days IRMbackfield_aq-E2-42-300deg-14day-6 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.000006878 0.1 163.7 81.8 IRM backfield acquisition after annealing at 573K for 163.7 days IRMbackfield_aq-E2-42-300deg-14day-7 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0125 293 0.000006287 0.1 157.2 81.4 IRM backfield acquisition after annealing at 573K for 157.2 days IRMbackfield_aq-E2-42-300deg-14day-8 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.0000057390000000000004 0.1 159.8 81.7 IRM backfield acquisition after annealing at 573K for 159.8 days IRMbackfield_aq-E2-42-300deg-14day-9 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.000004652 0.1 162.5 81.4 IRM backfield acquisition after annealing at 573K for 162.5 days IRMbackfield_aq-E2-42-300deg-14day-10 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.0000036120000000000003 0.1 158.1 81 IRM backfield acquisition after annealing at 573K for 158.1 days IRMbackfield_aq-E2-42-300deg-14day-11 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 0.000002696 0.1 165.3 80.5 IRM backfield acquisition after annealing at 573K for 165.3 days IRMbackfield_aq-E2-42-300deg-14day-12 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.035 293 0.00000175 0.1 170.1 79.6 IRM backfield acquisition after annealing at 573K for 170.1 days IRMbackfield_aq-E2-42-300deg-14day-13 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 8.625e-7 0.2 181.7 77.2 IRM backfield acquisition after annealing at 573K for 181.7 days IRMbackfield_aq-E2-42-300deg-14day-14 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.045 293 1.616e-7 0.3 213.3 50.4 IRM backfield acquisition after annealing at 573K for 213.3 days IRMbackfield_aq-E2-42-300deg-14day-15 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 5.494e-7 0.2 96.3 -70 IRM backfield acquisition after annealing at 573K for 96.3 days IRMbackfield_aq-E2-42-300deg-14day-16 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.06 293 0.000001458 0.1 51 -85.3 IRM backfield acquisition after annealing at 573K for 51 days IRMbackfield_aq-E2-42-300deg-14day-17 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.07 293 0.000002346 0.1 345.9 -85.4 IRM backfield acquisition after annealing at 573K for 345.9 days IRMbackfield_aq-E2-42-300deg-14day-18 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.0000030739999999999997 0.1 333.9 -84.5 IRM backfield acquisition after annealing at 573K for 333.9 days IRMbackfield_aq-E2-42-300deg-14day-19 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.09 293 0.0000036939999999999997 0.1 330.8 -83.3 IRM backfield acquisition after annealing at 573K for 330.8 days IRMbackfield_aq-E2-42-300deg-14day-20 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 0.000004192000000000001 0.1 324.8 -83.1 IRM backfield acquisition after annealing at 573K for 324.8 days IRMbackfield_aq-E2-42-300deg-14day-21 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.125 293 0.000005202 0.1 334.9 -83.2 IRM backfield acquisition after annealing at 573K for 334.9 days IRMbackfield_aq-E2-42-300deg-14day-22 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 0.000006007 0.1 353.5 -83.7 IRM backfield acquisition after annealing at 573K for 353.5 days IRMbackfield_aq-E2-42-300deg-14day-23 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.175 293 0.000006625 0.1 331.2 -83.2 IRM backfield acquisition after annealing at 573K for 331.2 days IRMbackfield_aq-E2-42-300deg-14day-24 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 0.00000716 0.1 332.3 -82.9 IRM backfield acquisition after annealing at 573K for 332.3 days IRMbackfield_aq-E2-42-300deg-14day-25 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.25 293 0.000007852 0.1 342.5 -83.4 IRM backfield acquisition after annealing at 573K for 342.5 days IRMbackfield_aq-E2-42-300deg-14day-26 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.000008336 0.1 338.4 -83 IRM backfield acquisition after annealing at 573K for 338.4 days IRMbackfield_aq-E2-42-300deg-14day-27 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.35 293 0.00000868 0.1 335.1 -82.8 IRM backfield acquisition after annealing at 573K for 335.1 days IRMbackfield_aq-E2-42-300deg-14day-28 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.000008897 0.1 336.1 -82.9 IRM backfield acquisition after annealing at 573K for 336.1 days IRMbackfield_aq-E2-42-300deg-14day-29 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.5 293 0.000009133 0.1 336.2 -83 IRM backfield acquisition after annealing at 573K for 336.2 days IRMbackfield_aq-E2-42-300deg-14day-30 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.000009268 0.1 335.2 -82.9 IRM backfield acquisition after annealing at 573K for 335.2 days IRMbackfield_aq-E2-42-300deg-14day-31 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.000009377999999999999 0.1 336.5 -83.1 IRM backfield acquisition after annealing at 573K for 336.5 days IRMbackfield_aq-E2-42-300deg-14day-32 IRMbackfield_aq-E2-42-300deg-14day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.000009451 0.1 333.5 -83.2 IRM backfield acquisition after annealing at 573K for 333.5 days IRMbackfield_aq-E2-42-300deg-30day-1 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 0 293 0.0000053740000000000006 0.1 335.1 -82.7 IRM backfield acquisition after annealing at 573K for 335.1 days IRMbackfield_aq-E2-42-300deg-30day-2 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 1 293 0.000009204 0.1 151 81.7 IRM backfield acquisition after annealing at 573K for 151 days IRMbackfield_aq-E2-42-300deg-30day-3 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.003 293 0.000008588999999999999 0.1 150 81.5 IRM backfield acquisition after annealing at 573K for 150 days IRMbackfield_aq-E2-42-300deg-30day-4 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.005 293 0.000008097 0.1 142.6 81.4 IRM backfield acquisition after annealing at 573K for 142.6 days IRMbackfield_aq-E2-42-300deg-30day-5 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0075 293 0.0000074650000000000005 0.1 146.1 81.2 IRM backfield acquisition after annealing at 573K for 146.1 days IRMbackfield_aq-E2-42-300deg-30day-6 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.01 293 0.000006843 0.1 147 81.1 IRM backfield acquisition after annealing at 573K for 147 days IRMbackfield_aq-E2-42-300deg-30day-7 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.0125 293 0.000006254 0.1 141.8 80.8 IRM backfield acquisition after annealing at 573K for 141.8 days IRMbackfield_aq-E2-42-300deg-30day-8 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.015 293 0.000005702 0.1 144.3 80.5 IRM backfield acquisition after annealing at 573K for 144.3 days IRMbackfield_aq-E2-42-300deg-30day-9 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.02 293 0.0000045890000000000004 0.1 145.1 80.1 IRM backfield acquisition after annealing at 573K for 145.1 days IRMbackfield_aq-E2-42-300deg-30day-10 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.025 293 0.000003588 0.1 142 79.3 IRM backfield acquisition after annealing at 573K for 142 days IRMbackfield_aq-E2-42-300deg-30day-11 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.03 293 0.000002676 0.1 143.5 78.5 IRM backfield acquisition after annealing at 573K for 143.5 days IRMbackfield_aq-E2-42-300deg-30day-12 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.035 293 0.000001739 0.2 133.2 75.9 IRM backfield acquisition after annealing at 573K for 133.2 days IRMbackfield_aq-E2-42-300deg-30day-13 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.04 293 8.624e-7 0.1 127.9 70.4 IRM backfield acquisition after annealing at 573K for 127.9 days IRMbackfield_aq-E2-42-300deg-30day-14 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.045 293 2.052e-7 0.3 117 26.7 IRM backfield acquisition after annealing at 573K for 117 days IRMbackfield_aq-E2-42-300deg-30day-15 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.05 293 5.157e-7 0.2 137.6 -85.9 IRM backfield acquisition after annealing at 573K for 137.6 days