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Farver & Yund 2000
Farver, J.R. and Yund, R.A. (2000). Silicon diffusion in forsterite aggregates: Implications for diffusion accommodated creep. Geophysical Research Letters 27: doi: 10.1029/2000GL008492. issn: 0094-8276.

Silicon diffusion rates were determined in fine-grained (~4.5 &mgr;m) hot-pressed forsterite aggregates at 900¿ to 1200 ¿C and 0.1 MPa using a 30Si-tracer and standard SIMS analysis. There is no measurable difference in diffusion rates between samples buffered by excess MgO or SiO2, nor samples run in dry N2 or H2/CO2. The results yield the Arrhenius parameters D0,bulk=5.4¿10-9 m2/sec and Q=203¿36 kJ/mol. At 1200 ¿C, the grain boundary diffusion rate of 30Si is similar to 26Mg (Si ~10 times greater), ~102 less than Fe, and ~105 less than O. In addition, the 30Si grain boundary diffusion rate is ~109 greater than the Si volume diffusion rate and indicates that diffusional transport of Si in forsterite aggregates is dominated by grain boundaries. ¿ 2000 American Geophysical Union

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Abstract

Keywords
Mineral Physics, Creep and deformation, Physical Properties of Rocks, Plasticity, diffusion, and creep, Tectonophysics, Dynamics of lithosphere and mantle—general, Tectonophysics, Rheology—mantle
Journal
Geophysical Research Letters
http://www.agu.org/journals/gl/
Publisher
American Geophysical Union
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