IRMbackfield_aq-E2-42-300deg-30day-16 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.055 293 0.0000010889999999999999 0.1 41.2 -85.3 IRM backfield acquisition after annealing at 573K for 41.2 days IRMbackfield_aq-E2-42-300deg-30day-17 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.06 293 0.000001636 0.2 44.8 -84.9 IRM backfield acquisition after annealing at 573K for 44.8 days IRMbackfield_aq-E2-42-300deg-30day-18 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.07 293 0.000002334 0.1 44.2 -83.6 IRM backfield acquisition after annealing at 573K for 44.2 days IRMbackfield_aq-E2-42-300deg-30day-19 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.08 293 0.000003025 0.1 0.9 -84.6 IRM backfield acquisition after annealing at 573K for 0.9 days IRMbackfield_aq-E2-42-300deg-30day-20 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.09 293 0.000003666 0.1 342.3 -84.1 IRM backfield acquisition after annealing at 573K for 342.3 days IRMbackfield_aq-E2-42-300deg-30day-21 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.1 293 0.000004194 0.1 344.8 -83.9 IRM backfield acquisition after annealing at 573K for 344.8 days IRMbackfield_aq-E2-42-300deg-30day-22 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.125 293 0.000005187 0.1 345.3 -83.7 IRM backfield acquisition after annealing at 573K for 345.3 days IRMbackfield_aq-E2-42-300deg-30day-23 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.15 293 0.000005963 0.1 344.6 -83.5 IRM backfield acquisition after annealing at 573K for 344.6 days IRMbackfield_aq-E2-42-300deg-30day-24 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.175 293 0.0000066119999999999995 0.1 335.6 -83.2 IRM backfield acquisition after annealing at 573K for 335.6 days IRMbackfield_aq-E2-42-300deg-30day-25 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.2 293 0.000007102 0.2 337.7 -83 IRM backfield acquisition after annealing at 573K for 337.7 days IRMbackfield_aq-E2-42-300deg-30day-26 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.25 293 0.000007797 0.1 344.8 -83.4 IRM backfield acquisition after annealing at 573K for 344.8 days IRMbackfield_aq-E2-42-300deg-30day-27 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.3 293 0.00000829 0.1 343.7 -83.2 IRM backfield acquisition after annealing at 573K for 343.7 days IRMbackfield_aq-E2-42-300deg-30day-28 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.35 293 0.000008616999999999999 0.2 340.5 -83 IRM backfield acquisition after annealing at 573K for 340.5 days IRMbackfield_aq-E2-42-300deg-30day-29 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.4 293 0.000008847 0.1 335 -82.9 IRM backfield acquisition after annealing at 573K for 335 days IRMbackfield_aq-E2-42-300deg-30day-30 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.5 293 0.000009084999999999999 0.1 336.4 -83.1 IRM backfield acquisition after annealing at 573K for 336.4 days IRMbackfield_aq-E2-42-300deg-30day-31 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.6 293 0.000009229 0.1 340.8 -83.4 IRM backfield acquisition after annealing at 573K for 340.8 days IRMbackfield_aq-E2-42-300deg-30day-32 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -0.8 293 0.000009327 0.1 339.1 -83.2 IRM backfield acquisition after annealing at 573K for 339.1 days IRMbackfield_aq-E2-42-300deg-30day-33 IRMbackfield_aq-E2-42-300deg-30day E2-42 g LP-IRM This study UWM-2G755:UWM-asc-pulse 573 -1 293 0.000009366 0.1 338.4 -83.6 IRM backfield acquisition after annealing at 573K for 338.4 days IRMbackfield_aq-E2-43-200deg-0day-1 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 0.000007481 0.2 279 83.6 IRM backfield acquisition after annealing at 473K for 279 days IRMbackfield_aq-E2-43-200deg-0day-2 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.003 293 0.000007007 0.1 277.2 83.4 IRM backfield acquisition after annealing at 473K for 277.2 days IRMbackfield_aq-E2-43-200deg-0day-3 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.005 293 0.000006625 0.1 278.6 83.3 IRM backfield acquisition after annealing at 473K for 278.6 days IRMbackfield_aq-E2-43-200deg-0day-4 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0075 293 0.000006154 0.2 276.7 83.1 IRM backfield acquisition after annealing at 473K for 276.7 days IRMbackfield_aq-E2-43-200deg-0day-5 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 0.000005702 0.1 277.9 82.7 IRM backfield acquisition after annealing at 473K for 277.9 days IRMbackfield_aq-E2-43-200deg-0day-6 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0125 293 0.000005249 0.2 278.6 82.4 IRM backfield acquisition after annealing at 473K for 278.6 days IRMbackfield_aq-E2-43-200deg-0day-7 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 0.000004839000000000001 0.2 278 82.1 IRM backfield acquisition after annealing at 473K for 278 days IRMbackfield_aq-E2-43-200deg-0day-8 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 0.000004015999999999999 0.1 279.1 81.6 IRM backfield acquisition after annealing at 473K for 279.1 days IRMbackfield_aq-E2-43-200deg-0day-9 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 0.00000327 0.1 282.8 80.3 IRM backfield acquisition after annealing at 473K for 282.8 days IRMbackfield_aq-E2-43-200deg-0day-10 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 0.000002589 0.1 279.2 78.9 IRM backfield acquisition after annealing at 473K for 279.2 days IRMbackfield_aq-E2-43-200deg-0day-11 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.035 293 0.000001869 0.2 278.1 77.3 IRM backfield acquisition after annealing at 473K for 278.1 days IRMbackfield_aq-E2-43-200deg-0day-12 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 0.000001178 0.2 281.4 73.5 IRM backfield acquisition after annealing at 473K for 281.4 days IRMbackfield_aq-E2-43-200deg-0day-13 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.045 293 7.094e-7 0.2 280.3 57.5 IRM backfield acquisition after annealing at 473K for 280.3 days IRMbackfield_aq-E2-43-200deg-0day-14 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 3.031e-7 0.2 270.4 33 IRM backfield acquisition after annealing at 473K for 270.4 days IRMbackfield_aq-E2-43-200deg-0day-15 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.06 293 7.003e-7 0.1 260.7 -77.2 IRM backfield acquisition after annealing at 473K for 260.7 days IRMbackfield_aq-E2-43-200deg-0day-16 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.07 293 0.000001327 0.1 243.7 -84.8 IRM backfield acquisition after annealing at 473K for 243.7 days IRMbackfield_aq-E2-43-200deg-0day-17 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 0.000001937 0.1 194.1 -87.7 IRM backfield acquisition after annealing at 473K for 194.1 days IRMbackfield_aq-E2-43-200deg-0day-18 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.09 293 0.000002477 0.1 163.2 -87.8 IRM backfield acquisition after annealing at 473K for 163.2 days IRMbackfield_aq-E2-43-200deg-0day-19 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 0.000002918 0.2 119.9 -86.5 IRM backfield acquisition after annealing at 473K for 119.9 days IRMbackfield_aq-E2-43-200deg-0day-20 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.125 293 0.000003768 0.1 123.2 -86.3 IRM backfield acquisition after annealing at 473K for 123.2 days IRMbackfield_aq-E2-43-200deg-0day-21 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 0.000004481 0.1 126.2 -86.5 IRM backfield acquisition after annealing at 473K for 126.2 days IRMbackfield_aq-E2-43-200deg-0day-22 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.175 293 0.000005029 0.1 114.1 -85.4 IRM backfield acquisition after annealing at 473K for 114.1 days IRMbackfield_aq-E2-43-200deg-0day-23 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 0.000005478 0.1 113.8 -85.4 IRM backfield acquisition after annealing at 473K for 113.8 days IRMbackfield_aq-E2-43-200deg-0day-24 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.25 293 0.000006104 0.1 119.9 -85.3 IRM backfield acquisition after annealing at 473K for 119.9 days IRMbackfield_aq-E2-43-200deg-0day-25 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 0.000006549 0.1 110.6 -84.9 IRM backfield acquisition after annealing at 473K for 110.6 days IRMbackfield_aq-E2-43-200deg-0day-26 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.35 293 0.000006861 0.1 118.4 -84.8 IRM backfield acquisition after annealing at 473K for 118.4 days IRMbackfield_aq-E2-43-200deg-0day-27 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 0.000007075 0.1 115.9 -84.5 IRM backfield acquisition after annealing at 473K for 115.9 days IRMbackfield_aq-E2-43-200deg-0day-28 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.5 293 0.00000732 0.1 114.2 -83.9 IRM backfield acquisition after annealing at 473K for 114.2 days IRMbackfield_aq-E2-43-200deg-0day-29 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 0.00000746 0.1 104.9 -83.8 IRM backfield acquisition after annealing at 473K for 104.9 days IRMbackfield_aq-E2-43-200deg-0day-30 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 0.000007567 0.1 116 -83.9 IRM backfield acquisition after annealing at 473K for 116 days IRMbackfield_aq-E2-43-200deg-0day-31 IRMbackfield_aq-E2-43-200deg-0day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 0.000007622 0.2 115.2 -84.5 IRM backfield acquisition after annealing at 473K for 115.2 days IRMbackfield_aq-E2-43-200deg-7day-1 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 0 293 0.000005288 0.1 111.6 -84.1 IRM backfield acquisition after annealing at 473K for 111.6 days IRMbackfield_aq-E2-43-200deg-7day-2 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 0.000007460999999999999 0.1 272 83.2 IRM backfield acquisition after annealing at 473K for 272 days IRMbackfield_aq-E2-43-200deg-7day-3 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.003 293 0.000006951 0.1 271 82.9 IRM backfield acquisition after annealing at 473K for 271 days IRMbackfield_aq-E2-43-200deg-7day-4 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.005 293 0.000006743 0.1 273.3 82.9 IRM backfield acquisition after annealing at 473K for 273.3 days IRMbackfield_aq-E2-43-200deg-7day-5 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0075 293 0.000006086000000000001 0.1 276.4 82.5 IRM backfield acquisition after annealing at 473K for 276.4 days IRMbackfield_aq-E2-43-200deg-7day-6 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 0.000005601 0.1 274.5 82.3 IRM backfield acquisition after annealing at 473K for 274.5 days IRMbackfield_aq-E2-43-200deg-7day-7 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0125 293 0.000005155 0.1 274.4 82 IRM backfield acquisition after annealing at 473K for 274.4 days IRMbackfield_aq-E2-43-200deg-7day-8 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 0.000004728 0.2 276.1 81.6 IRM backfield acquisition after annealing at 473K for 276.1 days IRMbackfield_aq-E2-43-200deg-7day-9 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 0.000003901 0.1 279.5 81 IRM backfield acquisition after annealing at 473K for 279.5 days IRMbackfield_aq-E2-43-200deg-7day-10 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 0.0000031150000000000002 0.1 275.8 79.3 IRM backfield acquisition after annealing at 473K for 275.8 days IRMbackfield_aq-E2-43-200deg-7day-11 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 0.000002384 0.2 278.1 78.8 IRM backfield acquisition after annealing at 473K for 278.1 days IRMbackfield_aq-E2-43-200deg-7day-12 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.035 293 0.000001683 0.1 274.2 74.7 IRM backfield acquisition after annealing at 473K for 274.2 days IRMbackfield_aq-E2-43-200deg-7day-13 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 9.16e-7 0.2 280 77.7 IRM backfield acquisition after annealing at 473K for 280 days IRMbackfield_aq-E2-43-200deg-7day-14 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.045 293 4.439e-7 0.2 277.8 54.9 IRM backfield acquisition after annealing at 473K for 277.8 days IRMbackfield_aq-E2-43-200deg-7day-15 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 2.304e-7 0.2 284.1 -37.3 IRM backfield acquisition after annealing at 473K for 284.1 days IRMbackfield_aq-E2-43-200deg-7day-16 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.06 293 9.45e-7 0.1 255 -84.6 IRM backfield acquisition after annealing at 473K for 255 days IRMbackfield_aq-E2-43-200deg-7day-17 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.07 293 0.0000015989999999999999 0.1 144.3 -88.2 IRM backfield acquisition after annealing at 473K for 144.3 days IRMbackfield_aq-E2-43-200deg-7day-18 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 0.0000022009999999999998 0.1 132.2 -87.6 IRM backfield acquisition after annealing at 473K for 132.2 days IRMbackfield_aq-E2-43-200deg-7day-19 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.09 293 0.000002689 0.1 124.6 -88 IRM backfield acquisition after annealing at 473K for 124.6 days IRMbackfield_aq-E2-43-200deg-7day-20 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 0.000003126 0.1 119.4 -86.8 IRM backfield acquisition after annealing at 473K for 119.4 days IRMbackfield_aq-E2-43-200deg-7day-21 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.125 293 0.000003999 0.1 100.6 -83.7 IRM backfield acquisition after annealing at 473K for 100.6 days IRMbackfield_aq-E2-43-200deg-7day-22 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 0.000004668 0.1 101.8 -85.1 IRM backfield acquisition after annealing at 473K for 101.8 days IRMbackfield_aq-E2-43-200deg-7day-23 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.175 293 0.000005186 0.1 108.1 -85.7 IRM backfield acquisition after annealing at 473K for 108.1 days IRMbackfield_aq-E2-43-200deg-7day-24 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 0.000005605 0.2 111.8 -85.6 IRM backfield acquisition after annealing at 473K for 111.8 days IRMbackfield_aq-E2-43-200deg-7day-25 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.25 293 0.000006207 0.1 105.6 -85.3 IRM backfield acquisition after annealing at 473K for 105.6 days IRMbackfield_aq-E2-43-200deg-7day-26 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 0.000006613 0.2 109.3 -85.3 IRM backfield acquisition after annealing at 473K for 109.3 days IRMbackfield_aq-E2-43-200deg-7day-27 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.35 293 0.0000068989999999999995 0.1 107.3 -85 IRM backfield acquisition after annealing at 473K for 107.3 days IRMbackfield_aq-E2-43-200deg-7day-28 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 0.0000070930000000000005 0.1 114 -84.9 IRM backfield acquisition after annealing at 473K for 114 days IRMbackfield_aq-E2-43-200deg-7day-29 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.5 293 0.000007299 0.2 106.5 -84.7 IRM backfield acquisition after annealing at 473K for 106.5 days IRMbackfield_aq-E2-43-200deg-7day-30 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 0.000007414 0.1 110.7 -84.5 IRM backfield acquisition after annealing at 473K for 110.7 days IRMbackfield_aq-E2-43-200deg-7day-31 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 0.000007528 0.2 106.2 -84.5 IRM backfield acquisition after annealing at 473K for 106.2 days IRMbackfield_aq-E2-43-200deg-7day-32 IRMbackfield_aq-E2-43-200deg-7day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 0.000007564000000000001 0.1 114.6 -84.1 IRM backfield acquisition after annealing at 473K for 114.6 days IRMbackfield_aq-E2-43-200deg-14day-1 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 0 293 0.000004965 0.1 111.9 -84.1 IRM backfield acquisition after annealing at 473K for 111.9 days IRMbackfield_aq-E2-43-200deg-14day-2 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 0.000007436 0.1 282 83 IRM backfield acquisition after annealing at 473K for 282 days IRMbackfield_aq-E2-43-200deg-14day-3 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.003 293 0.0000069379999999999995 0.1 272.9 82.8 IRM backfield acquisition after annealing at 473K for 272.9 days IRMbackfield_aq-E2-43-200deg-14day-4 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.005 293 0.000006561 0.1 275.2 82.6 IRM backfield acquisition after annealing at 473K for 275.2 days IRMbackfield_aq-E2-43-200deg-14day-5 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0075 293 0.000006067999999999999 0.1 274 82.4 IRM backfield acquisition after annealing at 473K for 274 days IRMbackfield_aq-E2-43-200deg-14day-6 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 0.000005590000000000001 0.1 272.1 82.1 IRM backfield acquisition after annealing at 473K for 272.1 days IRMbackfield_aq-E2-43-200deg-14day-7 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0125 293 0.000005133000000000001 0.2 275.9 81.9 IRM backfield acquisition after annealing at 473K for 275.9 days IRMbackfield_aq-E2-43-200deg-14day-8 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 0.000004706 0.1 276.3 81.2 IRM backfield acquisition after annealing at 473K for 276.3 days IRMbackfield_aq-E2-43-200deg-14day-9 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 0.000003859 0.1 277.6 81 IRM backfield acquisition after annealing at 473K for 277.6 days IRMbackfield_aq-E2-43-200deg-14day-10 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 0.000003089 0.2 277.8 79.3 IRM backfield acquisition after annealing at 473K for 277.8 days IRMbackfield_aq-E2-43-200deg-14day-11 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 0.000002389 0.1 276.5 77.3 IRM backfield acquisition after annealing at 473K for 276.5 days IRMbackfield_aq-E2-43-200deg-14day-12 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.035 293 0.000001645 0.1 275.9 73.9 IRM backfield acquisition after annealing at 473K for 275.9 days IRMbackfield_aq-E2-43-200deg-14day-13 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 9.697e-7 0.2 277.9 68 IRM backfield acquisition after annealing at 473K for 277.9 days IRMbackfield_aq-E2-43-200deg-14day-14 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.045 293 4.412e-7 0.2 278.7 47.8 IRM backfield acquisition after annealing at 473K for 278.7 days IRMbackfield_aq-E2-43-200deg-14day-15 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 3.268e-7 0.3 277.9 -30.8 IRM backfield acquisition after annealing at 473K for 277.9 days IRMbackfield_aq-E2-43-200deg-14day-16 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.06 293 9.724e-7 0.1 262.4 -81.6 IRM backfield acquisition after annealing at 473K for 262.4 days IRMbackfield_aq-E2-43-200deg-14day-17 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.07 293 0.00000162 0.1 247.2 -86.8 IRM backfield acquisition after annealing at 473K for 247.2 days IRMbackfield_aq-E2-43-200deg-14day-18 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 0.000002242 0.1 215.9 -88.3 IRM backfield acquisition after annealing at 473K for 215.9 days IRMbackfield_aq-E2-43-200deg-14day-19 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.09 293 0.00000274 0.1 137 -88.2 IRM backfield acquisition after annealing at 473K for 137 days IRMbackfield_aq-E2-43-200deg-14day-20 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 0.0000031830000000000003 0.1 123.7 -87.5 IRM backfield acquisition after annealing at 473K for 123.7 days IRMbackfield_aq-E2-43-200deg-14day-21 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.125 293 0.000004007 0.1 158.9 -87.7 IRM backfield acquisition after annealing at 473K for 158.9 days IRMbackfield_aq-E2-43-200deg-14day-22 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 0.000004707 0.1 110.8 -85.8 IRM backfield acquisition after annealing at 473K for 110.8 days IRMbackfield_aq-E2-43-200deg-14day-23 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.175 293 0.000005189 0.1 111.3 -86 IRM backfield acquisition after annealing at 473K for 111.3 days IRMbackfield_aq-E2-43-200deg-14day-24 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 0.000005646 0.1 107.3 -85.6 IRM backfield acquisition after annealing at 473K for 107.3 days IRMbackfield_aq-E2-43-200deg-14day-25 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.25 293 0.000006271999999999999 0.1 105.8 -84.5 IRM backfield acquisition after annealing at 473K for 105.8 days IRMbackfield_aq-E2-43-200deg-14day-26 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 0.0000066480000000000006 0.1 109.6 -85.1 IRM backfield acquisition after annealing at 473K for 109.6 days IRMbackfield_aq-E2-43-200deg-14day-27 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.35 293 0.000006919 0.1 112.2 -85.2 IRM backfield acquisition after annealing at 473K for 112.2 days IRMbackfield_aq-E2-43-200deg-14day-28 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 0.000007107 0.1 113.4 -85.1 IRM backfield acquisition after annealing at 473K for 113.4 days IRMbackfield_aq-E2-43-200deg-14day-29 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.5 293 0.000007333 0.1 106.8 -83.9 IRM backfield acquisition after annealing at 473K for 106.8 days IRMbackfield_aq-E2-43-200deg-14day-30 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 0.000007440000000000001 0.1 111.7 -84.4 IRM backfield acquisition after annealing at 473K for 111.7 days IRMbackfield_aq-E2-43-200deg-14day-31 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 0.000007532 0.2 107.7 -84.2 IRM backfield acquisition after annealing at 473K for 107.7 days IRMbackfield_aq-E2-43-200deg-14day-32 IRMbackfield_aq-E2-43-200deg-14day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 0.000007586 0.1 109.4 -84.3 IRM backfield acquisition after annealing at 473K for 109.4 days IRMbackfield_aq-E2-43-200deg-30day-1 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 0 293 0.000004941 0.2 117.6 -84 IRM backfield acquisition after annealing at 473K for 117.6 days IRMbackfield_aq-E2-43-200deg-30day-2 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 1 293 0.000007438 0.1 281 83.1 IRM backfield acquisition after annealing at 473K for 281 days IRMbackfield_aq-E2-43-200deg-30day-3 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.003 293 0.000006912 0.2 278.6 82.9 IRM backfield acquisition after annealing at 473K for 278.6 days IRMbackfield_aq-E2-43-200deg-30day-4 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.005 293 0.0000065319999999999995 0.2 281.9 82.8 IRM backfield acquisition after annealing at 473K for 281.9 days IRMbackfield_aq-E2-43-200deg-30day-5 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0075 293 0.000006048 0.1 279.2 82.5 IRM backfield acquisition after annealing at 473K for 279.2 days IRMbackfield_aq-E2-43-200deg-30day-6 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.01 293 0.000005559 0.2 284.2 82.3 IRM backfield acquisition after annealing at 473K for 284.2 days IRMbackfield_aq-E2-43-200deg-30day-7 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0125 293 0.000005099000000000001 0.2 284.1 82.1 IRM backfield acquisition after annealing at 473K for 284.1 days IRMbackfield_aq-E2-43-200deg-30day-8 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.015 293 0.0000046690000000000005 0.2 281.9 81.7 IRM backfield acquisition after annealing at 473K for 281.9 days IRMbackfield_aq-E2-43-200deg-30day-9 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.0175 293 0.00000425 0.2 279 80.6 IRM backfield acquisition after annealing at 473K for 279 days IRMbackfield_aq-E2-43-200deg-30day-10 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.02 293 0.0000038119999999999997 0.2 285.6 80.8 IRM backfield acquisition after annealing at 473K for 285.6 days IRMbackfield_aq-E2-43-200deg-30day-11 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.025 293 0.00000305 0.2 284.9 79.6 IRM backfield acquisition after annealing at 473K for 284.9 days IRMbackfield_aq-E2-43-200deg-30day-12 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.03 293 0.000002338 0.2 282.1 76.8 IRM backfield acquisition after annealing at 473K for 282.1 days IRMbackfield_aq-E2-43-200deg-30day-13 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.035 293 0.000001598 0.3 283.2 75.4 IRM backfield acquisition after annealing at 473K for 283.2 days IRMbackfield_aq-E2-43-200deg-30day-14 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.04 293 9.209e-7 0.3 285.9 69 IRM backfield acquisition after annealing at 473K for 285.9 days IRMbackfield_aq-E2-43-200deg-30day-15 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.045 293 4.5169999999999995e-7 0.2 281.5 42.6 IRM backfield acquisition after annealing at 473K for 281.5 days IRMbackfield_aq-E2-43-200deg-30day-16 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.05 293 3.281e-7 0.4 278.7 -37.2 IRM backfield acquisition after annealing at 473K for 278.7 days IRMbackfield_aq-E2-43-200deg-30day-17 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.055 293 7.081e-7 0.6 281.5 -68.2 IRM backfield acquisition after annealing at 473K for 281.5 days IRMbackfield_aq-E2-43-200deg-30day-18 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.06 293 0.000001032 0.1 271.1 -83.6 IRM backfield acquisition after annealing at 473K for 271.1 days IRMbackfield_aq-E2-43-200deg-30day-19 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.07 293 0.00000165 0.1 242.8 -88.1 IRM backfield acquisition after annealing at 473K for 242.8 days IRMbackfield_aq-E2-43-200deg-30day-20 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.08 293 0.000002246 0.1 182.9 -89.1 IRM backfield acquisition after annealing at 473K for 182.9 days IRMbackfield_aq-E2-43-200deg-30day-21 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.09 293 0.000002759 0.1 108 -87.4 IRM backfield acquisition after annealing at 473K for 108 days IRMbackfield_aq-E2-43-200deg-30day-22 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.1 293 0.00000318 0.1 134.1 -88.4 IRM backfield acquisition after annealing at 473K for 134.1 days IRMbackfield_aq-E2-43-200deg-30day-23 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.125 293 0.000003999 0.1 124.5 -86.9 IRM backfield acquisition after annealing at 473K for 124.5 days IRMbackfield_aq-E2-43-200deg-30day-24 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.15 293 0.000004658 0.1 127.1 -86.9 IRM backfield acquisition after annealing at 473K for 127.1 days IRMbackfield_aq-E2-43-200deg-30day-25 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.175 293 0.000005162 0.1 125.8 -86.9 IRM backfield acquisition after annealing at 473K for 125.8 days IRMbackfield_aq-E2-43-200deg-30day-26 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.2 293 0.0000056150000000000005 0.1 114.2 -85.8 IRM backfield acquisition after annealing at 473K for 114.2 days IRMbackfield_aq-E2-43-200deg-30day-27 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.25 293 0.000006234 0.2 113.7 -85.2 IRM backfield acquisition after annealing at 473K for 113.7 days IRMbackfield_aq-E2-43-200deg-30day-28 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.3 293 0.000006629 0.1 111.1 -85.2 IRM backfield acquisition after annealing at 473K for 111.1 days IRMbackfield_aq-E2-43-200deg-30day-29 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.35 293 0.000006912 0.1 116 -85 IRM backfield acquisition after annealing at 473K for 116 days IRMbackfield_aq-E2-43-200deg-30day-30 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.4 293 0.0000070959999999999995 0.2 116 -84.8 IRM backfield acquisition after annealing at 473K for 116 days IRMbackfield_aq-E2-43-200deg-30day-31 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.5 293 0.000007311 0.1 114.1 -84.6 IRM backfield acquisition after annealing at 473K for 114.1 days IRMbackfield_aq-E2-43-200deg-30day-32 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.6 293 0.000007416 0.1 114.1 -84.4 IRM backfield acquisition after annealing at 473K for 114.1 days IRMbackfield_aq-E2-43-200deg-30day-33 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -0.8 293 0.000007517 0.1 117.4 -84.4 IRM backfield acquisition after annealing at 473K for 117.4 days IRMbackfield_aq-E2-43-200deg-30day-34 IRMbackfield_aq-E2-43-200deg-30day E2-43 g LP-IRM This study UWM-2G755:UWM-asc-pulse 473 -1 293 0.000007572 0.2 117.4 -83.9 IRM backfield acquisition after annealing at 473K for 117.4 days IRM3D_demag-B-14-1 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asc-pulse:UWM-asctd48-sc 293 0.000002376 0.5 70 18.4 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-2 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 373 293 0.000002293 0.3 73.9 18.4 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-3 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 423 293 0.0000022109999999999997 0.5 75.7 18.4 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-4 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 473 293 0.0000021 0.4 73.3 18.1 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-5 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 498 293 0.000002025 0.4 73.6 17.9 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-6 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 523 293 0.000001929 1.1 74.2 17.3 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-7 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 548 293 0.000001794 1 74.6 17 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-8 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 573 293 0.000001652 1.1 73.3 16.4 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-9 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 598 293 0.0000014480000000000002 0.5 71.6 15.6 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-10 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 623 293 0.000001124 0.7 71.5 14.5 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-11 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 648 293 7.497e-7 1.1 66.6 12.4 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-12 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 673 293 4.644e-7 0.4 58.4 10.5 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-13 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 698 293 2.9290000000000004e-7 0.4 52.6 8.5 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-14 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 723 293 2.047e-7 0.8 51 7.3 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-15 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 748 293 1.427e-7 0.3 51.2 7 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-16 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 773 293 8.192999999999999e-8 0.1 47.8 6.6 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-17 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 798 293 5.3810000000000003e-8 0.8 48.8 6.6 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-18 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 823 293 2.635e-8 0.2 46.6 6.6 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-14-19 IRM3D_demag-B-14 B-14 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 848 293 3.663e-9 0.9 48.4 7.2 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-27-1 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asc-pulse:UWM-asctd48-sc 293 0.000003538 0.2 41.6 14.2 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-2 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 373 293 0.000002928 0.3 44.5 15.4 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-3 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 423 293 0.000002637 0.5 48.2 15.5 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-4 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 473 293 0.0000024220000000000003 0.3 46.9 15.5 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-5 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 498 293 0.000002314 1.2 43 15.8 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-6 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 523 293 0.000002221 0.3 47 14.8 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-7 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 548 293 0.000002122 0.8 41.6 15.2 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-8 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 573 293 0.00000204 0.3 43.9 15 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-9 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 598 293 0.000001951 0.3 46.9 15 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-10 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 623 293 0.0000018469999999999998 0.3 46.5 14.7 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-11 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 648 293 0.000001736 1 45.4 14.9 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-12 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 673 293 0.0000015909999999999999 0.3 48.9 15.3 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-13 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 698 293 0.0000013910000000000001 0.3 52.2 15.9 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-14 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 723 293 0.000001205 0.3 56.6 16 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-15 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 748 293 0.000001053 0.8 56.4 16.2 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-16 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 773 293 8.714999999999999e-7 0.2 57.1 15.8 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-17 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 798 293 4.4020000000000004e-7 0.3 57.5 11.9 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-18 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 823 293 1.191e-7 0.4 36.8 2.7 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-27-19 IRM3D_demag-B-27 B-27 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 848 293 6.671e-8 0.7 39.7 3.5 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-28-1 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asc-pulse:UWM-asctd48-sc 293 0.000004788 0.5 22 7.8 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-2 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 373 293 0.000003515 1.3 14.2 8.8 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-3 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 423 293 0.000003023 0.3 31.7 8.4 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-4 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 473 293 0.000002715 1.1 28.8 8.5 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-5 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 498 293 0.0000025609999999999997 0.6 32.6 8.1 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-6 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 523 293 0.000002425 0.5 28.2 8.5 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-7 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 548 293 0.0000023 1.1 29 7.8 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-8 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 573 293 0.000002183 0.3 33.9 8.1 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-9 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 598 293 0.000002063 0.3 33 7.3 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-10 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 623 293 0.0000019480000000000002 1.1 33.4 8 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-11 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 648 293 0.000001832 1 31.4 7.6 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-12 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 673 293 0.000001717 0.3 30.3 7.4 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-13 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 698 293 0.000001586 0.3 30.6 7.3 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-14 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 723 293 0.000001402 1.1 35.3 7.5 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-15 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 748 293 0.000001074 0.5 37.2 4.4 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-16 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 773 293 7.781e-7 0.8 37.8 2.8 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-17 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 798 293 2.009e-7 0.6 33.1 1.5 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-18 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 823 293 3.314e-8 1.1 30.9 3 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-28-19 IRM3D_demag-B-28 B-28 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 848 293 9.54e-9 0.3 43.4 18.4 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-29-1 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asc-pulse:UWM-asctd48-sc 293 0.000002265 0.4 46.4 23.1 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-2 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 373 293 0.0000019 0.3 51.2 24.3 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-3 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 423 293 0.000001736 0.6 55.3 24.5 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-4 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 473 293 0.000001609 0.3 53 24.1 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-5 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 498 293 0.000001545 0.8 52.2 24.1 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-6 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 523 293 0.0000014870000000000001 0.4 51.9 23.9 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-7 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 548 293 0.000001426 0.4 51.3 24 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-8 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 573 293 0.000001366 0.6 53.4 24.3 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-9 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 598 293 0.000001285 0.3 55.3 24.2 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-10 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 623 293 0.000001194 0.5 58.3 25 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-11 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 648 293 0.0000010889999999999999 0.7 59.5 25.5 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-12 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 673 293 9.921e-7 0.9 63.7 26.1 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-13 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 698 293 8.873000000000001e-7 0.8 65.4 26.7 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-14 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 748 293 6.793e-7 0.4 72 27.6 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-15 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 773 293 5.147e-7 0.4 69.5 27.6 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-16 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 798 293 1.21e-7 0.5 75.1 24.5 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-17 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 823 293 8.457000000000001e-9 1.2 53.6 -6 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-29-18 IRM3D_demag-B-29 B-29 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 848 293 5.128e-9 0.6 61.3 -22 thermal demag of IRM-3D after annealing at 200degC for 267 days IRM3D_demag-B-41-1 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asc-pulse:UWM-asctd48-sc 293 0.000002026 0.2 64.4 15.8 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-2 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 373 293 0.000001946 0.3 63.3 15.8 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-3 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 423 293 0.0000018699999999999999 0.3 63.5 15.3 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-4 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 473 293 0.0000017849999999999999 0.2 66.2 15.4 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-5 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 498 293 0.000001735 0.3 61.8 15.1 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-6 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 523 293 0.000001679 0.3 62.1 14.3 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-7 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 548 293 0.000001615 0.3 63.8 14.9 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-8 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 573 293 0.000001535 0.8 62.1 14 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-9 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 598 293 0.000001437 1 61.2 14.2 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-10 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 623 293 0.000001308 0.2 65.2 14 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-11 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 648 293 0.0000010980000000000001 1.1 61.8 13.5 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-12 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 673 293 7.420000000000001e-7 0.3 61.4 13 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-13 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 698 293 3.709e-7 0.3 56.3 12.4 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-14 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 723 293 2.3460000000000002e-7 0.3 50.5 11.5 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-15 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 748 293 1.268e-7 0.2 46.1 10.8 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-16 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 773 293 7.514e-8 0.9 42.7 10 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-17 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 798 293 4.4539999999999994e-8 1.1 39.7 9.4 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-18 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 823 293 1.405e-8 0.3 38.3 9.9 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-41-19 IRM3D_demag-B-41 B-41 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 848 293 7.267e-10 1 26.5 5.4 thermal demag of IRM-3D after annealing at 300degC for 267 days IRM3D_demag-B-42-1 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asc-pulse:UWM-asctd48-sc 293 1.303e-7 0.2 45.6 13.6 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-2 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 373 293 1.177e-7 0.3 53.6 13.9 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-3 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 423 293 1.1e-7 0.2 54.7 14 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-4 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 473 293 1.026e-7 0.4 56.3 14 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-5 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 498 293 9.789e-8 0.3 58.5 14.2 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-6 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 523 293 9.357e-8 0.2 54.2 13.4 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-7 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 548 293 8.901e-8 0.2 57.6 13.4 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-8 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 573 293 8.453e-8 0.9 58.4 12.9 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-9 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 598 293 8.015e-8 0.2 56.9 13.2 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-10 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 623 293 7.601999999999999e-8 0.3 59.1 12.5 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-11 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 648 293 7.153e-8 0.7 54.2 12.8 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-12 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 673 293 6.675e-8 0.2 61.4 12.3 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-13 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 698 293 6.092e-8 0.9 59.9 12.1 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-14 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 723 293 5.2139999999999996e-8 0.5 61.4 11.8 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-15 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 748 293 4.052e-8 0.2 56.9 10.8 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-16 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 773 293 2.683e-8 0.2 51.6 10.2 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-17 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 798 293 1.777e-8 0.8 48 9.2 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-18 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 823 293 8.022999999999998e-9 1.1 47.7 9.3 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-B-42-19 IRM3D_demag-B-42 B-42 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 848 293 5.970999999999999e-10 1.3 34.9 9.3 thermal demag of IRM-3D after annealing at 400degC for 267 days IRM3D_demag-E-30-1 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asc-pulse:UWM-asctd48-sc 293 2.801e-7 0.6 23.7 26.7 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-2 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 373 293 2.293e-7 0.5 24.1 28.4 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-3 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 423 293 2.087e-7 0.5 20.2 28.8 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-4 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 473 293 1.892e-7 0.4 23.6 29 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-5 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 498 293 1.779e-7 0.4 22.1 29.1 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-6 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 523 293 1.685e-7 0.3 20.4 29.5 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-7 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 548 293 1.593e-7 0.3 21.4 29.1 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-8 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 573 293 1.49e-7 0.4 23.7 29.7 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-9 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 598 293 1.396e-7 0.4 24.2 29 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-10 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 623 293 1.318e-7 0.7 23.2 28.8 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-11 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 648 293 1.204e-7 0.6 24.8 29.6 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-12 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 673 293 1.075e-7 0.4 26.3 31.6 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-13 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 698 293 9.788e-8 0.6 25.7 31.8 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-14 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 723 293 8.862e-8 0.3 28 32.4 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-15 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 748 293 7.336e-8 0.5 26.4 32.9 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-16 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 773 293 6.01e-8 0.9 24.3 31.6 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-17 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 798 293 2.079e-8 0.3 27.3 32.8 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-18 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 823 293 1.8530000000000001e-9 0.6 287.8 -39.5 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-30-19 IRM3D_demag-E-30 E-30 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 848 293 2.434e-9 0.8 331.1 -22.8 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-1 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asc-pulse:UWM-asctd48-sc 293 3.756e-7 0.8 42.3 15.4 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-2 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 373 293 3.111e-7 0.3 46.6 16.1 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-3 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 423 293 2.853e-7 0.3 44.8 16 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-4 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 473 293 2.6219999999999995e-7 0.2 44.9 16 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-5 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 498 293 2.5060000000000003e-7 0.3 45.9 15 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-6 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 523 293 2.404e-7 0.9 43.5 15.3 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-7 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 548 293 2.306e-7 0.6 45.2 15.3 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-8 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 573 293 2.1910000000000002e-7 0.7 46.1 15.4 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-9 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 598 293 2.071e-7 0.3 46.7 15.1 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-10 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 623 293 1.952e-7 0.2 49.3 16 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-11 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 648 293 1.807e-7 0.4 49.9 16 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-12 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 673 293 1.65e-7 0.3 51.6 15.9 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-13 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 698 293 1.488e-7 0.3 53 16.1 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-14 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 723 293 1.3100000000000002e-7 0.8 54.2 15.9 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-15 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 748 293 1.125e-7 0.9 55.7 15.4 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-16 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 773 293 8.678e-8 0.2 59.5 14.5 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-17 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 798 293 2.762e-8 0.9 60.7 15.2 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-18 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 823 293 3.073e-9 0.4 38.8 20.5 thermal demag of IRM-3D on untreated specimen IRM3D_demag-E-32-19 IRM3D_demag-E-32 E-32 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 848 293 9.034e-10 0.7 88.5 3.2 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-1 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asc-pulse:UWM-asctd48-sc 293 1.17e-7 0.4 69.5 21.5 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-2 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 373 293 1.105e-7 1.1 76.6 21.8 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-3 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 423 293 1.036e-7 0.7 76 21.8 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-4 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 473 293 9.442e-8 0.2 76 21.8 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-5 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 498 293 8.859e-8 0.4 78.2 21.5 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-6 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 523 293 8.061e-8 0.6 72.3 21.2 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-7 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 548 293 7.398e-8 0.6 71.9 20.8 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-8 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 573 293 6.214e-8 0.3 76.2 20.3 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-9 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 598 293 5.0170000000000005e-8 1 73.5 20 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-10 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 623 293 4.055e-8 0.2 74.3 18.9 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-11 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 648 293 3.025e-8 0.7 70.2 17.7 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-12 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 673 293 2.0530000000000003e-8 0.4 69.2 16.6 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-13 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 698 293 1.3940000000000001e-8 0.2 64 15.4 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-14 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 723 293 1.119e-8 0.4 61.4 14.8 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-15 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 748 293 8.989e-9 0.4 59.4 14.4 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-16 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 773 293 7.087e-9 1.2 53 13.8 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-17 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 798 293 5.377000000000001e-9 0.4 54.9 13.1 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-18 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 823 293 3.382e-9 0.3 57.9 12.7 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-01-19 IRM3D_demag-F-01 F-01 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 848 293 3.82e-10 1.8 30.1 13.7 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-1 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asc-pulse:UWM-asctd48-sc 293 1.312e-8 0.3 42.7 18.9 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-2 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 373 293 1.137e-8 0.3 43.4 19.5 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-3 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 423 293 1.019e-8 0.9 46.1 19.8 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-4 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 473 293 8.738e-9 0.2 48.3 19.7 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-5 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 498 293 7.897999999999999e-9 0.5 45.1 19.3 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-6 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 523 293 7.0149999999999995e-9 0.4 47.4 19.3 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-7 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 548 293 6.305e-9 0.4 46.4 17.6 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-8 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 573 293 5.512e-9 0.4 46 16.4 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-9 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 598 293 4.692e-9 0.9 44.5 17 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-10 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 623 293 4.089e-9 0.8 42.4 15.4 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-11 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 648 293 3.4549999999999998e-9 0.4 43.3 14.3 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-12 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 673 293 3.082e-9 0.4 45.5 13.1 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-13 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 698 293 2.763e-9 0.5 44.7 14.1 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-14 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 723 293 2.4480000000000002e-9 0.4 48.8 13.2 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-15 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 748 293 2.081e-9 0.5 46.9 11.6 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-16 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 773 293 1.745e-9 0.4 47.1 12 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-17 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 798 293 1.305e-9 0.6 48.8 10.3 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-18 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 823 293 8.232e-10 0.8 49.4 11.1 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-19 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 848 293 2.0450000000000002e-10 3.2 20.5 3.5 thermal demag of IRM-3D on untreated specimen IRM3D_demag-F-02-20 IRM3D_demag-F-02 F-02 g LP-IRM-3D This study UWM-2G755:UWM-asctd48-sc 848 293 1.956e-10 3.4 19.8 4 thermal demag of IRM-3D on untreated specimen